公开(公告)号：US20190172679A1

公开(公告)日：2019-06-06

申请号：US16141083

申请日：2018-09-25

Applicant: Glenn Lane Family Limited Liability Limited Partnership

Inventor： Glenn E. LANE

IPC: H01J37/30 ,  H01J49/06 ,  C23C14/54 ,  C23C14/48 ,  H01J37/317 ,  H01J37/08 ,  H01J37/09

Abstract: Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ion species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (CPC) superconductor, or boson energy transmission system.

公开(公告)号：US10249472B2

公开(公告)日：2019-04-02

申请号：US15648931

申请日：2017-07-13

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Dieter Winkler ,  Guy Eytan ,  Zvi Nir

IPC: H01J37/09 ,  H01J37/21 ,  H01J37/145 ,  H01J37/147 ,  H01J37/28 ,  H01J37/244

Abstract: A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis (A); an aperture device with a first number of apertures configured to create a first number of beamlets from the charged particle beam, wherein the first number is five or more, wherein the apertures are arranged on a ring line around the optical axis (A) such that perpendiculars of the apertures onto a tangent of the ring line are evenly spaced. The charged particle beam device further includes an electrostatic multipole device configured to individually influence the beamlets. Further, a charged particle beam influencing device and a method of operating a charged particle beam device are described.

公开(公告)号：US20190019649A1

公开(公告)日：2019-01-17

申请号：US15648931

申请日：2017-07-13

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Dieter Winkler ,  Guy Eytan ,  Zvi Nir

IPC: H01J37/145 ,  H01J37/09 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

Abstract: A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis (A); an aperture device with a first number of apertures configured to create a first number of beamlets from the charged particle beam, wherein the first number is five or more, wherein the apertures are arranged on a ring line around the optical axis (A) such that perpendiculars of the apertures onto a tangent of the ring line are evenly spaced. The charged particle beam device further includes an electrostatic multipole device configured to individually influence the beamlets. Further, a charged particle beam influencing device and a method of operating a charged particle beam device are described.

公开(公告)号：US10176968B2

公开(公告)日：2019-01-08

申请号：US14896753

申请日：2014-04-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Kunji Shigeto ,  Mitsugu Sato ,  Tsutomu Saito ,  Kohtaro Hosoya ,  Yoshihiro Takahoko ,  Tohru Ando

IPC: H01J37/26 ,  H01J37/20 ,  H01J37/09 ,  H01J37/28

Abstract: The present invention relates to enabling a versatile charged particle beam device, which is used for a wide range of kinds of samples to be observed and has parameters of emission conditions of a primary charged particle beam that is difficult to be registered in advance, to be operated easily and accurately even by a less-experienced operator and to obtain high-resolution images. A charged particle beam device according to the present invention includes, for example: a charged particle source, a focusing lens for a primary charged particle beam emitted from the charged particle source, an objective lens for focusing the primary charged particle beam, a movable objective aperture having multiple objective apertures disposed on a side of the charged particle source with respect to the objective lens, a detector of a secondary signal from the sample resulting from emission of the primary charged particle beam, a display unit configured to process and display a detected secondary signal, and a storage unit configured to store multiple emission conditions of the primary particle beam. The operation controller makes one emission condition be selected, determines whether or not the objective aperture is suitable for the selected emission condition, displays that the objective aperture is unsuitable when the objective aperture is unsuitable, and preadjusts the primary charged particle beam according to the selected emission condition and stores the preadjustment result as parameters for the emission conditions when the objective aperture is suitable.

公开(公告)号：US10170274B2

公开(公告)日：2019-01-01

申请号：US15286502

申请日：2016-10-05

Applicant: Battelle Memorial Institute

Inventor： Andrew J. Stevens ,  Libor Kovarik ,  Nigel D. Browning

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/22 ,  H01J37/09 ,  H01J37/20 ,  G01T1/00 ,  G03F7/20 ,  G03F7/30 ,  H01J37/244

Abstract: Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.

公开(公告)号：US20180374671A1

公开(公告)日：2018-12-27

申请号：US16007276

申请日：2018-06-13

Applicant: JEOL Ltd.

Inventor： Kazuki Yagi ,  Takeo Sasaki ,  Ichiro Onishi ,  Shuichi Yuasa ,  Masashi Shimizu

IPC: H01J37/20 ,  H01J37/10 ,  H01J37/244 ,  H01J37/09 ,  H01J37/28

Abstract: A sample holder capable of limiting X-rays accepted into an X-ray detector is provided. The sample holder is for use in an electron microscope equipped with a polepiece assembly and a semiconductor detector. The sample holder includes: a sample stage on which a sample is held; and a shield plate. When the sample stage has been introduced in the sample chamber of the electron microscope, the shield plate is located between the polepiece assembly and the semiconductor detector.

公开(公告)号：US10157722B2

公开(公告)日：2018-12-18

申请号：US15195665

申请日：2016-06-28

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: H01J37/09 ,  H01J37/073 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/29 ,  G01N23/22 ,  G01N23/223 ,  H01J37/10 ,  H01J37/22

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

公开(公告)号：US10103004B2

公开(公告)日：2018-10-16

申请号：US14790950

申请日：2015-07-02

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Matthias Firnkes ,  Stefan Lanio ,  Dieter Winkler

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/22 ,  H01J37/09 ,  H01J37/12 ,  H01J37/145

Abstract: A method of imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam is provided. The method includes setting a first operating parameter to a first value. The first operating parameter is selected from a group including: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample. The method further includes controlling, while the first operating parameter is set to the first value, the excitation of a first lens and of a second lens to map the secondary charged particle beam onto a first region on an aperture plate. The first region overlaps with a first opening of the aperture plate and with a second opening of the aperture plate. The method further includes setting the first operating parameter to a second value different from the first value. The method further includes controlling, while the first operating parameter is set to the second value, the excitation of the first lens and of the second lens to map the secondary charged particle beam onto the first region on the aperture plate.

公开(公告)号：US20180286633A1

公开(公告)日：2018-10-04

申请号：US15760994

申请日：2015-09-25

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kengo ASAI ,  Toru IWAYA ,  Hisayuki TAKASU ,  Hiroyasu SHICHI

IPC: H01J37/31 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  H01J37/08

CPC classification number: H01J37/31 ,  H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/04732 ,  H01J2237/082 ,  H01J2237/31745

Abstract: To provide an ion milling system that can suppress an orbital shift of an observation electron beam emitted from an electron microscope column, the ion milling system includes: a Penning discharge type ion gun 100 that includes a permanent magnet 114 and that generates ions for processing a sample; and a scanning electron microscope for observing the sample, in which a magnetic shield 172 for reducing a leakage magnetic field from the permanent magnet 114 to the electron microscope column is provided.

公开(公告)号：US20180269034A1

公开(公告)日：2018-09-20

申请号：US15888118

申请日：2018-02-05

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki NOMURA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/10 ,  H01J37/09 ,  H01J37/24

CPC classification number: H01J37/3175 ,  H01J37/045 ,  H01J37/09 ,  H01J37/10 ,  H01J37/243 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/30433 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam writing apparatus includes a current limiting aperture, a blanking deflector switching between beam ON and beam OFF so as to control an irradiation time by deflecting the charged particle beam having passed through the current limiting aperture, a blanking aperture blocking the charged particle beam deflected by the blanking deflector in such a manner that the beam OFF state is entered, and an electron lens disposed between the current limiting aperture and the blanking aperture. A lens value set for the electron lens is substituted into a given function to calculate an offset time. The offset time is added to an irradiation time for writing a pattern to correct the irradiation time. The blanking deflector switches between the beam ON and the beam OFF based on the corrected irradiation time.