Semiconductor package including a power plane and a ground plane
    24.
    发明授权
    Semiconductor package including a power plane and a ground plane 有权
    半导体封装包括电源平面和接地平面

    公开(公告)号:US08796839B1

    公开(公告)日:2014-08-05

    申请号:US13345449

    申请日:2012-01-06

    IPC分类号: H01L23/04

    摘要: An apparatus that comprises a power ground/arrangement that comprises a first semiconductor die configured as a central processing unit (CPU). The power/ground arrangement further comprises a first metal layer that provides only one of (i) a power signal and (ii) a ground signal, and a second metal layer that provides the other one of (i) the power signal and (ii) the ground signal. The apparatus further comprises a second semiconductor die configured as a memory that is coupled to the power/ground arrangement. The second semiconductor die is configured to receive power signals and ground signals from the power/ground arrangement. The second semiconductor die is further configured to provide signals to the CPU via the power/ground arrangement and to receive signals from the CPU via the power/ground arrangement. The second semiconductor die is coupled to the power/ground arrangement only along a single side of the second semiconductor die.

    摘要翻译: 一种包括电源接地/布置的装置,包括被配置为中央处理单元(CPU)的第一半导体管芯。 电源/接地装置还包括仅提供(i)功率信号和(ii)接地信号中的一个的第一金属层和提供(i)功率信号和(ii)的另一个的第二金属层 )地面信号。 该装置还包括被配置为耦合到电源/接地装置的存储器的第二半导体管芯。 第二半导体管芯被配置为从电源/接地装置接收功率信号和接地信号。 第二半导体裸片还被配置为经由电源/接地装置向CPU提供信号,并且经由电源/接地布置从CPU接收信号。 第二半导体管芯仅沿着第二半导体管芯的单侧连接到电源/接地装置。

    Memory repair system and method
    27.
    发明授权
    Memory repair system and method 有权
    内存修复系统和方法

    公开(公告)号:US07948818B1

    公开(公告)日:2011-05-24

    申请号:US12827446

    申请日:2010-06-30

    IPC分类号: G11C7/00

    摘要: An integrated circuit (IC) comprises a memory module that stores at least one of data and code. A memory repair database stores data relating to defective memory addresses. A memory control module detects defective memory locations in the memory module, locates redundant memory elements in the memory module, and stores information that associates memory addresses of the defective memory locations with the redundant memory elements in the memory repair database. Storing said information includes electrically altering at least one of a plurality of electrical fuses. A redundant memory decoder module receives the information and physically remaps the memory addresses to the redundant memory locations.

    摘要翻译: 集成电路(IC)包括存储数据和代码中的至少一个的存储器模块。 存储器修复数据库存储与缺陷存储器地址有关的数据。 存储器控制模块检测存储器模块中的缺陷存储器位置,将冗余存储器元件定位在存储器模块中,并且存储将缺陷存储器位置的存储器地址与冗余存储器元件关联在存储器修复数据库中的信息。 存储所述信息包括电改变多个电保险丝中的至少一个。 冗余存储器解码器模块接收信息并将存储器地址物理地映射到冗余存储器位置。

    High density via and metal interconnect structures, and methods of forming the same
    28.
    发明授权
    High density via and metal interconnect structures, and methods of forming the same 有权
    高密度通孔和金属互连结构及其形成方法

    公开(公告)号:US07939445B1

    公开(公告)日:2011-05-10

    申请号:US12049229

    申请日:2008-03-14

    IPC分类号: H01L21/4763

    CPC分类号: H01L21/76816 H01L21/76838

    摘要: Methods and structures for interconnects in semiconductor devices are described. A method of forming a mask pattern for a metal layer in an interconnect can include searching a layout for a metal feature with a predetermined size and an interconnect layer aligned thereto, removing the metal feature from the layout to form a modified layout, and reforming the mask pattern using the modified layout. The metal interconnect may include a first pattern of metal lines, each having a minimum feature size in a layout view in no more than one dimension; a dielectric layer on or over the first pattern of metal lines, having a substantially planar horizontal upper surface; and vias or contacts in the dielectric layer, the vias or contacts contacting a top surface of the first pattern of metal lines and a top surface of silicon structures, vias, or contacts below the first pattern of metal lines.

    摘要翻译: 描述了半导体器件中互连的方法和结构。 在互连中形成用于金属层的掩模图案的方法可以包括搜索具有预定尺寸的金属特征的布局和与其对准的互连层,从布局去除金属特征以形成修改的布局,并且重新形成 掩模图案使用修改的布局。 金属互连可以包括金属线的第一图案,每个金属线在布局视图中具有不超过一个维度的最小特征尺寸; 金属线的第一图案上或之上的介电层,具有基本上平面的水平上表面; 以及电介质层中的通孔或触点,接触金属线的第一图案的顶表面的通孔或触点以及金属线的第一图案之下的硅结构,通孔或触点的顶表面。

    Stack die packages
    30.
    发明授权
    Stack die packages 有权
    堆栈包装

    公开(公告)号:US07825521B2

    公开(公告)日:2010-11-02

    申请号:US12434264

    申请日:2009-05-01

    申请人: Albert Wu Huahung Kao

    发明人: Albert Wu Huahung Kao

    IPC分类号: H01L23/48

    摘要: An integrated circuit package includes a substrate comprising a first contact. A first integrated circuit mechanically attached to the substrate. The first integrated circuit comprising a second contact. A first redistribution layer arranged on the first integrated circuit. The first redistribution layer includes a trace coupled to the second contact. A first wire connects the first contact to the second contact. A flip-chip integrated circuit comprises a third contact connected to the trace by a conductive bump. A second integrated circuit mechanically coupled to the flip-chip integrated circuit. The second integrated circuit comprises a fourth contact. A second wire connects the fourth contact to at least the second contact or the first contact.

    摘要翻译: 集成电路封装包括包括第一触点的基板。 机械地附接到基板的第一集成电路。 第一集成电路包括第二接触。 布置在第一集成电路上的第一再分配层。 第一再分配层包括耦合到第二接触的迹线。 第一线将第一触点连接到第二触点。 倒装芯片集成电路包括通过导电凸块连接到迹线的第三触点。 机械耦合到倒装芯片集成电路的第二集成电路。 第二集成电路包括第四触点。 第二线将第四触点连接到至少第二触点或第一触点。