INTEGRATED PASSIVE DEVICE (IPD) ON SUBTRATE
    17.
    发明申请
    INTEGRATED PASSIVE DEVICE (IPD) ON SUBTRATE 有权
    集成无源设备(IPD)

    公开(公告)号:US20150048480A1

    公开(公告)日:2015-02-19

    申请号:US13968627

    申请日:2013-08-16

    Abstract: Some novel features pertain to a semiconductor device that includes a substrate, a first cavity that traverses the substrate. The first cavity is configured to be occupied by a interconnect material (e.g., solder ball). The substrate also includes a first metal layer coupled to a first side wall of the first cavity. The substrate further includes a first integrated passive device (IPD) on a first surface of the substrate, the first IPD coupled to the first metal layer. In some implementations, the substrate is a glass substrate. In some implementations, the first IPD is one of at least a capacitor, an inductor and/or a resistor. In some implementations, the semiconductor device further includes a second integrated passive device (IPD) on a second surface of the substrate. The second IPD is coupled to the first metal layer.

    Abstract translation: 一些新颖的特征涉及一种半导体器件,其包括衬底,穿过衬底的第一腔体。 第一腔被配置为被互连材料(例如,焊球)占据。 衬底还包括耦合到第一腔的第一侧壁的第一金属层。 衬底还包括在衬底的第一表面上的第一集成无源器件(IPD),第一IPD耦合到第一金属层。 在一些实施方案中,基底是玻璃基底。 在一些实现中,第一IPD是至少一个电容器,电感器和/或电阻器中的一个。 在一些实施方式中,半导体器件还包括在衬底的第二表面上的第二集成无源器件(IPD)。 第二IPD耦合到第一金属层。

    Multi-layer interconnected spiral capacitor

    公开(公告)号:US09653533B2

    公开(公告)日:2017-05-16

    申请号:US14625484

    申请日:2015-02-18

    CPC classification number: H01L28/86 H01G4/33 H01L23/5223 H01L23/642 H01L28/60

    Abstract: An upper planar capacitor is spaced above a lower planar capacitor by a dielectric layer. A bridged-post inter-layer connector couples the capacitances in parallel, through first posts and second posts. The first posts and second posts extend through the dielectric layer, adjacent the upper and lower planar capacitors. A first level coupler extends under the dielectric layer and couples the first posts together and to a conductor of the lower planar capacitor, and couples another conductor of the lower planar capacitor to one of the second posts. A second level coupler extends above the dielectric layer, and couples the second posts together and to a conductor of the upper planar capacitor, and couples another conductor of the upper planar capacitor to one of the first posts.

    INDUCTOR STRUCTURE IN A SEMICONDUCTOR DEVICE
    19.
    发明申请
    INDUCTOR STRUCTURE IN A SEMICONDUCTOR DEVICE 有权
    电感器结构在半导体器件中的应用

    公开(公告)号:US20160372253A1

    公开(公告)日:2016-12-22

    申请号:US14746652

    申请日:2015-06-22

    Abstract: An inductor structure includes a first set of traces corresponding to a first layer of an inductor, a second set of traces corresponding to a second layer of the inductor, and a third set of traces corresponding to a third layer of the inductor that is positioned between the first layer and the second layer. The first set of traces includes a first trace and a second trace that is parallel to the first trace. A dimension of the first trace is different from a corresponding dimension of the second trace. The second set of traces is coupled to the first set of traces. The second set of traces includes a third trace that is coupled to the first trace and to the second trace. The third set of traces is coupled to the first set of traces.

    Abstract translation: 电感器结构包括对应于电感器的第一层的第一组迹线,对应于电感器的第二层的第二组迹线,以及对应于电感器的第三层的第三组迹线,其位于 第一层和第二层。 第一组轨迹包括与第一轨迹平行的第一轨迹和第二轨迹。 第一个跟踪的维度与第二个跟踪的相应维度不同。 第二组迹线耦合到第一组迹线。 第二组迹线包括耦合到第一迹线和第二迹线的第三迹线。 第三组迹线耦合到第一组迹线。

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