公开(公告)号：US06893850B2

公开(公告)日：2005-05-17

申请号：US09808745

申请日：2001-03-15

Applicant: Emanuele Ostuni ,  Ravi Kane ,  George M. Whitesides ,  Rebecca J. Jackman ,  David C. Duffy

Inventor： Emanuele Ostuni ,  Ravi Kane ,  George M. Whitesides ,  Rebecca J. Jackman ,  David C. Duffy

IPC: G01N33/48 ,  B01J19/00 ,  C12N1/00 ,  C12N11/06 ,  C40B60/14 ,  B32B31/00 ,  C12N11/08 ,  C12B11/14

CPC classification number: B82Y30/00 ,  B01J19/0046 ,  B01J2219/00317 ,  B01J2219/00427 ,  B01J2219/0043 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00617 ,  B01J2219/00621 ,  B01J2219/00659 ,  B01J2219/00743 ,  B82Y5/00 ,  C12M21/08 ,  C12M25/04 ,  C12M25/08 ,  C12M33/00 ,  C12N11/06 ,  C40B60/14

Abstract: The present invention provides a masking system for selectively applying cells to predetermined regions of a surface. A mask is positioned adjacent to a surface to cover some portions of the surface while allowing other portions of the surface to remain uncovered. Cells then are applied to uncovered portions of the surface and the mask removed. Alternatively, a cell-adhesion promoter is applied to uncovered portions of the surface, and then cells are applied to the surface before or after removal of the mask from the surface. The masking system can be pre-coated, at least on those surfaces which will come into contact with cells, with a cell-adhesion inhibitor to resist absorption of cells and thereby avoid cell damage when the mask is removed (if cells are deposited prior to removal of the mask). A polymeric elastomeric mask that comes into cohesive-conformal contact with a surface to be patterned can be used.

Abstract translation: 本发明提供了一种用于选择性地将电池施加到表面的预定区域的掩模系统。 掩模邻近表面定位以覆盖表面的一些部分，同时允许表面的其它部分保持未被覆盖。 然后将细胞施加到表面的未覆盖部分并除去掩模。 或者，将细胞粘附促进剂施加到表面的未覆盖部分，然后在从表面除去掩模之前或之后将细胞施加到表面。 掩蔽系统可以至少在与细胞接触的那些表面上预先涂覆有细胞粘附抑制剂以抵抗细胞的吸收，从而在去除掩模时避免细胞损伤（如果细胞在 去除面膜）。 可以使用与要图案化的表面粘合保形接触的聚合物弹性体掩模。

公开(公告)号：US06887665B2

公开(公告)日：2005-05-03

申请号：US09922426

申请日：2001-08-03

Applicant: Mark Trulson ,  Glenn McGall ,  Jacqueline Fidanza

Inventor： Mark Trulson ,  Glenn McGall ,  Jacqueline Fidanza

IPC: B01J19/00 ,  C07B61/00 ,  C07H21/00 ,  C07K1/04 ,  C12Q1/68 ,  C40B40/06 ,  C40B50/14 ,  C40B60/14 ,  C07H21/04 ,  C07G1/00

CPC classification number: B82Y30/00 ,  B01J19/0046 ,  B01J2219/00427 ,  B01J2219/00432 ,  B01J2219/00529 ,  B01J2219/00576 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00608 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00675 ,  B01J2219/00711 ,  B01J2219/00722 ,  C07B2200/11 ,  C07H21/00 ,  C07K1/04 ,  C07K1/045 ,  C12Q1/6837 ,  C40B40/06 ,  C40B50/14 ,  C40B60/14 ,  Y02P20/55

Abstract: Radiation-activated catalysts (RACs), autocatalytic reactions, and protective groups are employed to achieve a highly sensitive, high resolution, radiation directed combinatorial synthesis of pattern arrays of diverse polymers. When irradiated, RACs produce catalysts that can react with enhancers, such as those involved in autocatalytic reactions. The autocatalytic reactions produce at least one product that removes protecting groups from synthesis intermediates. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.

Abstract translation: 辐射活化的催化剂（RAC），自催化反应和保护基被用于实现高灵敏度，高分辨率的辐射定向组合合成各种聚合物的图案阵列。 当照射时，RAC产生可与增强剂反应的催化剂，例如参与自催化反应的那些。 自催化反应产生至少一种从合成中间体中除去保护基的产物。 本发明具有广泛的应用，并且对聚合物的固相组合合成特别有用。

公开(公告)号：US20040137606A1

公开(公告)日：2004-07-15

申请号：US10703553

申请日：2003-11-10

Inventor： Moon Youn Jung ,  Dong Ho Shin ,  Hae Sik Yang ,  Yong Shin Kim ,  Tae Hwan Yoon ,  Chi Hoon Jun ,  Yun Tae Kim ,  Seung Youl Kang ,  Yong Eui Lee ,  Seong Deok Ahn ,  Kyung Soo Suh

IPC: C12M001/34 ,  B05D003/00

CPC classification number: B82Y30/00 ,  B01J19/0046 ,  B01J2219/00427 ,  B01J2219/00432 ,  B01J2219/00675 ,  B01J2219/00711 ,  B01J2219/00722 ,  C40B40/06 ,  C40B50/14 ,  C40B60/14

Abstract: The present invention relates to the transmissive programmable mask for forming biomolecules such as DNA or polymer array by irradiating specific cells with incident lights, and to the method for forming the biomolecules or polymer array using the same. Each unit pixel of the programmable mask comprises, a solution which includes charged particles which are moved by electrophoresis and interrupt the progress of the incident light, and electrodes for applying voltages to the particles in order to adjust the transmissivity of the incident light by changing the arrangement of the particles.

Abstract translation: 本发明涉及通过用入射光照射特定细胞来形成生物分子如DNA或聚合物阵列的透射可编程掩模，以及使用其形成生物分子或聚合物阵列的方法。 可编程掩模的每个单位像素包括：溶液，其包括通过电泳移动并中断入射光的进行的带电粒子，以及用于向粒子施加电压的电极，以通过改变入射光来调节入射光的透射率 排列的颗粒。

公开(公告)号：US06667394B2

公开(公告)日：2003-12-23

申请号：US09841405

申请日：2001-04-24

Applicant: R. Fabian Pease ,  Glenn McGall ,  Martin J. Goldberg ,  Richard P. Rava ,  Stephen P. A. Fodor ,  Virginia Goss ,  Lubert Stryer ,  James L. Winkler

Inventor： R. Fabian Pease ,  Glenn McGall ,  Martin J. Goldberg ,  Richard P. Rava ,  Stephen P. A. Fodor ,  Virginia Goss ,  Lubert Stryer ,  James L. Winkler

IPC: C07H2100

CPC classification number: G03F7/00 ,  B01J19/0046 ,  B01J2219/00378 ,  B01J2219/00382 ,  B01J2219/00385 ,  B01J2219/00427 ,  B01J2219/00432 ,  B01J2219/00454 ,  B01J2219/00527 ,  B01J2219/00529 ,  B01J2219/00585 ,  B01J2219/0059 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00608 ,  B01J2219/00612 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00689 ,  B01J2219/00711 ,  B01J2219/00722 ,  B01J2219/00725 ,  B41M3/00 ,  B82Y30/00 ,  C07B2200/11 ,  C07H21/00 ,  C07K1/047 ,  C40B40/06 ,  C40B40/10 ,  C40B50/14 ,  C40B60/14

Abstract: A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.

公开(公告)号：US20030008386A1

公开(公告)日：2003-01-09

申请号：US10229812

申请日：2002-08-27

Inventor： Jay K. Bass ,  Jacqueline Tso

IPC: B05D003/00 ,  C12Q001/68 ,  G01N033/53 ,  G01N033/542 ,  C12M001/34

CPC classification number: C07H21/00 ,  B01J19/0046 ,  B01J2219/0036 ,  B01J2219/00378 ,  B01J2219/00385 ,  B01J2219/00427 ,  B01J2219/00527 ,  B01J2219/00576 ,  B01J2219/00585 ,  B01J2219/0059 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00722 ,  B05B17/0607 ,  C07B2200/11 ,  C40B40/06 ,  C40B60/14

Abstract: Methods, devices and apparatus are disclosed for carrying out multiple chemical reactions, such as in situ synthesis of polynucleotides, on a surface comprising an array of discrete sites. Molecules are deposited at a predetermined number of the discrete sites on the surface for reaction at the discrete sites. The surface is positioned relative to an outlet of a fluid ejection device, which is activated to dispense a small volume of a fluid through the outlet to the surface to provide uniform coating of a continuous region of the surface comprising a multiple of the discrete sites. The fluid is dispensed as uniform particles having a diameter such that the uniform particles form a sheet to coat the continuous region of the surface. In one embodiment of the present invention, liquid is dispensed as uniform particles through a fluid ejection device activated by means of ultrasonic energy. The invention has particular application to the in situ synthesis of polynucleotides in arrays on a surface.

公开(公告)号：US20020147319A1

公开(公告)日：2002-10-10

申请号：US09841405

申请日：2001-04-24

Applicant: Affymetrix, Inc.

Inventor： R. Fabian Pease ,  Glenn McGall ,  Martin J. Goldberg ,  Richard P. Rava ,  Stephen P.A. Fodor ,  Virginia Goss ,  Lubert Stryer ,  James L. Winkler

IPC: C07H021/04 ,  B05D003/00

CPC classification number: G03F7/00 ,  B01J19/0046 ,  B01J2219/00378 ,  B01J2219/00382 ,  B01J2219/00385 ,  B01J2219/00427 ,  B01J2219/00432 ,  B01J2219/00454 ,  B01J2219/00527 ,  B01J2219/00529 ,  B01J2219/00585 ,  B01J2219/0059 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00608 ,  B01J2219/00612 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00689 ,  B01J2219/00711 ,  B01J2219/00722 ,  B01J2219/00725 ,  B41M3/00 ,  B82Y30/00 ,  C07B2200/11 ,  C07H21/00 ,  C07K1/047 ,  C40B40/06 ,  C40B40/10 ,  C40B50/14 ,  C40B60/14

Abstract: A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.

Abstract translation: 一种用于选择性地将印刷材料施加到基底上以在基底的选定区域合成寡核苷酸阵列的方法和装置。 印刷材料包括阻挡材料，单体序列，核苷，去保护剂，载体材料等。 该方法和装置还依赖于基于标准的基于DMT的化学，以及气相脱保护剂如固体TCA等。

公开(公告)号：US5599695A

公开(公告)日：1997-02-04

申请号：US395604

申请日：1995-02-27

Applicant: R. Fabian Pease ,  Glenn McGall ,  Martin J. Goldberg ,  Richard P. Rava ,  Stephen P. A. Fodor ,  Virginia Goss ,  Lubert Stryer ,  James L. Winkler

Inventor： R. Fabian Pease ,  Glenn McGall ,  Martin J. Goldberg ,  Richard P. Rava ,  Stephen P. A. Fodor ,  Virginia Goss ,  Lubert Stryer ,  James L. Winkler

IPC: B01J19/00 ,  B41M3/00 ,  C07H21/00 ,  C40B40/06 ,  C40B50/14 ,  C40B60/14 ,  G03F7/00 ,  C12P19/34 ,  C07H21/02 ,  C07K5/00 ,  G01N33/543

CPC classification number: C07H21/00 ,  B01J19/0046 ,  G03F7/00 ,  B01J2219/00378 ,  B01J2219/00382 ,  B01J2219/00385 ,  B01J2219/00427 ,  B01J2219/00454 ,  B01J2219/00527 ,  B01J2219/00529 ,  B01J2219/00585 ,  B01J2219/0059 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00608 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00621 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00639 ,  B01J2219/00659 ,  B01J2219/00722 ,  B41M3/00 ,  C40B40/06 ,  C40B50/14 ,  C40B60/14

Abstract: A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.

Abstract translation: 一种用于选择性地将印刷材料施加到基底上以在基底的选定区域合成寡核苷酸阵列的方法和装置。 印刷材料包括阻挡材料，单体序列，核苷，去保护剂，载体材料等。 该方法和装置还依赖于基于标准的基于DMT的化学，以及气相脱保护剂如固体TCA等。

公开(公告)号：US20160184788A1

公开(公告)日：2016-06-30

申请号：US14912365

申请日：2014-08-15

Applicant: EVONETIX LIMITED

Inventor： Daniel Arthur Hall ,  Christopher John Favero Jordan

IPC: B01J19/00

CPC classification number: B01J19/0046 ,  B01J2219/00427 ,  B01J2219/00441 ,  B01J2219/00495 ,  B01J2219/00653 ,  B01J2219/00716 ,  B01J2219/00722 ,  C40B50/18 ,  C40B60/14

Abstract: A method of creating a mask on a surface of a substrate is disclosed. The substrate comprises a plurality of spaced heating elements on or proximal to the surface. The method comprises applying a layer of masking material to the surface and employing the heating elements to apply energy to a phase change in the masking material at the selected sites such that it adheres to the surface or can be displaced from the surface to mask or unmask the selected sites respectively. A method of synthesising an array of molecules, an apparatus for selectively masking one or more sites on a surface and a semi-conductor chip that uses micro-heaters to modulate a masking layer on areas of the chip surface.

Abstract translation: 公开了一种在基板的表面上形成掩模的方法。 衬底包括在表面上或近表面上的多个间隔开的加热元件。 该方法包括将一层掩蔽材料施加到表面上并使用加热元件将能量施加到所选位置处的掩模材料中的相变，使得其粘附到表面或可以从表面移位以掩蔽或揭开 分别选定的网站。 合成分子阵列的方法，用于选择性地掩蔽表面上的一个或多个位点的装置和使用微加热器来调制芯片表面的区域上的掩蔽层的半导体芯片。

公开(公告)号：US20150177238A1

公开(公告)日：2015-06-25

申请号：US14635164

申请日：2015-03-02

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES ,  AZBIL CORPORATION

Inventor： Véronique MOURIER ,  Antoine HOANG ,  Shinsuke YAMASAKI

IPC: G01N33/543

CPC classification number: G01N33/54386 ,  B01J2219/00317 ,  B01J2219/00427 ,  B01J2219/00527 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00617 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00731 ,  C07H1/00 ,  G01N33/54353 ,  G01N33/54393 ,  G01N2400/00 ,  Y02P20/55 ,  Y10T436/143333

Abstract: The present invention relates to a process for the manufacturing of solid supports functionalized by saccharide type molecules (glycochips or carbohydrate arrays or alternatively oligosaccharide arrays). The present invention also relates to the glycochips directly obtained by such a manufacturing process and to their use, in particular for biological analysis and especially for the screening of saccharides or proteins such as Hepatocyte Growth Factors (HGFs) or for the study of saccharides/proteins interactions.

Abstract translation: 本发明涉及一种制备由糖型分子官能化的固体支持物（糖基片或碳水化合物阵列或另外是寡糖阵列）的方法。 本发明还涉及通过这样的制造方法直接获得的糖芯片及其用于特别是用于生物分析，特别是用于筛选糖或蛋白质如肝细胞生长因子（HGF）或用于糖/蛋白质研究的用途 互动

公开(公告)号：US08802600B2

公开(公告)日：2014-08-12

申请号：US11731748

申请日：2007-03-29

Applicant: David R. Rank ,  Jeffery Wegener ,  Jonas Korlach ,  Daniel Roitman ,  Yue Xu ,  John Lyle ,  Stephen Turner ,  Paul Peluso ,  Geoff Otto ,  Ron Cicero

Inventor： David R. Rank ,  Jeffery Wegener ,  Jonas Korlach ,  Daniel Roitman ,  Yue Xu ,  John Lyle ,  Stephen Turner ,  Paul Peluso ,  Geoff Otto ,  Ron Cicero

IPC: C40B99/00

CPC classification number: C12Q1/6874 ,  B01J19/0046 ,  B01J2219/00427 ,  B01J2219/0045 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00617 ,  B01J2219/00626 ,  B01J2219/00635 ,  B01J2219/00637 ,  B01J2219/00639 ,  B01J2219/00659 ,  B01J2219/00711 ,  B01J2219/00722 ,  B82Y20/00 ,  B82Y30/00 ,  C12Q1/6837 ,  Y10T29/49002 ,  C12Q2565/629 ,  C12Q2527/127

Abstract: Methods of producing substrates having selected active chemical regions by employing elements of the substrates in assisting the localization of active chemical groups in desired regions of the substrate. The methods may include optical, chemical and/or mechanical processes for the deposition, removal, activation and/or deactivation of chemical groups in selected regions of the substrate to provide selective active regions of the substrate.