公开(公告)号：US09384869B2

公开(公告)日：2016-07-05

申请号：US14050555

申请日：2013-10-10

Applicant: Youn Jo Ko ,  Dong Seon Uh ,  Jang Hyun Cho ,  Jin Seong Park ,  Sang Sik Bae ,  Jin Kyu Kim

Inventor： Youn Jo Ko ,  Dong Seon Uh ,  Jang Hyun Cho ,  Jin Seong Park ,  Sang Sik Bae ,  Jin Kyu Kim

IPC: H01B1/24 ,  C09J9/02 ,  H05K3/00 ,  C09J175/16 ,  H01B1/12

CPC classification number: H01B1/24 ,  C08L33/12 ,  C08L35/04 ,  C09J9/02 ,  C09J175/16 ,  H01B1/12

Abstract: An anisotropic conductive film includes a binder part, a curing part, an initiator, and conductive particles, wherein the binder part includes at least one of a nitrile butadiene rubber (NBR) resin and a urethane resin, wherein the anisotropic conductive film has an electrical conductivity of more than 0 μS/cm to about 100 μS/cm.

Abstract translation: 各向异性导电膜包括粘合剂部分，固化部分，引发剂和导电颗粒，其中粘合剂部分包括丁腈橡胶（NBR）树脂和聚氨酯树脂中的至少一种，其中各向异性导电膜具有电 电导率大于0μS/ cm至约100μS/ cm。

公开(公告)号：US09263372B2

公开(公告)日：2016-02-16

申请号：US13721407

申请日：2012-12-20

Applicant: Jae Sun Han ,  Hyun Wook Kim ,  Hyun Hee Namkung ,  Jin Young Seo ,  Kwang Jin Jung ,  Dong Seon Uh

Inventor： Jae Sun Han ,  Hyun Wook Kim ,  Hyun Hee Namkung ,  Jin Young Seo ,  Kwang Jin Jung ,  Dong Seon Uh

IPC: B32B27/00 ,  H01L23/482 ,  H01L23/00 ,  C09J7/00 ,  C09J9/02

CPC classification number: H01L23/4828 ,  C09J7/00 ,  C09J7/10 ,  C09J9/02 ,  C09J2201/602 ,  C09J2201/61 ,  C09J2433/00 ,  C09J2463/00 ,  H01L24/29 ,  H01L2224/2929 ,  H01L2224/29339 ,  H01L2224/29344 ,  H01L2224/29347 ,  H01L2224/29355 ,  H01L2224/2939 ,  H01L2224/29393 ,  H01L2224/29439 ,  H01L2224/29444 ,  H01L2224/29455 ,  H01L2224/32225 ,  H01L2924/07811 ,  H01L2924/15788 ,  H01L2924/00014 ,  H01L2924/0665 ,  H01L2924/00

Abstract: A semiconductor device bonded by an anisotropic conductive film, the anisotropic conductive film including a phenoxy resin including a fluorene-substituted phenoxy resin; and a radically polymerizable resin including a fluorene-substituted acrylate.

Abstract translation: 通过各向异性导电膜结合的半导体器件，各向异性导电膜包括含有芴取代的苯氧基树脂的苯氧基树脂; 和包含芴取代的丙烯酸酯的自由基聚合性树脂。

公开(公告)号：US08896117B2

公开(公告)日：2014-11-25

申请号：US13679113

申请日：2012-11-16

Applicant: Youn Jo Ko ,  Jin Kyu Kim ,  Dong Seon Uh ,  Kil Yong Lee ,  Jang Hyun Cho

Inventor： Youn Jo Ko ,  Jin Kyu Kim ,  Dong Seon Uh ,  Kil Yong Lee ,  Jang Hyun Cho

IPC: H01L23/52 ,  C09J9/02 ,  C09J133/04 ,  C09J7/00 ,  H01L23/00

CPC classification number: H01L23/52 ,  C09J7/00 ,  C09J7/10 ,  C09J9/02 ,  C09J133/04 ,  C09J2201/134 ,  C09J2201/602 ,  C09J2201/606 ,  C09J2203/326 ,  C09J2433/00 ,  H01L24/29 ,  H01L24/32 ,  H01L24/83 ,  H01L2224/2908 ,  H01L2224/29082 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/29311 ,  H01L2224/29339 ,  H01L2224/29344 ,  H01L2224/29347 ,  H01L2224/29355 ,  H01L2224/2939 ,  H01L2224/29393 ,  H01L2224/29411 ,  H01L2224/29439 ,  H01L2224/29444 ,  H01L2224/29447 ,  H01L2224/29455 ,  H01L2224/32225 ,  H01L2224/83851 ,  H01L2924/07802 ,  H01L2924/00014 ,  H01L2224/29399 ,  H01L2924/00

Abstract: A semiconductor device bonded by an anisotropic conductive film, the anisotropic conductive film including a conductive adhesive layer and an insulating adhesive layer stacked thereon, an amount of reactive monomers in the conductive adhesive layer being higher than an amount of reactive monomers in the insulating adhesive layer.

Abstract translation: 通过各向异性导电膜结合的半导体器件，各向异性导电膜包括导电粘合剂层和层叠在其上的绝缘粘合剂层，导电粘合剂层中的反应性单体的量高于绝缘粘合剂层中的反应性单体的量 。

公开(公告)号：US08445187B2

公开(公告)日：2013-05-21

申请号：US13183261

申请日：2011-07-14

Applicant: Kyong Ho Yoon ,  Jong Seob Kim ,  Dong Seon Uh ,  Hwan Sung Cheon ,  Chang Il Oh ,  Min Soo Kim ,  Jin Kuk Lee

Inventor： Kyong Ho Yoon ,  Jong Seob Kim ,  Dong Seon Uh ,  Hwan Sung Cheon ,  Chang Il Oh ,  Min Soo Kim ,  Jin Kuk Lee

IPC: G03F7/11 ,  G03F7/26 ,  G03F7/004

CPC classification number: G03F7/091 ,  Y10S438/952

Abstract: A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:

Abstract translation: 硬掩模组合物包括有机溶剂和由式1,2和3表示的一种或多种含芳族环的聚合物：

公开(公告)号：US08420289B2

公开(公告)日：2013-04-16

申请号：US12588023

申请日：2009-10-01

Applicant: Min Soo Kim ,  Dong Seon Uh ,  Chang Il Oh ,  Kyong Ho Yoon ,  Kyung Hee Hyung ,  Jin Kuk Lee ,  Jong-Seob Kim ,  Hwan Sung Cheon ,  Irina Nam ,  Nataliya Tokareva

Inventor： Min Soo Kim ,  Dong Seon Uh ,  Chang Il Oh ,  Kyong Ho Yoon ,  Kyung Hee Hyung ,  Jin Kuk Lee ,  Jong-Seob Kim ,  Hwan Sung Cheon ,  Irina Nam ,  Nataliya Tokareva

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/40 ,  G03F7/11 ,  G03F7/028

CPC classification number: G03F7/091

Abstract: An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.

Abstract translation: 含芳环的聚合物，聚合物混合物，抗反射硬掩模组​​合物和用于在基材上图案化材料的方法，所述含芳族环的聚合物包括至少一种由式1,2所示的含芳族环的聚合物或 3。

公开(公告)号：US20120168213A1

公开(公告)日：2012-07-05

申请号：US13311920

申请日：2011-12-06

Applicant: Young Woo PARK ,  Arum Amy Yu ,  Nam Ju Kim ,  Hyun Min Choi ,  Jin Seong Park ,  Dong Seon Uh

Inventor： Young Woo PARK ,  Arum Amy Yu ,  Nam Ju Kim ,  Hyun Min Choi ,  Jin Seong Park ,  Dong Seon Uh

IPC: H05K1/09

CPC classification number: H05K3/323 ,  B32B7/02 ,  B32B27/08 ,  B32B27/18 ,  B32B27/26 ,  B32B27/38 ,  B32B2250/02 ,  B32B2250/24 ,  B32B2264/102 ,  B32B2264/12 ,  B32B2307/202 ,  B32B2307/706 ,  B32B2457/202 ,  C08J5/18 ,  C08J2363/00 ,  C09J163/00 ,  G02F1/13452 ,  H01R4/04 ,  Y10T428/1055

Abstract: An apparatus includes a first member including a plurality of first electrodes on a first substrate, a second member including a plurality of second electrodes on a second substrate, the second electrodes facing the first electrodes of the first member, and an anisotropic conductive film (ACF) between the first member and the second member, the ACF having a double-layered structure and electrically connecting the first member and the second member, the ACF including an epoxy resin with a polycyclic aromatic ring and exhibiting a minimum melt viscosity of about 3,000 Pa·s to about 10,000 Pa·s at about 30° C. to about 200° C.

Abstract translation: 一种装置包括：第一构件，包括在第一衬底上的多个第一电极，第二构件，在第二衬底上包括多个第二电极，第二电极面对第一构件的第一电极;以及各向异性导电膜（ACF ），所述ACF具有双层结构并且电连接所述第一构件和所述第二构件，所述ACF包括具有多环芳环的环氧树脂并且具有约3,000Pa的最小熔体粘度 在约30℃至约200℃的温度下至约10,000Pa·s

公开(公告)号：US08057700B2

公开(公告)日：2011-11-15

申请号：US12329139

申请日：2008-12-05

Applicant: Jae-Min Oh ,  Dong-Seon Uh ,  Jae-Deuk Yang ,  Tae-Hyoung Kwak

Inventor： Jae-Min Oh ,  Dong-Seon Uh ,  Jae-Deuk Yang ,  Tae-Hyoung Kwak

IPC: C09K19/56 ,  G02F1/1337

CPC classification number: G02F1/133723 ,  C09K19/56 ,  G02F1/133788 ,  Y10T428/1005 ,  Y10T428/1018 ,  Y10T428/1023

Abstract: One embodiment of the present invention provides a liquid crystal photo-alignment agent that includes a polyamic acid copolymer including a repeating unit having the following Formula 1 and a repeating unit having the following Formula 2; a polyimide copolymer including a repeating unit having the following Formula 3 and a repeating unit having the following Formula 4; or a combination thereof: wherein the definition of R1 to R8 are the same as in the specification. The liquid crystal photo-alignment agent can have improved liquid crystal alignment properties, electrical characteristics such as voltage holding ratio, pretilt angle, residual DC, and the like, printability, cleaning stability, and spot stability, and is capable of unidirectionally aligning liquid crystals by ultraviolet (UV) exposure.

Abstract translation: 本发明的一个实施方案提供一种液晶光取向剂，其包括含有具有下式1的重复单元和具有下式2的重复单元的聚酰胺酸共聚物; 包含具有下式3的重复单元和具有下式4的重复单元的聚酰亚胺共聚物; 或其组合：其中R1至R8的定义与说明书中的相同。 液晶光取向剂可以具有改善的液晶取向性，电压保持率，预倾角，残留DC等的电特性，可印刷性，清洁稳定性和光斑稳定性，并且能够将液晶 通过紫外线（UV）曝光。

公开(公告)号：US20110241175A1

公开(公告)日：2011-10-06

申请号：US13160544

申请日：2011-06-15

Applicant: Sang Ran KOH ,  Sang Kyun KIM ,  Sang Hak LIM ,  Mi Young KIM ,  Hui Chan YUN ,  Do Hyeon KIM ,  Dong Seon UH ,  Jong Seob KIM

Inventor： Sang Ran KOH ,  Sang Kyun KIM ,  Sang Hak LIM ,  Mi Young KIM ,  Hui Chan YUN ,  Do Hyeon KIM ,  Dong Seon UH ,  Jong Seob KIM

IPC: H01L29/02 ,  C08G77/38 ,  H01L21/31

CPC classification number: G03F7/0752 ,  C08G77/18 ,  C08L83/04 ,  C09D183/04 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/0332

Abstract: A hardmask composition for forming a resist underlayer film, a process for producing a semiconductor integrated circuit device, and a semiconductor integrated circuit device, the hardmask composition including an organosilane polymer, and a stabilizer, the stabilizer including one of acetic anhydride, methyl acetoacetate, propionic anhydride, ethyl-2-ethylacetoacetate, butyric anhydride, ethyl-2-ethylacetoacetate, valeric anhydride, 2-methylbutyric anhydride, nonanol, decanol, undecanol, dodecanol, propylene glycol propyl ether, propylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol, phenyltrimethoxysilane, diphenylhexamethoxydisiloxane, diphenylhexaethoxydisiloxane, dioctyltetramethyldisiloxane, hexamethyltrisiloxane, tetramethyldisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethyldisiloxane, and mixtures thereof.

Abstract translation: 用于形成抗蚀剂下层膜的硬掩模组合物，半导体集成电路器件的制造方法和半导体集成电路器件，所述硬掩模组合物包含有机硅烷聚合物和稳定剂，所述稳定剂包括乙酸酐，乙酰乙酸甲酯， 丙酸酐，2-乙基乙酰乙酸乙酯，丁酸酐，2-乙基乙酰乙酸乙酯，戊酸酐，2-甲基丁酸酐，壬醇，癸醇，十一烷醇，十二烷醇，丙二醇丙醚，丙二醇乙醚，丙二醇甲醚，丙烯 乙二醇，苯基三甲氧基硅烷，二苯基六甲氧基二硅氧烷，二苯基六乙氧基二硅氧烷，二辛基四甲基二硅氧烷，六甲基三硅氧烷，四甲基二硅氧烷，十甲基四硅氧烷，十二甲基五硅氧烷，六甲基二硅氧烷及其混合物。

公开(公告)号：US07862990B2

公开(公告)日：2011-01-04

申请号：US12003732

申请日：2007-12-31

Applicant: Kyong Ho Yoon ,  Jong Seob Kim ,  Dong Seon Uh ,  Chang Il Oh ,  Kyung Hee Hyung ,  Min Soo Kim ,  Jin Kuk Lee

Inventor： Kyong Ho Yoon ,  Jong Seob Kim ,  Dong Seon Uh ,  Chang Il Oh ,  Kyung Hee Hyung ,  Min Soo Kim ,  Jin Kuk Lee

IPC: G03F7/11 ,  G03F7/40

CPC classification number: G03F7/091 ,  C08G61/02 ,  C08G61/10 ,  G03F7/11 ,  Y10S438/952

Abstract: An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.

Abstract translation: 抗反射硬掩模组​​合物包括有机溶剂，引发剂和至少一种如说明书中所述由式A，B或C表示的聚合物。

公开(公告)号：US07829638B2

公开(公告)日：2010-11-09

申请号：US11348203

申请日：2006-02-06

Applicant: Dong Seon Uh ,  Chang Il Oh ,  Do Hyeon Kim ,  Jin Kuk Lee ,  Irina Nam

Inventor： Dong Seon Uh ,  Chang Il Oh ,  Do Hyeon Kim ,  Jin Kuk Lee ,  Irina Nam

IPC: G03F7/11 ,  G03F7/039

CPC classification number: G03F7/091

Abstract: Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.

Abstract translation: 提供了具有抗平滑印刷工艺中有用的抗反射性能的硬掩模组合物，其使用方法以及通过这些方法制造的半导体器件。