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    CVD APPARATUS
    2.
    发明申请
    CVD APPARATUS 审中-公开
    CVD装置

    公开(公告)号：US20110121503A1

    公开(公告)日：2011-05-26

    申请号：US12850738

    申请日：2010-08-05

    申请人： BRIAN H. BURROWS ,  Ronald Stevens ,  Jacob Grayson ,  Joshua J. Podesta ,  Sandeep Nijhawan ,  Lori D. Washington ,  Alexander Tam ,  Sumedh Acharya

    发明人： BRIAN H. BURROWS ,  Ronald Stevens ,  Jacob Grayson ,  Joshua J. Podesta ,  Sandeep Nijhawan ,  Lori D. Washington ,  Alexander Tam ,  Sumedh Acharya

    IPC分类号： B23Q3/00

    CPC分类号： H01L21/67115 ,  C23C16/4412 ,  C23C16/4584 ,  C23C16/481 ,  H01L21/68742 ,  H01L21/68792

    摘要： Embodiments of the present invention generally relate to methods and apparatus for chemical vapor deposition (CVD) on a substrate, and, in particular, to a process chamber and components for use in metal organic chemical vapor deposition. The apparatus comprises a chamber body defining a process volume. A showerhead in a first plane defines a top portion of the process volume. A carrier plate extends across the process volume in a second plane forming an upper process volume between the showerhead and the susceptor plate. A transparent material in a third plane defines a bottom portion of the process volume forming a lower process volume between the carrier plate and the transparent material. A plurality of lamps forms one or more zones located below the transparent material. The apparatus provides uniform precursor flow and mixing while maintaining a uniform temperature over larger substrates thus yielding a corresponding increase in throughput.

    摘要翻译： 本发明的实施方案一般涉及用于基板上的化学气相沉积（CVD）的方法和装置，特别涉及用于金属有机化学气相沉积中的处理室和组件。 该装置包括限定处理量的室主体。 第一平面中的喷头定义了处理量的顶部。 载体板在第二平面中延伸过程体积，形成在喷头和基座板之间的上过程体积。 在第三平面中的透明材料限定了处理体积的底部，其在承载板和透明材料之间形成较低的处理体积。 多个灯形成位于透明材料下方的一个或多个区域。 该装置提供均匀的前体流动和混合，同时在较大的底物上保持均匀的温度，从而产生相应的生产量的增加。

    High temperature anneal with improved substrate support
    5.
    发明授权
    High temperature anneal with improved substrate support 有权
    具有改进的基板支撑的高温退火

    公开(公告)号：US07704327B2

    公开(公告)日：2010-04-27

    申请号：US10261391

    申请日：2002-09-30

    申请人： Ann P. Waldhauer ,  Juan M. Chacin ,  Brian H. Burrows

    发明人： Ann P. Waldhauer ,  Juan M. Chacin ,  Brian H. Burrows

    IPC分类号： C23C16/44 ,  C23F1/00 ,  H01L21/306 ,  F27B5/14 ,  C23C16/06 ,  C23C16/22

    CPC分类号： C23C16/4585

    摘要： A method including removing an impurity from a gas stream to a processing chamber at a point of use. An apparatus with a point of use purifier on a gas stream. An apparatus including a shelf having dimensions suitable for placement within a thermal processing including a body of a material that renders the body opaque to radiation frequency range used for a temperature measurement of a substrate in a thermal processing chamber.

    摘要翻译： 一种方法，包括在使用点从气流中除去杂质至处理室。 在气流上具有使用点净化器的装置。 一种装置，其包括适于放置在热处理中的尺寸的搁板，该热处理包括使得身体不透明于用于在热处理室中的基板的温度测量的辐射频率范围的材料的主体。

    CROSS FLOW APPARATUS AND METHOD FOR HYDRIDE VAPOR PHASE DEPOSITION
    7.
    发明申请
    CROSS FLOW APPARATUS AND METHOD FOR HYDRIDE VAPOR PHASE DEPOSITION 审中-公开
    交叉流动装置和液体蒸气相沉积方法

    公开(公告)号：US20080276860A1

    公开(公告)日：2008-11-13

    申请号：US11747133

    申请日：2007-05-10

    申请人： BRIAN H. BURROWS ,  Jacob Grayson ,  Nyi O. Myo ,  Ronald Stevens ,  Kenric T. Choi ,  Sumedh Acharya ,  Sandeep Nijhawan ,  Lori D. Washington

    发明人： BRIAN H. BURROWS ,  Jacob Grayson ,  Nyi O. Myo ,  Ronald Stevens ,  Kenric T. Choi ,  Sumedh Acharya ,  Sandeep Nijhawan ,  Lori D. Washington

    IPC分类号： C30B23/02 ,  C23C16/34

    CPC分类号： C23C16/481 ,  C23C16/303 ,  C23C16/4488 ,  C30B25/02 ,  C30B29/403 ,  C30B35/00

    摘要： A method and apparatus for hydride vapor phase epitaxial (HVPE) deposition is disclosed. In the HVPE process, a hydride gas flows over a metal source to react with the metal source, which then reacts at the surface of a substrate to deposit a metal nitride layer. The metal source comprises gallium, aluminum, and/or indium. The hydride gas is evenly provided over the metal source to increase efficiency of hydride-metal source reaction. An exhaust positioned diametrically across the chamber from the metal source creates a cross flow of the hydride-metal source product and nitrogen precursor across the chamber tangential to the substrate. A purge gas flowing perpendicular to the cross flow directs the hydride-metal source product and nitrogen precursor to remain as close to the substrate as possible.

    摘要翻译： 公开了一种用于氢化物气相外延（HVPE）沉积的方法和装置。 在HVPE工艺中，氢化物气体流过金属源以与金属源反应，金属源然后在衬底的表面反应以沉积金属氮化物层。 金属源包括镓，铝和/或铟。 氢化物气体均匀地设置在金属源上，以提高氢化物 - 金属源反应的效率。 从金属源沿直径方向跨过腔室排出的排气物产生与衬底相切的跨过腔室的氢化物 - 金属源产物和氮前体的交叉流。 垂直于交叉流动流动的净化气体引导氢化物 - 金属源产物和氮前体尽可能靠近基底。

    Actuator for facilitating performance of work in a nuclear reactor
    8.
    发明授权
    Actuator for facilitating performance of work in a nuclear reactor 失效
    促进核反应堆工作的执行者

    公开(公告)号：US5864595A

    公开(公告)日：1999-01-26

    申请号：US853280

    申请日：1997-05-09

    申请人： Brian H. Burrows ,  Neal J. Goldberg ,  Michael A. Flanigan ,  Michael Y. Suekawa

    发明人： Brian H. Burrows ,  Neal J. Goldberg ,  Michael A. Flanigan ,  Michael Y. Suekawa

    IPC分类号： G21C19/00 ,  G21C19/20

    CPC分类号： G21C19/00 ,  G21C17/01 ,  G21C19/207 ,  G21Y2002/202 ,  G21Y2002/203 ,  G21Y2002/204 ,  G21Y2002/205 ,  G21Y2002/208 ,  G21Y2002/304 ,  G21Y2002/401 ,  G21Y2002/501 ,  G21Y2004/501 ,  G21Y2004/504

    摘要： An actuator for performing work in a nuclear reactor is described. In one embodiment, the actuator includes an x-axis linear slide assembly, a y-axis linear slide assembly, and a z-axis linear slide assembly. The x-axis linear slide assembly is mounted to a junction box, the y-axis linear slide assembly is mounted on a carriage of the x-axis assembly, and the z-axis linear slide assembly is mounted on a carriage of the y-axis assembly. The actuator also includes motor assemblies coupled to respective linear slide assemblies. Each motor assembly includes a motor and a resolver sealed in a leakproof can. Pulley-timing belt assemblies couple each motor to a respective lead screw. Specifically, a drive pulley is connected to a rotor shaft of each motor, and a lead screw pulley is secured to an end of each lead screw. Each pulley-timing belt assembly also includes an idler pulley, and a belt extends around the lead screw pulley, the idler pulley, and the drive pulley. The motor assemblies are mounted so that the axis of each motor is substantially parallel to the axis the respective lead screw. By mounting motor assemblies in this configuration, the overall dimensions of the actuator are believed to be minimized when each slide assembly is fully retracted. The actuator further includes a delivery system interface for firmly attaching the actuator to a delivery system, and a tool mounting platform attached to the z-axis linear slide assembly. Threaded openings are located on the platform face and are used to secure various attachments to the platform. Many different attachments, such as an ultrasonic inspection unit, a brushing unit, and an electrical discharge machine (EDM) unit, can be secured to the platform.

    摘要翻译： 描述了用于在核反应堆中进行工作的致动器。 在一个实施例中，致动器包括x轴线性滑动组件，y轴线性滑动组件和z轴线性滑动组件。 x轴线性滑动组件安装到接线盒，y轴线性滑块组件安装在x轴组件的滑架上，z轴线性滑块组件安装在y轴线性滑块组件的滑架上， 轴组件。 致动器还包括联接到相应的线性滑动组件的马达组件。 每个电动机组件包括电动机和密封在防漏罐中的旋转变压器。 皮带轮定时皮带组件将每个电机连接到相应的导螺杆。 具体地说，驱动皮带轮连接到每个马达的转子轴上，并且导螺杆滑轮固定在每个导螺杆的端部。 每个滑轮同步皮带组件还包括惰轮，并且皮带围绕导螺杆滑轮，惰轮和驱动皮带轮延伸。 马达组件被安装成使得每个马达的轴线基本上平行于相应导螺杆的轴线。 通过将电机组件安装在这种构造中，当每个滑动组件完全缩回时，认为致动器的总体尺寸被最小化。 致动器还包括用于将致动器牢固地附接到输送系统的输送系统接口，以及附接到z轴线性滑动组件的工具安装平台。 螺纹开口位于平台面上，用于将各种附件固定在平台上。 许多不同的附件，例如超声波检查单元，刷洗单元和放电机（EDM）单元可以固定到平台上。