-
公开(公告)号：US11908656B2
公开(公告)日：2024-02-20
申请号：US17497761
申请日：2021-10-08
Applicant: ASML Netherlands B.V.
Inventor： Han Willem Hendrik Severt , Jan-Gerard Cornelis Van Der Toorn , Ronald Van Der Wilk , Allard Eelco Kooiker
CPC classification number: H01J37/20 , H01J37/261 , H01J37/28 , H01J2237/0206 , H01J2237/04756 , H01J2237/24592
Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.
-
公开(公告)号：US11908591B2
公开(公告)日：2024-02-20
申请号：US17283823
申请日：2019-09-13
Applicant: ASML Netherlands B.V.
Abstract: A combined enrichment and radioisotope production apparatus comprising an electron source arranged to provide an electron beam, the electron source comprising an electron injector and an accelerator, an undulator configured to generate a radiation beam using the electron beam, a molecular stream generator configured to provide a stream of molecules which is intersected by the radiation beam, a receptacle configured to receive molecules or ions selectively received from the stream of molecules, and a target support structure configured to hold a target upon which the electron beam is incident in use.
-
公开(公告)号：US20240055221A1
公开(公告)日：2024-02-15
申请号：US18257736
申请日：2021-12-13
Applicant: ASML Netherlands B.V.
Inventor： Jan Louis SUNDERMEYER , Leonhard Martin KLEIN , Matthias OBERST , Harald Gert Helmut NEUBAUER
IPC: H01J37/244
CPC classification number: H01J37/244 , H01J2237/24495
Abstract: An improved readout circuit for a charged particle detector and a method for operating the readout circuit are disclosed. An improved circuit comprises an amplifier configured to receive a signal representing an output of a sensor layer and comprising a first input terminal and an output terminal, a capacitor connected between the first input terminal and the output terminal, and a resistor connected in parallel with the capacitor between the first input terminal and the output terminal. The circuit can be configured to operate in a first mode and a second mode. The capacitor can be adjustable using a capacitance value of the capacitor to enable control of a gain of the circuit operating in the first mode and control of a bandwidth of the circuit operating in the second mode.
-
公开(公告)号：US20240047173A1
公开(公告)日：2024-02-08
申请号：US18258522
申请日：2021-12-10
Applicant: ASML Netherlands B.V.
Inventor： Matthias OBERST , Harald Gert Helmut NEUBAUER , Thomas SCHWEIGER
IPC: H01J37/244
CPC classification number: H01J37/244 , H01J2237/2441 , H01J2237/24495 , H01J2237/2446
Abstract: A monolithic detector may be used in a charged particle beam apparatus. The detector may include a plurality of sensing elements formed on a first side of a semiconductor substrate, each of the sensing elements configured to receive charged particles emitted from a sample and to generate carriers in proportion to a first property of a received charged particle, and a plurality of signal processing components formed on a second side of the semiconductor substrate, the plurality of signal processing components being part of a system configured to determine a value that represents a second property of the received charged particle. The substrate may have a thickness in a range from about 10 to 30 μm. The substrate may include a region configured to insulate the plurality of sensing elements formed on the first side from the plurality of signal processing components formed on the second side.
-
公开(公告)号：US20240046620A1
公开(公告)日：2024-02-08
申请号：US18365134
申请日：2023-08-03
Applicant: ASML Netherlands B.V.
Inventor： Wentian ZHOU , Liangjiang YU , Teng WANG , Lingling PU , Wei FANG
IPC: G06V10/774 , G06T7/00 , G06F18/214 , G06V10/776 , G06V10/98
CPC classification number: G06V10/774 , G06T7/0006 , G06F18/214 , G06V10/776 , G06V10/993 , G06T2207/10061 , G06T2207/20081 , G06T2207/30148
Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.
-
Patent Agency Ranking
公开(公告)号：US20240036484A1
公开(公告)日：2024-02-01
申请号：US18265606
申请日：2021-12-02
Applicant: ASML Netherlands B.V.
Inventor： Timothy Dugan DAVIS , Simon Gijsbert Josephus MATHIJSSEN , Kaustuve BHATTACHARYYA , Sebastianus Adrianus GOORDEN , Armand Eugene Albert KOOLEN , Sera JEON , Shuo-Chun LIN
CPC classification number: G03F9/7019 , G03F9/7092 , G03F7/70633 , G03F7/70641
Abstract: Disclosed is a method of metrology. The method comprises measuring at least one surrounding observable parameter relating to a surrounding signal contribution to a metrology signal which comprises a contribution to said metrology signal which is not attributable to at least one target being measured and determining a correction from said surrounding signal observable parameter. The correction is used to correct first measurement data relating to measurement of one or more targets using measurement radiation forming a measurement spot on one or more of said one or more targets which is larger than one of said targets.
-
137.发明公开公开(公告)号：US20240036480A1
公开(公告)日：2024-02-01
申请号：US18258521
申请日：2021-12-09
Applicant: ASML Netherlands B.V.
Inventor： Armand Eugene Albert KOOLEN , Simon Gijsbert Josephus MATHIJSSEN , Hui Quan LIM , Amanda Elizabeth ANDERSON
CPC classification number: G03F7/70683 , G03F7/70633 , G03F9/7088 , G03F9/7076
Abstract: Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. The target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.
-
公开(公告)号：US20240036477A1
公开(公告)日：2024-02-01
申请号：US18463667
申请日：2023-09-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina EUMMELEN , Frank Debougnoux , Koen Cuypers , Han Henricus Aldegonda Lempens , Theodorus Wilhelmus Polet , Jorge Alberto Vieyra Salas , John Maria Bombeeck , Johannes Cornelis Paulus Melman , Giovanni Luca Gattobigio
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/70725
Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
-
公开(公告)号：US11887807B2
公开(公告)日：2024-01-30
申请号：US18158444
申请日：2023-01-23
Applicant: ASML Netherlands B.V.
Inventor： Weiming Ren , Xuedong Liu , Xuerang Hu , Zhongwei Chen
IPC: H01J37/147 , H01J37/06 , H01J37/10 , H01J37/28
CPC classification number: H01J37/1474 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/1478 , H01J37/28 , H01J2237/024 , H01J2237/0453 , H01J2237/0492 , H01J2237/103 , H01J2237/1205 , H01J2237/1516 , H01J2237/1534 , H01J2237/1536
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
-
公开(公告)号：US11886125B2
公开(公告)日：2024-01-30
申请号：US17800346
申请日：2021-02-02
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/00
CPC classification number: G03F7/70625
Abstract: A method of inferring a value for at least one local uniformity metric relating to a product structure, the method including: obtaining intensity data including an intensity image relating to at least one diffraction order obtained from a measurement on a target; obtaining at least one intensity distribution from the intensity image; determining, from the at least one intensity distribution, an intensity indicator expressing a variation of either intensity over the at least one diffraction order, or a difference in intensity between two complimentary diffraction orders over the intensity image; and inferring the value for the at least one local uniformity metric from the intensity indicator.
-
-
-
-
-
-
-
-
-
Search Results
4998
records
(took 0.045 seconds)
