Methods Of Forming A Programmable Region That Comprises A Multivalent Metal Oxide Portion And An Oxygen Containing Dielectric Portion
    14.
    发明申请
    Methods Of Forming A Programmable Region That Comprises A Multivalent Metal Oxide Portion And An Oxygen Containing Dielectric Portion 有权
    形成包含多价金属氧化物部分的可编程区域和含有介电部分的氧气的方法

    公开(公告)号:US20140106534A1

    公开(公告)日:2014-04-17

    申请号:US14105623

    申请日:2013-12-13

    Abstract: A method of forming a memory cell includes forming one of multivalent metal oxide material or oxygen-containing dielectric material over a first conductive structure. An outer surface of the multivalent metal oxide material or the oxygen-containing dielectric material is treated with an organic base. The other of the multivalent metal oxide material or oxygen-containing dielectric material is formed over the treated outer surface. A second conductive structure is formed over the other of the multivalent metal oxide material or oxygen-containing dielectric material.

    Abstract translation: 形成存储单元的方法包括在第一导电结构上形成多价金属氧化物材料或含氧电介质材料之一。 用有机碱处理多价金属氧化物材料或含氧电介质材料的外表面。 另外的多价金属氧化物材料或含氧电介质材料形成在经处理的外表面上。 在多价金属氧化物材料或含氧介电材料的另一个上形成第二导电结构。

    Resistive memory devices
    17.
    发明授权

    公开(公告)号:US10090462B2

    公开(公告)日:2018-10-02

    申请号:US14960953

    申请日:2015-12-07

    Abstract: Electronic apparatus, systems, and methods can include a resistive memory cell having a structured as an operably variable resistance region between two electrodes and a metallic barrier disposed in a region between the dielectric and one of the two electrodes. The metallic barrier can have a structure and a material composition to provide oxygen diffusivity above a first threshold during program or erase operations of the resistive memory cell and oxygen diffusivity below a second threshold during a retention state of the resistive memory cell. Additional apparatus, systems, and methods are disclosed.

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