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    Method for manufacturing high strength steel strips with superior formability and excellent coatability
    2.
    发明授权
    Method for manufacturing high strength steel strips with superior formability and excellent coatability 有权
    制造具有优异成型性和优异涂布性能的高强度钢带的方法

    公开(公告)号：US08221564B2

    公开(公告)日：2012-07-17

    申请号：US12096968

    申请日：2006-12-22

    申请人： Seong-Ju Kim ,  Il-Ryoung Sohn ,  Hyun-Gyu Hwang ,  Seung-Bok Lee

    发明人： Seong-Ju Kim ,  Il-Ryoung Sohn ,  Hyun-Gyu Hwang ,  Seung-Bok Lee

    IPC分类号： C21D8/00 ,  C22C38/00

    CPC分类号： C21D8/0236 ,  C21D9/46 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/12 ,  C22C38/60

    摘要： A method for manufacturing a steel sheet used for structural members, elements, etc. of automobiles including a front side member, pillar, and the like, and more particularly, a method for manufacturing a steel sheet having a high strength and formability as well as hot-dip galvanizing properties is disclosed. In the method, after an aluminum killed steel slab, which comprises, by weight %: C: 0.05% to 0.25%; Si: 0.1% to 1.5%; S: 0.02% or less; N: 0.01% or less; Al: 0.02% to 2.0%; Mn: 1.0% to 2.5%; P: 0.001% to 0.1%; Sb: 0.005% to 0.10%; the balance of Fe and other unavoidable impurities, is subjected to a homogenization treatment at a temperature range of 1050° C. to 1300° C., the aluminum killed steel slab is subjected to a hot rolling under a finishing hot rolling temperature of 850° C. to 950° C. and a coiling temperature of 400° C. to 700° C., followed by a cold rolling under a cold rolling reduction ration of 30% to 80%, and annealing the cold rolled steel sheet.

    摘要翻译： 一种制造用于包括前侧构件，支柱等的汽车的结构构件，构件等的钢板的制造方法，更具体地说，涉及具有高强度，成形性的钢板的制造方法以及 公开了热浸镀锌性能。 在该方法中，在铝镇静钢板之后，其包含以重量％计：C：0.05％至0.25％; Si：0.1〜1.5％ S：0.02％以下; N：0.01％以下 Al：0.02〜2.0％ Mn：1.0〜2.5％ P：0.001〜0.1％ Sb：0.005〜0.10％ 将余量的Fe等不可避免的杂质在1050℃〜1300℃的温度范围内进行均质化处理，在850℃的最终热轧温度下进行热轧， 在950℃，卷取温度400℃〜700℃，冷轧压下率为30〜80％的冷轧，冷轧钢板进行退火。

    Method for Manufacturing High Strength Steel Strips with Superior Formability and Excellent Coatability
    4.
    发明申请
    Method for Manufacturing High Strength Steel Strips with Superior Formability and Excellent Coatability 有权
    制造具有优异成型性和优异涂层性的高强度钢带的方法

    公开(公告)号：US20080295928A1

    公开(公告)日：2008-12-04

    申请号：US12096968

    申请日：2006-12-22

    申请人： Seong-Ju Kim ,  Il-Ryoung Sohn ,  Hyun-Gyu Hwang ,  Seung-Bok Lee

    发明人： Seong-Ju Kim ,  Il-Ryoung Sohn ,  Hyun-Gyu Hwang ,  Seung-Bok Lee

    IPC分类号： C21D8/02

    CPC分类号： C21D8/0236 ,  C21D9/46 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/12 ,  C22C38/60

    摘要： A method for manufacturing a steel sheet used for structural members, elements, etc. of automobiles including a front side member, pillar, and the like, and more particularly, a method for manufacturing a steel sheet having a high strength and formability as well as hot-dip galvanizing properties is disclosed. In the method, after an aluminum killed steel slab, which comprises, by weight %,: C: 0.05% to 0.25%; Si: 0.1% to 1.5%; S: 0.02% or less; N: 0.01% or less; Al: 0.02% to 2.0%; Mn: 1.0% to 2.5%; P: 0.001% to 0.1%; Sb: 0.005% to 0.10%; the balance of Fe and other unavoidable impurities, is subjected to a homogenization treatment at a temperature range of 1050° C. to 1300° C., the aluminum killed steel slab is subjected to a hot rolling under a finishing hot rolling temperature of 850° C. to 950° C. and a coiling temperature of 400° C. to 700° C., followed by a cold rolling under a cold rolling reduction ration of 30% to 80%, and annealing the cold rolled steel sheet.

    摘要翻译： 一种制造用于包括前侧构件，支柱等的汽车的结构构件，构件等的钢板的制造方法，更具体地说，涉及具有高强度，成形性的钢板的制造方法以及 公开了热浸镀锌性能。 在该方法中，在铝镇静钢板之后，以重量％计：C：0.05％至0.25％; Si：0.1〜1.5％ S：0.02％以下; N：0.01％以下 Al：0.02〜2.0％ Mn：1.0〜2.5％ P：0.001〜0.1％ Sb：0.005〜0.10％ 将余量的Fe等不可避免的杂质在1050℃〜1300℃的温度范围内进行均质化处理，在850℃的最终热轧温度下进行热轧， 在950℃，卷取温度400℃〜700℃，冷轧压下率为30〜80％的冷轧，冷轧钢板进行退火。

    Sulfonium salt and its manufacturing method
    7.
    发明授权
    Sulfonium salt and its manufacturing method 有权
    锍盐及其制造方法

    公开(公告)号：US6111143A

    公开(公告)日：2000-08-29

    申请号：US140955

    申请日：1998-08-27

    申请人： Joo-Hyeon Park ,  Dong-Chul Seo ,  Sun-Yi Park ,  Seong-Ju Kim

    发明人： Joo-Hyeon Park ,  Dong-Chul Seo ,  Sun-Yi Park ,  Seong-Ju Kim

    IPC分类号： C07C381/00 ,  C07C309/06 ,  C07C381/12 ,  G03F7/004 ,  G03F7/029 ,  C07C315/00

    CPC分类号： C07C381/12 ,  Y02P20/55

    摘要： This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compounds, especially as an useful photoacid generator of the chemically amplified photoresist employed in semiconductor materials. Since the sulfonium salt of this invention, so prepared via one-step reaction between sulfoxide compound and aromatic compound in the presence of perfluoroalkanesulfonic anhydride, has the advantages in that by overcoming some shortcomings of the prior art to prepare the sulfonium salt via two steps using Grinard reagent, this invention may provide a novel sulfonium salt with higher yield which cannot be achieved in the prior art and also to prepare even any conventional sulfonium salt having better yield.

    摘要翻译： 本发明涉及一种锍盐，包括其制造方法，其在聚合期间有效地用作光酸引发剂或自由基光引发剂，并且光酸产生剂，留下有机化合物的保护基团，特别是作为化学放大光致抗蚀剂的有用的光致酸产生剂 半导体材料。 由于在全氟烷基磺酸酐存在下通过亚砜化合物和芳族化合物之间的一步反应制备的本发明的锍盐的优点在于克服现有技术的一些缺点，通过两步使用 格林纳特试剂，本发明可以提供一种在现有技术中无法实现的更高产率的新型锍盐，并且甚至制备任何具有较好产率的常规锍盐。

    Copolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the same
    8.
    发明授权
    Copolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the same 失效
    用于正性光致抗蚀剂的共聚物和包含其的化学扩增正性光致抗蚀剂组合物

    公开(公告)号：US5989775A

    公开(公告)日：1999-11-23

    申请号：US998546

    申请日：1997-12-26

    申请人： Joo-Hyeon Park ,  Ji-Hong Kim ,  Ki-Dae Kim ,  Sun-Yi Park ,  Seong-Ju Kim

    发明人： Joo-Hyeon Park ,  Ji-Hong Kim ,  Ki-Dae Kim ,  Sun-Yi Park ,  Seong-Ju Kim

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： A copolymer having a repeating unit represented by the following general formula I and a chemical amplification positive photoresist composition having the copolymer and a photoacid generator. The photoresist can allow for a good pattern shape even though a post-baking is taken in a somewhat delayed time and for a use of any radiation, such as uv light, deep uv light and charged particle beam. Also, it is superior in storage stability and resolution so that it is useful for the high integration of semiconductor devices. The polymer ranges, in polystyrene-reduced average molecular weight, from 1,000 to 1,000,000. The polymer is represented by the following repeating pattern: ##STR1## wherein, R.sub.1, R.sub.2 and R.sub.3 independently represent a hydrogen atom or a methyl; R.sub.4, R.sub.5 and R.sub.6 independently represent a hydrogen atom, an alkyl group, an alkoxy group or a halogen; 1, m, n each is a repeating number satisfying the condition that 0.3

    摘要翻译： 具有由以下通式I表示的重复单元的共聚物和具有共聚物和光致酸发生剂的化学扩增正性光致抗蚀剂组合物。 即使在稍微延迟的时间内进行后烘烤并且使用诸如紫外光，深紫外光和带电粒子束的任何辐射，光致抗蚀剂可以允许良好的图案形状。 此外，它在存储稳定性和分辨率方面是优异的，因此它对于半导体器件的高集成是有用的。 聚苯乙烯换算的聚合物的平均分子量为1,000至1,000,000。 聚合物由以下重复图案表示：其中，R1，R2和R3独立地表示氢原子或甲基; R4，R5和R6独立地表示氢原子，烷基，烷氧基或卤素; 1，m，n分别为满足0.3 <1 /（m + n）<0.9,0.1

    Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same
    9.
    发明授权
    Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same 失效
    用于正性光致抗蚀剂的聚合物和含有该光致抗蚀剂的化学扩增的正性光致抗蚀剂组合物

    公开(公告)号：US5962185A

    公开(公告)日：1999-10-05

    申请号：US938925

    申请日：1997-09-26

    申请人： Joo-Hyeon Park ,  Seong-Ju Kim ,  Ji-Hong Kim ,  Ki-Dae Kim

    发明人： Joo-Hyeon Park ,  Seong-Ju Kim ,  Ji-Hong Kim ,  Ki-Dae Kim

    IPC分类号： C08F212/04 ,  C07C69/736 ,  C08F216/10 ,  C08F220/30 ,  G03C1/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0045 ,  C08F220/30 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive chemical amplified photoresist composition having as a matrix resin a polymer having the repeating unit of Formula (I) and a photoacid generator. The polymer ranges, in polystyrene-reduced weight average molecular weight, from about 2,000 to 1,000,000. The photoresist composition is possible to develop in alkali and shows excellent sensitivity, resolution and transmissivity to deep uv light in addition to being superior in storage preservativity. The repeating unit of Formula (I) is: ##STR1## wherein, R.sub.2, R.sub.2 and R.sub.3 are independently represented by a hydrogen atom or a methyl group; R.sub.4 is a hydrogen atom, an alkyl group or an alkoxy group; R.sub.5 is functions as an acid-labile protective group and is selected from a t-butyl group, a tetrahydropyranyl group or an alkoxymethylene group; j is an integer of 1-8; k is an integer of 0-8; and 1, m and n each represent a mole ratio, satisfying the condition of l+m+n=1 where 0

    摘要翻译： 一种正性化学放大光致抗蚀剂组合物，其具有作为基质树脂的具有式（I）的重复单元的聚合物和光酸产生剂。 聚苯乙烯换算的重均分子量范围为约2,000至1,000,000。 光致抗蚀剂组合物可以在碱中显影，并且除了具有优异的储存保存性之外，对深紫外光具有优异的灵敏度，分辨率和透射率。 式（I）的重复单元是：其中R2，R2和R3独立地由氢原子或甲基表示; R4是氢原子，烷基或烷氧基; R5用作酸不稳定保护基，选自叔丁基，四氢吡喃基或烷氧基亚甲基; j为1-8的整数; k是0-8的整数; 和1，m和n各自表示摩尔比，满足条件1 + m + n = 1，其中0 <1 <0.4。