SEMICONDUCTOR DEVICE WITH SILICON CARBIDE EMBEDDED DUMMY PATTERN
    11.
    发明申请
    SEMICONDUCTOR DEVICE WITH SILICON CARBIDE EMBEDDED DUMMY PATTERN 审中-公开
    半导体器件与硅碳化物嵌入式模式

    公开(公告)号:US20150364549A1

    公开(公告)日:2015-12-17

    申请号:US14301348

    申请日:2014-06-11

    Applicant: MEDIATEK INC.

    Abstract: A semiconductor device with dummy patterns for alleviating micro-loading effect includes a semiconductor substrate having thereon a middle annular region between an inner region and an outer region; a SiC device on the semiconductor substrate within the inner region; and a plurality of dummy patterns provided on the semiconductor substrate within the middle annular region. At least one of the dummy patterns contains SiC.

    Abstract translation: 具有用于减轻微负载效应的虚设图形的半导体器件包括其内部区域和外部区域之间具有中间环形区域的半导体衬底; 在所述内部区域中的所述半导体衬底上的SiC器件; 以及设置在中间环形区域内的半导体衬底上的多个虚设图案。 至少一个虚拟图案包含SiC。

    Semiconductor device
    16.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US09543377B2

    公开(公告)日:2017-01-10

    申请号:US14548298

    申请日:2014-11-20

    Applicant: MEDIATEK INC.

    Abstract: A semiconductor device comprising a substrate is disclosed. The substrate comprises: a well of type one; a first doped region of type two, provided in the well of type one; a well of type two, adjacent to the well of type one; and a first doped region of type one, doped in the well of type two. The substrate comprises no isolating material provided in a current path formed by the first doped region of type two, the well of type one, the well of type two and the first doped region of type one.

    Abstract translation: 公开了一种包括衬底的半导体器件。 基材包括:一类的孔; 设置在类型1的阱中的类型2的第一掺杂区域; 一类二井,毗邻一井; 以及掺杂在类型2的阱中的第一掺杂区域。 衬底不包括设置在由第二类型的第一掺杂区,类型二的阱,类型二的阱和类型1的第一掺杂区形成的电流路径中的隔离材料。

    SEMICONDUCTOR DEVICE
    18.
    发明申请
    SEMICONDUCTOR DEVICE 有权
    半导体器件

    公开(公告)号:US20160148992A1

    公开(公告)日:2016-05-26

    申请号:US14548298

    申请日:2014-11-20

    Applicant: MEDIATEK INC.

    Abstract: A semiconductor device comprising a substrate is disclosed. The substrate comprises: a well of type one; a first doped region of type two, provided in the well of type one; a well of type two, adjacent to the well of type one; and a first doped region of type one, doped in the well of type two. The substrate comprises no isolating material provided in a current path formed by the first doped region of type two, the well of type one, the well of type two and the first doped region of type one.

    Abstract translation: 公开了一种包括衬底的半导体器件。 基材包括:一类的孔; 设置在类型1的阱中的类型2的第一掺杂区域; 一类二井,毗邻一井; 以及掺杂在类型2的阱中的第一掺杂区域。 衬底不包括设置在由第二类型的第一掺杂区,类型二的阱,类型二的阱和类型1的第一掺杂区形成的电流路径中的隔离材料。

    METHOD FOR CONTROLLING ELECTRICAL PROPERTY OF PASSIVE DEVICE DURING FABRICATION OF INTEGRATED COMPONENT AND RELATED INTEGRATED COMPONENT
    20.
    发明申请
    METHOD FOR CONTROLLING ELECTRICAL PROPERTY OF PASSIVE DEVICE DURING FABRICATION OF INTEGRATED COMPONENT AND RELATED INTEGRATED COMPONENT 有权
    一体化组件制造过程中被动设备电气性能及相关集成组件的方法

    公开(公告)号:US20140035096A1

    公开(公告)日:2014-02-06

    申请号:US13797992

    申请日:2013-03-12

    Applicant: MEDIATEK INC.

    CPC classification number: H01L22/14 H01L22/20

    Abstract: A method for controlling an electrical property of a passive device during a fabrication of an integrated component includes providing a substrate, manufacturing the passive device on the substrate, measuring the electrical property of the passive device to obtain a measuring result, determining at least one layout pattern corresponding to at least one later manufacturing process by the measuring result for adjusting the electrical property of the passive device, and continuing the rest of the fabrication including the at least one later manufacturing process of the integrated component.

    Abstract translation: 一种用于在集成部件的制造期间控制无源器件的电性能的方法包括提供衬底,在衬底上制造无源器件,测量无源器件的电性能以获得测量结果,确定至少一个布局 通过用于调整无源器件的电性能的测量结果对应于至少一个后续制造过程的模式,以及继续包括集成部件的至少一个后续制造过程的其余的制造。

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