Beam Adjustment Method and Three-Dimensional Powder Bed Fusion Additive Manufacturing Apparatus

    公开(公告)号:US20210407760A1

    公开(公告)日:2021-12-30

    申请号:US17324301

    申请日:2021-05-19

    申请人: JEOL Ltd.

    发明人: Shio En Takashi Sato

    摘要: A beam adjustment method includes: installing, on an irradiation surface to which an electron beam is radiated, a detection part having a Faraday cup catching electrical charges of the electron beam, and installing, on a side of an electron gun further than the detection part, a shielding plate having opening holes through which the electron beam is passable. The method includes causing, upon performing beam diameter measurement processing, the electron beam to pass through the opening holes, and radiating the electron beam to the Faraday cup. In addition, the method includes radiating, upon performing normal processing, the electron beam to the shielding plate.

    Apparatus and techniques for angled etching using multielectrode extraction source

    公开(公告)号:US11195703B2

    公开(公告)日:2021-12-07

    申请号:US16682888

    申请日:2019-11-13

    IPC分类号: H01J37/32 G02B5/18 H01J37/147

    摘要: A plasma source may include a plasma chamber, where the plasma chamber has a first side, defining a first plane and an extraction assembly, disposed adjacent to the side of the plasma chamber, where the extraction assembly includes at least two electrodes. A first electrode may be disposed immediately adjacent the side of the plasma chamber, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture. The first aperture may define a lateral displacement from the second aperture along a second direction, parallel to the first plane, wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane.

    Charged Particle Beam Apparatus
    65.
    发明申请

    公开(公告)号:US20210375583A1

    公开(公告)日:2021-12-02

    申请号:US17394925

    申请日:2021-08-05

    摘要: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.

    Charged particle beam device and method for inspecting and/or imaging a sample

    公开(公告)号:US11183361B1

    公开(公告)日:2021-11-23

    申请号:US16878193

    申请日:2020-05-19

    摘要: A charged particle beam device for imaging and/or inspecting a sample is described. The charged particle beam device includes a beam emitter for emitting a primary charged particle beam, the charged particle beam device adapted for guiding the primary charged particle beam along an optical axis to the sample for releasing signal particles; a retarding field device for retarding the primary charged particle beam before impinging on the sample, the retarding field device including an objective lens and a proxy electrode, wherein the proxy electrode includes an opening allowing a passage of the primary charged particle beam and of the signal particles; a first detector for off-axial backscattered particles between the proxy electrode and the objective lens; and a pre-amplifier for amplifying a signal of the first detector, wherein the pre-amplifier is at least one of (i) integrated with the first detector, (ii) arranged adjacent to the first detector inside a vacuum housing of the charged particle beam device, and (iii) fixedly mounted in a vacuum chamber of the charged particle beam device. Further, a method for imaging and/or inspecting a sample with a charged particle beam device is described.

    Charged particle beam system
    67.
    发明授权

    公开(公告)号:US11164715B2

    公开(公告)日:2021-11-02

    申请号:US17021724

    申请日:2020-09-15

    摘要: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.

    Charged particle scanners
    68.
    发明授权

    公开(公告)号:US11152190B2

    公开(公告)日:2021-10-19

    申请号:US16853529

    申请日:2020-04-20

    摘要: A volume interrogation system can use an accelerated beam of charged particles to interrogate objects using charged-particle attenuation and scattering tomography to screen items such as electronic devices, packages, baggage, industrial products, or food products for the presence of materials of interest inside. The apparatus, systems, and methods in this patent document can be employed in checkpoint applications to scan items. Such checkpoint applications can include border crossings, mass transit terminals (subways, buses, railways, ferries, etc.), and government and private-sector facilities.

    Charged particle beam apparatus
    69.
    发明授权

    公开(公告)号:US11139144B2

    公开(公告)日:2021-10-05

    申请号:US16482765

    申请日:2017-03-24

    摘要: The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample. Accordingly, the present invention proposes a charged particle beam apparatus that is provided with an objective lens for converging charged particle beams emitted from a charged particle source, and a detector for detecting charged particles emitted from a sample, wherein: the objective lens includes an inner magnetic path and an outer magnetic path which are formed so as to enclose a coil; the inner magnetic path comprises a first inner magnetic path disposed at a position opposite to an optical axis of the charged particle beams and a second inner magnetic path which is formed at a slant with respect to the optical axis of the charged particle beams and which includes a leading end of the magnetic path; and a detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end of the magnetic path and that is parallel to the optical axis of the charged particle beams.

    Electron beam vaporizer and method for vaporizing a vaporization material by means of an electron beam

    公开(公告)号:US11133154B2

    公开(公告)日:2021-09-28

    申请号:US16379807

    申请日:2019-04-10

    发明人: Carsten Deus

    摘要: According to various embodiments, a method for vaporizing a vaporization material by means of an electron beam may include the following: generating a first deflection pattern having a first power density at least on an end face of a rod-shaped vaporization material; and, subsequently, generating a second deflection pattern having a second power density on a portion of an outer edge of the rod-shaped vaporization material and a portion of an inner edge of a ring crucible, which encloses the rod-shaped vaporization material, wherein the second power density is greater than the first power density.