公开(公告)号：US20240288389A1

公开(公告)日：2024-08-29

申请号：US18660165

申请日：2024-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Erwin SLOT ,  Peter Paul HEMPENIUS ,  Niels Johannes Maria BOSCH

IPC: G01N23/2202 ,  B08B5/00 ,  B08B7/00 ,  G01N23/2251

CPC classification number: G01N23/2202 ,  B08B5/00 ,  B08B7/0035 ,  G01N23/2251 ,  G01N2223/6116 ,  G01N2223/646

Abstract: The embodiments of the present disclosure provide a charged particle assessment system for projecting a beam of charged particles towards a sample. The system comprises a sample holder configured to hold a sample; a charged particle optical system configured to project a beam of charged particles from a charged particle source downbeam towards the sample and comprising a cleaning target; and a cleaning device. The cleaning device is configured to supply cleaning medium in a cleaning flow towards the cleaning target incident on the cleaning target so that the cleaning flow approaches the cleaning target from downbeam of the cleaning target, and to stimulate the cleaning medium at or near the cleaning target such that the cleaning medium cleans at least a portion of the surface of the cleaning target.

公开(公告)号：US20240128045A1

公开(公告)日：2024-04-18

申请号：US18397896

申请日：2023-12-27

Applicant: ASML Netherlands B.V.

Inventor： Erwin SLOT

IPC: H01J37/147 ,  H01J37/04 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J37/1477 ,  H01J37/045 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/1501

Abstract: Disclosed herein is a method of aligning a sample in a charged particle assessment system. The system comprises a support for supporting a sample, and is configured to project charged particles in a multi-beam towards a sample along a multi-beam path, the multi-beam comprising an arrangement of beamlets, and to detect signal particles emitted from the sample in response to a corresponding beamlet of the multi-beam. The method comprises: directing the multi-beam of charged particles along the multi-beam path towards an alignment feature of the sample, such that the field of view of the multi-beam of charged particles encompasses the alignment feature; detecting the signal particles emitted from the sample; generating a dataset representative of the alignment feature based on the detecting of the signal particles; and determining a global alignment of the sample with respect to the multi-beam path, using the dataset.

公开(公告)号：US20230324318A1

公开(公告)日：2023-10-12

申请号：US18327847

申请日：2023-06-01

Applicant: ASML Netherlands B.V.

Inventor： Yan REN ,  Erwin SLOT ,  Albertus Victor, Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC: G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147

CPC classification number: G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  G01N2223/303 ,  H01J2237/2448 ,  H01J2237/0453 ,  H01J37/20

Abstract: A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.

公开(公告)号：US20230207259A1

公开(公告)日：2023-06-29

申请号：US18088499

申请日：2022-12-23

Applicant: ASML Netherlands B.V.

Inventor： Erwin SLOT ,  Niels VERGEER ,  Vincent Sylvester KUIPER

IPC: H01J37/304 ,  H01J37/28

CPC classification number: H01J37/3045 ,  H01J37/28 ,  H01J2237/1501

Abstract: The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.

公开(公告)号：US20240234081A9

公开(公告)日：2024-07-11

申请号：US18402585

申请日：2024-01-02

Applicant: ASML Netherlands B.V.

Inventor： Erwin SLOT

IPC: H01J37/141 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/28 ,  H01J37/145

Abstract: A method for projecting a charged particle multi-beam toward a sample comprises manipulating respective sub-beams of a charged particle multi-beam using a control lens array comprising a plurality of control lenses for the respective sub-beams; controlling the control lens array to manipulate the sub-beams such that the sub-beams are shaped by respective apertures of a beam shaping aperture array such that less than a threshold current of charged particles of each sub-beam passes through the respective apertures of the beam shaping aperture array, down-beam of the control lens array, comprising a plurality of apertures for the respective sub-beams; and controlling the control lens array to manipulate the sub-beams such that at least the threshold current of at least a proportion of the sub-beams passes through the respective apertures of the beam shaping aperture array.

公开(公告)号：US20240145208A1

公开(公告)日：2024-05-02

申请号：US18406137

申请日：2024-01-06

Applicant: ASML Netherlands B.V.

Inventor： Erwin SLOT ,  Mans Johan, Bertil OSTERBERG

IPC: H01J37/141 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/28 ,  H01J37/145

Abstract: A charged particle apparatus, configured to project a charged particle multi-beam toward a sample, comprises: a charged particle source configured to emit a charged particle beam; a light source configured to emit light; and a charged particle-optical device configured to project toward the sample sub-beams of a charged particle multi-beam derived from the charged particle beam; wherein the light source is arranged such that the light is projected along paths of the sub-beams through the charged particle-optical device so as to irradiate at least a portion of the sample.

公开(公告)号：US20240136147A1

公开(公告)日：2024-04-25

申请号：US18402585

申请日：2024-01-02

Applicant: ASML Netherlands B.V.

Inventor： Erwin SLOT

IPC: H01J37/141 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/28 ,  H01J37/145

Abstract: A method for projecting a charged particle multi-beam toward a sample comprises manipulating respective sub-beams of a charged particle multi-beam using a control lens array comprising a plurality of control lenses for the respective sub-beams; controlling the control lens array to manipulate the sub-beams such that the sub-beams are shaped by respective apertures of a beam shaping aperture array such that less than a threshold current of charged particles of each sub-beam passes through the respective apertures of the beam shaping aperture array, down-beam of the control lens array, comprising a plurality of apertures for the respective sub-beams; and controlling the control lens array to manipulate the sub-beams such that at least the threshold current of at least a proportion of the sub-beams passes through the respective apertures of the beam shaping aperture array.

公开(公告)号：US20230005706A1

公开(公告)日：2023-01-05

申请号：US17856722

申请日：2022-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus MANGNUS ,  Erwin SLOT

IPC: H01J37/244 ,  H01J37/145 ,  H01J37/28

Abstract: A detector for use in a charged particle device for an assessment tool to detect signal particles from a sample, the detector including a substrate, the substrate including: a semiconductor element configured to detect signal particles above a first energy threshold; and a charge-based element configured to detect signal particles below a second energy threshold.