公开(公告)号：US20150155138A1

公开(公告)日：2015-06-04

申请号：US14556503

申请日：2014-12-01

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Hiroshi MATSUMOTO

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/147 ,  H01J37/302 ,  H01J37/24

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/1471 ,  H01J37/243 ,  H01J37/3023 ,  H01J2237/0437

Abstract: A multi charged particle beam writing apparatus includes a divided shot data generation unit to generate, for each shot of multi beams of charged particle beams, data for plural times of divided shots such that irradiation for one shot of each beam is divided into plural times of divided shots each having a different irradiation time, an individual blanking system to provide blanking control individually for each of multi beams, based on the data for plural times of divided shots, an elastic rate correction value acquisition unit to acquire, for each of plural times of divided shots, an elastic rate correction value for correcting an elastic rate of an image of the whole multi beams, depending upon the number of ON-beams of the multi beams, and a lens to correct, for each divided shot, the elastic rate of the image of the whole multi beams by using the correction value.

Abstract translation: 多带电粒子束写入装置包括：分割镜头数据生成单元，对于多束带电粒子束的每个镜头，生成多次分割镜头的数据，使得每个光束的一次照射被分割成多次 各个具有不同照射时间的分割镜头，单独的消隐系统，用于基于多次分割镜头的数据为每个多光束分别提供消隐控制;弹性率校正值获取单元，用于多次获取 分割镜头的弹性速率校正值，用于根据多光束的ON光束的数量来校正整个多光束的图像的弹性率，以及用于针对每个分割镜头校正弹性率的透镜 的整个多光束的图像。

公开(公告)号：US09035550B2

公开(公告)日：2015-05-19

申请号：US13904098

申请日：2013-05-29

Applicant: JEOL Ltd.

Inventor： Mitsuru Yamada

IPC: H01J29/64 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J29/64 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1532

Abstract: A method of axially aligning a charged particle beam implemented by a charged particle beam system equipped with an astigmatic correction lens including a first pair of coils and a second pair of coils. The method starts with obtaining first to sixth sets of image data while varying currents flowing through the first to fourth coils according to first to sixth sets of conditions. Then, the values of the currents through the first to fourth coils for correcting the position of the axis of the beam are calculated based on the first to sixth sets of image data.

Abstract translation: 一种轴向对准带电粒子束的方法，该带电粒子束由装备有包括第一对线圈和第二对线圈的散光校正透镜的带电粒子束系统实现。 该方法开始于通过根据第一至第六组条件改变流经第一至第四线圈的电流而获得第一至第六组图像数据。 然后，基于第一至第六组图像数据计算用于校正光束的轴的位置的通过第一至第四线圈的电流的值。

公开(公告)号：US09024256B2

公开(公告)日：2015-05-05

申请号：US14453235

申请日：2014-08-06

Applicant: Board of Trustees of Michigan State University

Inventor： Chong-Yu Ruan ,  Martin Berz ,  Zhensheng Tao

IPC: H01J37/26 ,  G01N21/65 ,  G01N23/04 ,  G01N23/08 ,  H01J37/073 ,  H01J37/04 ,  H01J37/065 ,  H01J37/22 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/045 ,  H01J37/065 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/228 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/2802

Abstract: An electron microscope is provided. In another aspect, an electron microscope employs a radio frequency which acts upon electrons used to assist in imaging a specimen. Furthermore, another aspect provides an electron beam microscope with a time resolution of less than 1 picosecond with more than 105 electrons in a single shot or image group. Yet another aspect employs a super-cooled component in an electron microscope.

Abstract translation: 提供电子显微镜。 在另一方面，电子显微镜使用射频，其作用于用于辅助成像试样的电子。 此外，另一方面提供一种电子束显微镜，其单次或图像组中的时间分辨率小于1皮秒，超过105个电子。 另一方面在电子显微镜中使用超冷却组分。

公开(公告)号：US20140346355A1

公开(公告)日：2014-11-27

申请号：US14453235

申请日：2014-08-06

Applicant: Board of Trustees of Michigan State University

Inventor： Chong-Yu Ruan ,  Martin Berz ,  Zhensheng Tao

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/073 ,  H01J37/22 ,  H01J37/147

CPC classification number: H01J37/263 ,  H01J37/045 ,  H01J37/065 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/228 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/2802

Abstract: An electron microscope is provided. In another aspect, an electron microscope employs a radio frequency which acts upon electrons used to assist in imaging a specimen. Furthermore, another aspect provides an electron beam microscope with a time resolution of less than 1 picosecond with more than 105 electrons in a single shot or image group. Yet another aspect employs a super-cooled component in an electron microscope.

Abstract translation: 提供电子显微镜。 在另一方面，电子显微镜使用射频，其作用于用于辅助成像试样的电子。 此外，另一方面提供一种电子束显微镜，其单次或图像组中的时间分辨率小于1皮秒，超过105个电子。 另一方面在电子显微镜中使用超冷却组分。

公开(公告)号：US20140239190A1

公开(公告)日：2014-08-28

申请号：US14184931

申请日：2014-02-20

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik OH ,  Ho Seob KIM ,  Dae Wook KIM ,  Seung Joon AHN

IPC: H01J37/10

CPC classification number: H01J37/1471 ,  H01J2237/1205 ,  H01J2237/1516

Abstract: Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam.

Abstract translation: 本文公开了具有双重对准器的微柱。 微柱被配置成使得当限制孔的孔的轴线与粒子束的原始路径间隔开时，可以有效地补偿粒子束的路径，使得粒子束的路径 通过双重对准器与限制孔径的孔径对准。 微柱包括源透镜。 源透镜包括补偿粒子束的路径的至少两个对准器层。

公开(公告)号：US08716673B2

公开(公告)日：2014-05-06

申请号：US13306032

申请日：2011-11-29

Applicant: Brian Roberts Routh, Jr.

Inventor： Brian Roberts Routh, Jr.

IPC: H01J49/08 ,  H01J49/10 ,  H01J37/30

CPC classification number: H01J37/285 ,  G01T1/28 ,  H01J27/16 ,  H01J37/05 ,  H01J37/077 ,  H01J37/08 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/265 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3056 ,  H01J2237/0817 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/31749

Abstract: A single column inductively coupled plasma source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the ICP to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.

Abstract translation: 具有用户可选配置的单列电感耦合等离子体源以离子模式操作，用于FIB操作或用于SEM操作的电子模式。 配备了X射线检测器，可进行能量色散X射线光谱分析。 用户可以选择性地配置ICP以制备离子模式或FIB模式的样品，然后基本上翻转选择电子模式或SEM模式的开关，并使用EDS或其他类型的分析来分析样品。

公开(公告)号：US08710453B2

公开(公告)日：2014-04-29

申请号：US13341487

申请日：2011-12-30

Applicant: N. William Parker

Inventor： N. William Parker

IPC: H01J31/48

CPC classification number: H01J37/26 ,  H01J37/06 ,  H01J37/08 ,  H01J37/1471 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/0802 ,  H01J2237/083 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/31749

Abstract: A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described.

Abstract translation: 公开了透射电子显微镜（TEM），扫描透射电子显微镜（STEM），扫描电子显微镜（SEM）或聚焦离子束（FIB）系统等聚焦粒子束系统的带电粒子源。 该源在可以在带电粒子系统的轴线上居中的小区域内采用多个可独立寻址的发射器。 所有的发射器可以被单独控制以使得能够同时从一个或多个尖端发射。 只有一个发射器激活的模式对应于高亮度，而同时激活多个发射器的模式提供了较高亮度的较高角度强度。 可以通过连续使用单个发射器来扩展源寿命。 描述了用于所有发射器的组合的机械和电气校准程序。

公开(公告)号：US08653485B2

公开(公告)日：2014-02-18

申请号：US13397814

申请日：2012-02-16

Applicant: Marco Jan-Jaco Wieland ,  Alexander Hendrik Vincent Van Veen

Inventor： Marco Jan-Jaco Wieland ,  Alexander Hendrik Vincent Van Veen

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/30

CPC classification number: H01J37/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/1471 ,  H01J37/1478 ,  H01J37/30 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/0492

Abstract: The invention relates to a charged particle multi-beamlet lithographic system for exposing a target using a plurality of beamlets. The system comprises a beamlet generator for generating a plurality of beamlets, a beamlet blanker for controllably blanking beamlets, and an array of projection lens systems for projecting unblanked beamlets on to the surface of the target. The beamlet generator comprises at least one charged particle source for generating a charged particle beam, a sub-beam generator for defining a plurality of sub-beams from the charged particle beam, a sub-beam manipulator array for influencing the sub-beams, and an aperture array for defining beamlets from the sub-beams.

Abstract translation: 本发明涉及一种用于使用多个子束曝光目标的带电粒子多子束光刻系统。 该系统包括用于产生多个子束的子波发生器，用于可控制地遮挡子束的子束消除器，以及用于将未平坦化的子束投影到目标表面上的投影透镜系统的阵列。 小波发生器包括用于产生带电粒子束的至少一个带电粒子源，用于从带电粒子束定义多个子光束的子光束发生器，用于影响子光束的子光束操纵器阵列，以及 用于从子光束定义子束的孔径阵列。

公开(公告)号：US08384048B2

公开(公告)日：2013-02-26

申请号：US12146331

申请日：2008-06-25

Applicant: John C. Wiesner

Inventor： John C. Wiesner

IPC: G01N23/00

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/244 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/2025 ,  H01J2237/20292 ,  H01J2237/2485 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/30455

Abstract: The invention provides a method for patterning a resist coated substrate carried on a stage, where the patterning utilizes a charged particle beam. The method comprises the steps of: moving the stage at a nominally constant velocity in a first direction; while the stage is moving, deflecting the charged particle beam in the first direction to compensate for the movement of the stage, the deflecting including: (a) compensating for an average velocity of the stage; and (b) separately compensating for the difference between an instantaneous position of the stage and a calculated position based on the average velocity. The separately compensating step uses a bandwidth of less than 10 MHz. The invention also provides a deflector control circuit for implementing the separate compensation functions.

Abstract translation: 本发明提供了一种用于图案化承载在载物台上的抗蚀剂涂覆的基底的方法，其中图案化使用带电粒子束。 该方法包括以下步骤：在第一方向以标称恒定的速度移动舞台; 当舞台正在移动时，使带电粒子束沿第一方向偏转以补偿舞台的移动，偏转包括：（a）补偿舞台的平均速度; 和（b）基于平均速度分别补偿载物台的瞬时位置与计算的位置之间的差。 单独的补偿步骤使用小于10MHz的带宽。 本发明还提供一种用于实现单独补偿功能的偏转器控制电路。

公开(公告)号：US08368016B1

公开(公告)日：2013-02-05

申请号：US12007511

申请日：2008-01-11

Applicant: Mamoru Nakasuji ,  Takao Kato ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe

Inventor： Mamoru Nakasuji ,  Takao Kato ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe

IPC: H01J37/26

CPC classification number: H01J3/10 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J3/021 ,  H01J37/063 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/3174 ,  H01J2237/06316 ,  H01J2237/2817

Abstract: An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

Abstract translation: 电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置 从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准 电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度 电子束发射与光轴方向不对准。