公开(公告)号：US20120085923A1

公开(公告)日：2012-04-12

申请号：US13082361

申请日：2011-04-07

Applicant: Steven Thomas Coyle ,  John Andrew Hunt

Inventor： Steven Thomas Coyle ,  John Andrew Hunt

IPC: G21K5/08

CPC classification number: G01N1/32 ,  H01J37/31 ,  H01J2237/026 ,  H01J2237/2007 ,  H01J2237/3118

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. Additionally, apparatus kits are disclosed that enable the use of the same shields in the observation of prepared samples.

Abstract translation: 公开了用于使用实施例的离子束样品制备装置和方法的实施方案。 该装置包括在真空室中的离子束照射装置，其可以将离子定向到样品，阻挡部分朝向样品的离子的屏蔽件，以及具有屏蔽保持装置的屏蔽保持台，该屏蔽保持装置可替换地和可移除地将屏蔽保持在 一个位置。 当屏蔽保持在屏蔽保持阶段时，屏蔽具有与屏蔽保持平台上的辅助基准特征相交的基准特征。 屏蔽件具有能够将样品耐久地粘附到屏蔽件的特征，以用离子束处理样品。 屏蔽和屏蔽保持阶段的补充基准特征使得样品能够准确和可重复地定位在用于样品处理和再处理的设备中。 此外，公开了能够在观察制备的样品时使用相同屏蔽的装置套件。

公开(公告)号：US08051799B2

公开(公告)日：2011-11-08

申请号：US11769919

申请日：2007-06-28

Applicant: Yousuke Itagaki ,  Natsuko Ito ,  Fumihiko Uesugi

Inventor： Yousuke Itagaki ,  Natsuko Ito ,  Fumihiko Uesugi

IPC: B05C11/00

CPC classification number: C23C16/4404 ,  H01J37/09 ,  H01J37/16 ,  H01J37/32467 ,  H01J37/32477 ,  H01J2237/022 ,  H01J2237/026

Abstract: An apparatus includes a housing defining a chamber in which an electric field is generated, and an internal member provided in the chamber. At least one part of the internal member is formed of a dielectric material. A process is executed in the chamber so that a dielectric deposit is formed on the at least one part of the internal member. An m1(d∈1/dm1) value of the dielectric material and an m2(d∈2/dm2) value of the dielectric deposit are set so that production of particles from the deposit is properly controlled. The term m1 is a mass density of the dielectric material, ∈1 is a permittivity of the dielectric material, m2 is a mass density of the dielectric deposit, and ∈2 is a permittivity of the dielectric deposit.

Abstract translation: 一种装置包括限定其中产生电场的室的壳体和设置在室中的内部构件。 内部构件的至少一部分由电介质材料形成。 在室中执行处理，使得在内部构件的至少一个部分上形成介电沉积物。 电介质材料的m1（d∈1/ dm1）值和电介质沉积物的m2（d∈2/ dm2）值被设定为使得从沉积物中产生的颗粒被适当地控制。 术语m1是介电材料的质量密度，ε1是介电材料的介电常数，m2是介电沉积物的质量密度，∈2是电介质沉积物的介电常数。

公开(公告)号：US20110240881A1

公开(公告)日：2011-10-06

申请号：US13047018

申请日：2011-03-14

Applicant: Hiroya Miyazaki

Inventor： Hiroya Miyazaki

IPC: G21K5/08

CPC classification number: H01J37/20 ,  H01J2237/026 ,  H01J2237/2001 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/26 ,  H01J2237/2802

Abstract: The present disclosure significantly reduces the waiting time from inserting a specimen holder into an electron microscope until high quality data acquisition is possible. Characterizing the present disclosure, it is a specimen holder partly made of low thermal expansion material. The low thermal expansion material can be any of group 4, 5 or 6 in the periodic table of the elements.

Abstract translation: 本公开显着地减少了将样品架插入电子显微镜直到高质量数据采集成为可能的等待时间。 表征本公开，它是部分由低热膨胀材料制成的试样保持器。 低热膨胀材料可以是元素周期表中的4,5,6族中的任何一种。

公开(公告)号：US20110155059A1

公开(公告)日：2011-06-30

申请号：US12974245

申请日：2010-12-21

Applicant: Akihiro Egami ,  Toshikazu Nakazawa ,  Katsuhiro Suzuki ,  Shinya Hasegawa

Inventor： Akihiro Egami ,  Toshikazu Nakazawa ,  Katsuhiro Suzuki ,  Shinya Hasegawa

IPC: C23C16/50 ,  C23C16/00

CPC classification number: C23C14/564 ,  C23C14/0036 ,  C23C14/34 ,  C23C16/4401 ,  C23C16/45591 ,  C23C16/4585 ,  H01J37/32477 ,  H01J37/32651 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3441 ,  H01J2237/026 ,  H01J2237/0268

Abstract: The inventors of this invention conducted a test and found out that to prevent peel-off of an adherent film, it is not of essential importance to set the radius of curvature equal to or larger than a predetermined threshold. The inventors of the present invention also found out that peel-off of an adherent film occurs in the region in which the curvature of a shield changes and is less likely to occur when the change in curvature of the shield is small. Accordingly, the key to the problem is the magnitude of a change in curvature of the shield, so changing the curvature stepwise makes it possible to suppress a large change in curvature, and thus to prevent peel-off of an adherent film free from any disadvantages such as deterioration in film thickness distribution, which may occur due to an increase in size of the shield.

Abstract translation: 本发明人进行了测试，发现为了防止粘附膜的剥离，将曲率半径设定为等于或大于预定阈值不是重要的。 本发明的发明人还发现，粘合膜的剥离发生在屏蔽的曲率变化的区域中，并且当屏蔽的曲率变化小时不太可能发生。 因此，问题的关键在于屏蔽体的曲率变化的大小，因此逐渐改变曲率使得可以抑制曲率的大的变化，从而防止粘附膜的剥离没有任何缺点 例如由于屏蔽件的尺寸增加而可能发生的膜厚分布的劣化。

公开(公告)号：US20110056746A1

公开(公告)日：2011-03-10

申请号：US12715735

申请日：2010-03-02

Applicant: Kasegn D. Tekletsadik ,  Russell J. Low

Inventor： Kasegn D. Tekletsadik ,  Russell J. Low

IPC: H02G3/00 ,  H01B7/00

CPC classification number: H01J37/3171 ,  H01J37/09 ,  H01J37/16 ,  H01J2237/0206 ,  H01J2237/026 ,  H01J2237/038 ,  H01J2237/08

Abstract: An apparatus includes a conductive structure and an insulated conductor disposed proximate an exterior portion of the conductive structure to modify an electric field about the conductive structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kilovolts (kV)/inch disposed about a conductor.

Abstract translation: 一种装置包括导电结构和布置在导电结构的外部附近的绝缘导体，以修改围绕导电结构的电场。 绝缘导体具有介于绝缘体上的介电强度大于75千伏（kV）/英寸的导体周围。

公开(公告)号：US20050230621A1

公开(公告)日：2005-10-20

申请号：US11106368

申请日：2005-04-14

Applicant: Klaus Edinger ,  Josef Sellmair ,  Thorsten Hofmann

Inventor： Klaus Edinger ,  Josef Sellmair ,  Thorsten Hofmann

IPC: G01N23/00 ,  G01N23/227 ,  H01J37/02 ,  H01J37/28

CPC classification number: H01J37/026 ,  G01N23/2273 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/0044 ,  H01J2237/026

Abstract: An apparatus for investigating and/or modifying a sample with charged particles, in particular a scanning electron microscope, is provided. The apparatus comprises a beam (1, 2) of charged particles, a shielding element (10) having an opening (30) for the beam of charged particles to pass through, wherein the opening (30) is sufficiently small and the shielding element (10) sufficiently closely positioned to the surface (20) of the sample to reduce the influence of charge accumulation effects at the surface on the beam of charged particles.

Abstract translation: 提供了一种用于研究和/或修饰具有带电粒子的样品的装置，特别是扫描电子显微镜。 该设备包括带电粒子的束（1,2），具有用于带电粒子束通过的开口（30）的屏蔽元件（10），其中开口（30）足够小并且屏蔽元件 10）足够紧密地定位于样品的表面（20），以减少带电粒子束上的表面处的电荷累积效应的影响。

公开(公告)号：US5981963A

公开(公告)日：1999-11-09

申请号：US952102

申请日：1997-11-17

Applicant: Franz Kampmeier

Inventor： Franz Kampmeier

IPC: B05C9/14 ,  B29C35/08 ,  B29C35/10 ,  B29C37/00 ,  G21K5/04 ,  G21K5/10 ,  H01J37/317 ,  H01J37/30

CPC classification number: B29C37/0089 ,  B29C35/10 ,  G21K5/04 ,  G21K5/10 ,  H01J37/317 ,  B29C2035/0877 ,  H01J2237/026 ,  H01J2237/316

Abstract: An electron-beam system for curing plastic layers on workpieces has an irradiation chamber, an electron gun, a transport device for conveying workpieces into the irradiation chamber, and a shield as radiation protection. In order to achieve a high throughput of workpieces and effective shielding, provision is made of two or more blocking devices, which can be moved with reference to the transport device and which are arranged in each case as radiation protection on the transport device upstream and downstream of the irradiation chamber, specifically at a spacing in the conveying direction of the transport device in such a way that at least one workpiece fits between two blocking devices.

Abstract translation: PCT No.PCT / EP97 / 01215 Sec。 371日期：1997年11月17日 102（e）日期1997年11月17日PCT 1997年3月10日PCT公布。 公开号WO97 / 35325 日期1997年9月25日用于固化工件上的塑料层的电子束系统具有照射室，电子枪，用于将工件输送到照射室中的输送装置和作为辐射防护的屏蔽。 为了实现高产量的工件和有效的屏蔽，提供了两个或更多个阻挡装置，其可以参考运输装置移动，并且在每种情况下被布置为在运输装置上游和下游的辐射防护 特别是在输送装置的输送方向上的间隔，使得至少一个工件适合于两个阻挡装置之间。

公开(公告)号：US5149968A

公开(公告)日：1992-09-22

申请号：US755844

申请日：1991-09-06

Applicant: Mitsugu Sato

Inventor： Mitsugu Sato

IPC: H01J37/09 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J37/244 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/24435 ,  H01J2237/2448 ,  H01J2237/24507

Abstract: This invention relates to a scanning electron microscope for detecting secondary electrons from above an objective lens and obtaining an observation image, wherein a shield electrode is disposed for shielding an electric field on an optical axis in order to prevent a primary electron beam from being bent by the electric field generated by a secondary electron detector, a mechanism is provided so as to move the shield electrode to a first position at which the shield electrode shields the electric field on the optical axis and to a second position at which a secondary electron can be collected sufficiently by the electric field, and the shield electrode is moved to the first position during observation by a low acceleration voltage and to a second position during observation by a high acceleration voltage.

公开(公告)号：US20240352574A1

公开(公告)日：2024-10-24

申请号：US18303318

申请日：2023-04-19

Applicant: Applied Materials, Inc.

Inventor： Sundarapandian Ramaling Vijayalaskshmi REDDY ,  Jianxin LEI ,  Kirankumar Neelasandra SAVANDAIAH ,  Zheyuan CHEN ,  Avinash NAYAK

IPC: C23C14/34 ,  C23C14/00 ,  C23C14/06

CPC classification number: C23C14/34 ,  C23C14/0036 ,  C23C14/0641 ,  H01J37/3244 ,  H01J37/3417 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/332

Abstract: A process kit assembly for a process station that includes a cover ring and a shield. The shield includes a lower shield portion configured to interleave with the cover ring. The shield also includes an upper shield portion including a shield port extending from an inner side to an outer side of the upper shield portion. The upper shield portion further includes a shadow surface formed on the inner side configured to shadow the shield port from sputtering deposits. The upper shield portion further includes an upper shield shoulder formed on the outer side. The upper shield portion further includes a lower shield shoulder formed on a lower end of the upper shield portion. The upper shield portion is engageable with an adapter to form an annular chamber around the outer side between the upper shield shoulder and the lower shield shoulder.

公开(公告)号：US12106932B2

公开(公告)日：2024-10-01

申请号：US17617624

申请日：2019-06-13

Applicant: DECTRIS AG

Inventor： Radosav Pantelic ,  Vittorio Boccone

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J2237/026 ,  H01J2237/2802

Abstract: An electron detector comprises a sensor module comprising a sensor for detecting electrons, and an electronics module comprising circuitry for processing signals received from the sensor module. Wiring is provided for electrically connecting the sensor module to the electronics module. An adaptor is arranged between the sensor module and the electronics module. The adaptor comprises a passage for the wiring, and shielding elements for shielding from radiation.