公开(公告)号：US20210391139A1

公开(公告)日：2021-12-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan OTTEN ,  Peter-Paul CRANS ,  Marc SMITS ,  Laura DEL TIN ,  Christan TEUNISSEN ,  Yang-Shan HUANG ,  Stijn Wilem, Herman, Karel STEENBRINK ,  Xuerang HU ,  Qingpo XI ,  Xinan LUO ,  Xuedong LIU

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/18 ,  H01J37/14 ,  H01J37/147 ,  H01J37/244

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

公开(公告)号：US20230280293A1

公开(公告)日：2023-09-07

申请号：US18111503

申请日：2023-02-17

Applicant: ASML Netherlands B.V.

Inventor： Xuerang HU ,  Xinan LUO ,  Qingpo XI ,  Xuedong LIU ,  Weiming REN

IPC: G01N23/225 ,  G01N21/95 ,  H01J37/244 ,  H01J37/32

CPC classification number: G01N23/225 ,  G01N21/9501 ,  H01J37/244 ,  H01J37/32321 ,  H01J2237/082 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.

公开(公告)号：US20220262594A1

公开(公告)日：2022-08-18

申请号：US17662453

申请日：2022-05-09

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Xinan LUO ,  Zhongwei CHEN

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/05 ,  H01J37/14 ,  H01J37/244 ,  H01J37/28

Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.