知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

13 条记录 (耗时 0.015 秒)

    Method and system for detection of wafer centering in a track lithography tool
    1.
    发明授权
    Method and system for detection of wafer centering in a track lithography tool 失效
    用于在轨道光刻工具中检测晶圆定心的方法和系统

    公开(公告)号：US07497026B2

    公开(公告)日：2009-03-03

    申请号：US11763352

    申请日：2007-06-14

    申请人： Harald Herchen ,  Lily Pang ,  Erica Porras

    发明人： Harald Herchen ,  Lily Pang ,  Erica Porras

    IPC分类号： H01L21/00 ,  G01B9/00

    CPC分类号： G01D5/342

    摘要： A system for measuring substrate concentricity includes a substrate support member adapted to rotate a substrate around a substantially vertical axis. The substrate includes a mounting surface and a process surface. The system also includes a spin cup positioned below the substrate and a translatable arm mounted a predetermined distance above the process surface of the substrate. The translatable arm is adapted to translate along a radius of the substrate. The system further includes an optical emitter mounted on the translatable arm and an optical detector mounted on the translatable arm.

    摘要翻译： 用于测量衬底同心度的系统包括适于围绕基本垂直轴线旋转衬底的衬底支撑构件。 衬底包括安装表面和工艺表面。 该系统还包括位于基底下方的旋转杯，以及安装在衬底的工艺表面上方预定距离的可平移臂。 可平移臂适于沿着基底的半径平移。 该系统还包括安装在可平移臂上的光发射器和安装在可平移臂上的光学探测器。

    Current collimation for thin seed and direct plating
    2.
    发明申请
    Current collimation for thin seed and direct plating 审中-公开
    目前准种子为薄种子和直接电镀

    公开(公告)号：US20060102467A1

    公开(公告)日：2006-05-18

    申请号：US10988646

    申请日：2004-11-15

    申请人： Harald Herchen ,  John Dukovic ,  Lily Pang

    发明人： Harald Herchen ,  John Dukovic ,  Lily Pang

    IPC分类号： C25C3/16 ,  C25B9/00 ,  C25D17/00

    CPC分类号： C25D17/008 ,  C25D7/123 ,  C25D17/001 ,  C25D17/007

    摘要： A method and apparatus for plating a conductive material onto a substrate is provided. The apparatus includes a fluid processing cell having a fluid basin configured to contain an electrolyte solution and having an opening configured to receive a substrate for processing, an anode assembly positioned in the fluid basin, and a collimator positioned in the fluid basin between the anode assembly and the opening.

    摘要翻译： 提供了一种用于将导电材料电镀到基底上的方法和装置。 该装置包括流体处理池，流体池被配置为容纳电解质溶液，并且具有构造成接收用于处理的基板的开口，定位在流体池中的阳极组件和位于阳极组件之间的流体池中的准直器 和开幕。

    Electric field reducing thrust plate
    3.
    发明申请
    Electric field reducing thrust plate 失效
    电场减压推力板

    公开(公告)号：US20050284754A1

    公开(公告)日：2005-12-29

    申请号：US10877137

    申请日：2004-06-24

    申请人： Harald Herchen ,  Dmitry Lubomirsky ,  Bo Zheng ,  Lily Pang

    发明人： Harald Herchen ,  Dmitry Lubomirsky ,  Bo Zheng ,  Lily Pang

    IPC分类号： C25D7/12 ,  C25D17/06 ,  H01L21/288

    CPC分类号： C25D7/12 ,  C25D17/06 ,  H01L21/2885

    摘要： A method and apparatus for an electrochemical processing cell that is configured to minimize bevel and backside deposition. The apparatus includes a contact ring assembly for supporting a substrate, a thrust plate movably positioned to engage a substrate positioned on the contact pins, and a lip seal member positioned to contact the thrust plate and the contact ring to prevent fluid flow therebetween. The lip seal includes a at least one bubble release channel formed therethrough. The method includes positioning an electric field barrier between a backside substrate engaging member and a frontside substrate supporting member to prevent electric field from traveling to the bevel and backside of the substrate. The electric field barrier including at least one bubble release channel formed therethrough.

    摘要翻译： 一种用于电化学处理电池的方法和装置，其被配置为最小化斜面和背面沉积。 该装置包括用于支撑基板的接触环组件，可移动地定位成接合位于接触销上的基板的止动板，以及定位成接触推力板和接触环以防止其间流体流动的唇形密封件。 唇形密封件包括通过其形成的至少一个气泡释放通道。 该方法包括在背面基板接合构件和前侧基板支撑构件之间定位电场屏障，以防止电场行进到基板的斜面和背面。 电场屏障包括至少一个通过其形成的气泡释放通道。

    Gas distribution system for a CVD processing chamber
    4.
    发明授权
    Gas distribution system for a CVD processing chamber 有权
    用于CVD处理室的气体分配系统

    公开(公告)号：US06486081B1

    公开(公告)日：2002-11-26

    申请号：US09449203

    申请日：1999-11-24

    申请人： Tetsuya Ishikawa ,  Padmanabhan Krishnaraj ,  Feng Gao ,  Alan W. Collins ,  Lily Pang

    发明人： Tetsuya Ishikawa ,  Padmanabhan Krishnaraj ,  Feng Gao ,  Alan W. Collins ,  Lily Pang

    IPC分类号： H01L2131

    CPC分类号： C23C16/45514 ,  C23C16/401 ,  C23C16/4411 ,  C23C16/455 ,  C23C16/45563 ,  C23C16/45578 ,  C23C16/507 ,  H01J37/3244 ,  H01L21/67069

    摘要： The present invention provides an apparatus for depositing a film on a substrate comprising a processing chamber, a substrate support member disposed within the chamber, a first gas inlet, a second gas inlet, a plasma generator and a gas exhaust. The first gas inlet provides a first gas at a first distance from an interior surface of the chamber, and the second gas inlet provides a second gas at a second distance that is closer than the first distance from the interior surface of the chamber. Thus, the second gas creates a higher partial pressure adjacent the interior surface of the chamber to significantly reduce deposition from the first gas onto the interior surface. The present invention also provides a method for depositing a FSG film on a substrate comprising: introducing first gas through a first gas inlet at a first distance from an interior surface of the chamber, and introducing a second gas through a second gas inlet at a second distance from the interior surface of the chamber, wherein the second gas creates a higher partial pressure adjacent the interior surface of the chamber to prevent deposition from the first gas on the interior surface. Alternatively, the first gas is introduced at a different angle from the second gas with respect to a substrate surface.

    摘要翻译： 本发明提供一种用于在基板上沉积膜的装置，包括处理室，设置在室内的基板支撑件，第一气体入口，第二气体入口，等离子体发生器和排气。 第一气体入口从腔室的内表面提供第一距离的第一气体，并且第二气体入口提供第二距离离第二距离距离腔室内表面的第一距离。 因此，第二气体在室的内表面附近产生较高的分压，以显着地减少从第一气体到内表面的沉积。 本发明还提供了一种用于在衬底上沉积FSG膜的方法，包括：将第一气体通过第一距离腔室的内表面的第一气体入口引入，并将第二气体通过第二气体入口引入第二气体 距离室的内表面的距离，其中第二气体在室的内表面附近产生较高的分压，以防止内表面上的第一气体沉积。 或者，第一气体相对于衬底表面以与第二气体不同的角度被引入。

    METHOD AND SYSTEM FOR DETECTION OF WAFER CENTERING IN A TRACK LITHOGRAPHY TOOL
    9.
    发明申请
    METHOD AND SYSTEM FOR DETECTION OF WAFER CENTERING IN A TRACK LITHOGRAPHY TOOL 失效
    用于检测轨迹扫描工具中的波浪中心的方法和系统

    公开(公告)号：US20080168673A1

    公开(公告)日：2008-07-17

    申请号：US11763352

    申请日：2007-06-14

    申请人： Harald Herchen ,  Lily Pang ,  Erica Porras

    发明人： Harald Herchen ,  Lily Pang ,  Erica Porras

    IPC分类号： G01D21/00

    CPC分类号： G01D5/342

    摘要： A system for measuring substrate concentricity includes a substrate support member adapted to rotate a substrate around a substantially vertical axis. The substrate includes a mounting surface and a process surface. The system also includes a spin cup positioned below the substrate and a translatable arm mounted a predetermined distance above the process surface of the substrate. The translatable arm is adapted to translate along a radius of the substrate. The system further includes an optical emitter mounted on the translatable arm and an optical detector mounted on the translatable arm.

    摘要翻译： 用于测量衬底同心度的系统包括适于围绕基本垂直轴线旋转衬底的衬底支撑构件。 衬底包括安装表面和工艺表面。 该系统还包括位于基底下方的旋转杯，以及安装在衬底的工艺表面上方预定距离的可平移臂。 可平移臂适于沿着基底的半径平移。 该系统还包括安装在可平移臂上的光发射器和安装在可平移臂上的光学探测器。