知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

19 records (took 0.017 seconds)

    Charged Particle Gun and Charged Particle Beam System
    11.
    发明申请
    Charged Particle Gun and Charged Particle Beam System 有权

    公开(公告)号：US20250132118A1

    公开(公告)日：2025-04-24

    申请号：US18923770

    申请日：2024-10-23

    Applicant: JEOL Ltd.

    Inventor： Yuji Kohno ,  Hidetaka Sawada ,  Akihiro Ikeda

    IPC: H01J37/073 ,  H01J37/26

    Abstract: There is provided a charged particle gun capable of increasing the number of charged particles contained in each pulse. The charged particle gun operates to emit a charged particle beam and includes: an emitter, an extraction electrode for extracting the charged particle beam from the emitter, a capacitor having one end connected to the extraction electrode, an offset power supply for supplying a first voltage to the one end of the capacitor via a resistor, a pulsed power supply providing an output of a second voltage, and a switch circuit that switches between whether the second voltage or a reference potential is supplied to the other end of the capacitor, based on a reference pulsed signal.

    Electron Microscope and Aberration Measurement Method
    12.
    发明公开
    Electron Microscope and Aberration Measurement Method 审中-公开

    公开(公告)号：US20230349839A1

    公开(公告)日：2023-11-02

    申请号：US18125460

    申请日：2023-03-23

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Takeshi Kaneko ,  Shigeyuki Morishita ,  Yuji Kohno

    IPC: G01N23/18 ,  G01N23/04

    CPC classification number: G01N23/04 ,  G01N23/18 ,  G01N2223/3301 ,  G01N2223/418

    Abstract: An electron microscope includes an irradiation optical system that focuses electron beams and scans a specimen with the focused electron beams; a deflector that deflects the electron beams transmitted through the specimen; a detector that detects the electron beams transmitted through the specimen; and a control unit that controls the irradiation optical system and the deflector The control unit causes the irradiation optical system to scan the specimen with the electron beams so that the electron beams have a plurality of irradiation positions on the specimen. The control unit causes the deflector to repeatedly deflect the electron beams transmitted through each of the irradiation positions, so that a plurality of electron beams which have the same irradiation position and different incident angle ranges with respect to the specimen are caused to sequentially enter the detector.

    Electron microscope and measurement method
    13.
    发明授权
    Electron microscope and measurement method 有权

    公开(公告)号：US09859095B2

    公开(公告)日：2018-01-02

    申请号：US15151792

    申请日：2016-05-11

    Applicant: The University of Tokyo ,  JEOL Ltd.

    Inventor： Naoya Shibata ,  Yuji Kohno ,  Hidetaka Sawada

    IPC: H01J37/244 ,  H01J37/22 ,  H01J37/09 ,  H01J37/26 ,  H01J37/28

    CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J37/226 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/24578 ,  H01J2237/2614 ,  H01J2237/2802

    Abstract: An electron microscope is provided which can measure, with high sensitivity and high positional resolution, an amount of deflection of an electron beam occurring when it is transmitted through a sample. The electron microscope (100) is adapted to measure the amount of deflection of the electron beam (EB) when it is transmitted through the sample (S), and has an electron beam source (10) producing the electron beam (EB), an illumination lens system for focusing the electron beam (EB) onto the sample (S), an aperture (30) having an electron beam blocking portion (32) for providing a shield between a central portion (EB1) and an outer peripheral portion (EB2) of the cross section of the beam (EB) impinging on the sample (S), and a segmented detector (20) having a detection surface (22) for detecting the electron beam (EB) transmitted through the sample (S). The detection surface (22) is divided into a plurality of detector segments (D1-D4).

    CHROMATIC ABERRATION CORRECTOR AND ELECTRON MICROSCOPE
    14.
    发明申请
    CHROMATIC ABERRATION CORRECTOR AND ELECTRON MICROSCOPE 有权
    紫外线校正和电子显微镜

    公开(公告)号：US20140158901A1

    公开(公告)日：2014-06-12

    申请号：US14102838

    申请日：2013-12-11

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Fumio Hosokawa

    IPC: H01J37/153

    CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/12 ,  H01J2237/1405 ,  H01J2237/1534

    Abstract: The chromatic aberration corrector (100) has a first multipole element (110) for producing a first electromagnetic field and a second multipole element (120) for producing a second electromagnetic field. The first multipole element (110) first, second, and third portions (110a, 110b, 110c) arranged along an optical axis (OA) having a thickness and producing a quadrupole field in which an electric quadrupole field and a magnetic quadrupole field are superimposed. In the first and third portions (110a, 110c), the electric quadrupole field is set stronger than the magnetic quadrupole field. In the second portion (110b), the magnetic quadrupole field is set stronger than the electric quadrupole field. The second portion (110b) produces a two-fold astigmatism component that is opposite in sign to two-fold astigmatism components produced by the first portion (110a) and third portion (110c).

    Abstract translation: 色差校正器（100）具有用于产生第一电磁场的第一多极元件（110）和用于产生第二电磁场的第二多极元件（120）。 第一多极元件（110）沿着具有厚度并且产生四极场的光轴（OA）布置的第一，第二和第三部分（110a，110b，110c），其中电四极场和四极磁场被叠加 。 在第一和第三部分（110a，110c）中，电四极场被设置为比四极四极场强。 在第二部分（110b）中，将四极四极场设置得比电四极场强。 第二部分（110b）产生与由第一部分（110a）和第三部分（110c）产生的两折像散分量相反的双折射散光成分。

    Aberration Correcting Device and Electron Microscope
    15.
    发明公开
    Aberration Correcting Device and Electron Microscope 审中-公开

    公开(公告)号：US20230268155A1

    公开(公告)日：2023-08-24

    申请号：US18169270

    申请日：2023-02-15

    Applicant: JEOL Ltd.

    Inventor： Shigeyuki Morishita ,  Hidetaka Sawada

    IPC: H01J37/153 ,  H01J37/28

    CPC classification number: H01J37/153 ,  H01J37/28

    Abstract: An aberration correcting device includes a first multipole which generates a hexapole field; a second multipole which generates a hexapole field with a polarity opposite to a polarity of the hexapole filed generated by the first multipole; a third multipole which is disposed between the first multipole and the second multipole and generates an octupole field; a first transfer lens system disposed between the first multipole and the third multipole; and a second transfer lens system disposed between the third multipole and the second multipole. The first transfer lens system includes a plurality of fourth multipoles which generate a field in which an electromagnetic-field superposed quadrupole field and an octupole field are superposed; and the second transfer lens system includes a plurality of fifth multipoles which generate a field in which an electromagnetic-field superposed quadrupole field and an octupole field are superposed.

    METHOD FOR AXIAL ALIGNMENT OF CHARGED PARTICLE BEAM AND CHARGED PARTICLE BEAM SYSTEM
    18.
    发明申请
    METHOD FOR AXIAL ALIGNMENT OF CHARGED PARTICLE BEAM AND CHARGED PARTICLE BEAM SYSTEM 有权
    充电粒子束和充电粒子束系统的轴向对准方法

    公开(公告)号：US20140367585A1

    公开(公告)日：2014-12-18

    申请号：US14469898

    申请日：2014-08-27

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Takeo Sasaki

    IPC: H01J37/147 ,  H01J37/153

    CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/103 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/262

    Abstract: A method for axial alignment of a charged particle beam relative to at least three stages of multipole elements and a charged particle beam system capable of making the axial alignment. Some parts of the orbit of the beam or the distributions of three astigmatic fields, or both, are simultaneously translated in a direction perpendicular to the optical axis such that astigmatisms of the same order and same type due to axial deviations between successive ones of the astigmatic fields cancel.

    Abstract translation: 一种用于相对于多极元件的至少三级的带电粒子束和能够进行轴向对准的带电粒子束系统的轴向对准的方法。 光束轨道的一些部分或三个散光场或两者的分布在垂直于光轴的方向上同时平移，使得由于像散的连续散射之间的轴向偏差而具有相同阶数和相同类型的像散 字段取消。

Patent Agency Ranking