公开(公告)号：US20240331115A1

公开(公告)日：2024-10-03

申请号：US18577678

申请日：2022-06-02

Applicant: ASML Netherlands B.V.

Inventor： Haoyi LIANG ,  Zhichao CHEN ,  Lingling PU ,  Fang-Cheng CHANG ,  Liangjiang YU ,  Zhe WANG

IPC: G06T5/80 ,  G06T7/00 ,  G06T7/33

CPC classification number: G06T5/80 ,  G06T7/001 ,  G06T7/337 ,  G06T2207/10061 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: An improved systems and methods for correcting distortion of an inspection image are disclosed. An improved method for correcting distortion of an inspection image comprises acquiring an inspection image, aligning a plurality of patches of the inspection image based on a reference image corresponding to the inspection image, evaluating, by a machine learning model, alignments between each patch of the plurality of patches and a corresponding patch of the reference image, determining local alignment results for the plurality of patches of the inspection image based on a reference image corresponding to the inspection image, determining an alignment model based on the local alignment results, and correcting a distortion of the inspection image based on the alignment model.

公开(公告)号：US20250003899A1

公开(公告)日：2025-01-02

申请号：US18708929

申请日：2022-10-14

Applicant: ASML Netherlands B.V.

Inventor： Tim HOUBEN ,  Maxim PISARENCO ,  Thomas Jarik HUISMAN ,  Lingling PU ,  Jian ZHOU ,  Liangjiang YU ,  Yi-Hsin CHANG ,  Yun-Ling YEH

IPC: G01N23/2251 ,  G06T7/00

Abstract: Systems and methods for image analysis include obtaining a plurality of simulation images and a plurality of non-simulation images both associated with a sample under inspection, at least one of the plurality of simulation images being a simulation image of a location on the sample not imaged by any of the plurality of non-simulation images; and training an unsupervised domain adaptation technique using the plurality of simulation images and the plurality of non-simulation images as inputs to reduce a difference between first intensity gradients of the plurality of simulation images and second intensity gradients of the plurality of non-simulation images.

公开(公告)号：US20250005739A1

公开(公告)日：2025-01-02

申请号：US18710127

申请日：2022-10-18

Applicant: ASML Netherlands B.V.

Inventor： Shengcheng JIN ,  Lingling PU ,  Liangjiang YU

IPC: G06T7/00 ,  G06T3/14 ,  G06T5/60 ,  H01J37/22 ,  H01J37/28

Abstract: Apparatuses, systems, and methods for providing beams for defect detection and defect location identification associated with a sample of charged particle beam systems. In some embodiments, a method may include obtaining an image of a sample; determining defect characteristics from the image; generating an updated image based on the determined defect characteristics and the image; and aligning the updated image with a reference image.

公开(公告)号：US20240331132A1

公开(公告)日：2024-10-03

申请号：US18577684

申请日：2022-06-03

Applicant: ASML Netherlands B.V.

Inventor： Haoyi LIANG ,  Yani CHEN ,  Ming-Yang YANG ,  Yang YANG ,  Xiaoxia HUANG ,  Zhichao CHEN ,  Liangjiang YU ,  Zhe WANG ,  Lingling PU

IPC: G06T7/00 ,  G01N23/2251 ,  G06T7/73

CPC classification number: G06T7/001 ,  G01N23/2251 ,  G06T7/0006 ,  G06T7/74 ,  G01N2223/6116 ,  G06T2200/24 ,  G06T2207/10061 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: Systems and methods for detecting a defect on a sample include receiving a first image and a second image associated with the first image; determining, using a clustering technique, N first feature descriptor(s) for L first pixel(s) in the first image and M second feature descriptor(s) for L second pixel(s) in the second image, wherein each of the L first pixel(s) is co-located with one of the L second pixel(s), and L, M, and N are positive integers; determining K mapping probability between a first feature descriptor of the N first feature descriptor(s) and each of K second feature descriptor(s) of the M second feature descriptor(s), wherein K is a positive integer; and providing an output for determining whether there is existence of an abnormal pixel representing a candidate defect on the sample based on a determination that one of the K mapping probability does not exceed a threshold value.

公开(公告)号：US20250078478A1

公开(公告)日：2025-03-06

申请号：US18882681

申请日：2024-09-11

Applicant: ASML Netherlands B.V.

Inventor： Wentian ZHOU ,  Liangjiang YU ,  Teng WANG ,  Lingling PU ,  Wei FANG

IPC: G06V10/774 ,  G06F18/214 ,  G06T7/00 ,  G06V10/776 ,  G06V10/98

Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.

公开(公告)号：US20200211178A1

公开(公告)日：2020-07-02

申请号：US16718706

申请日：2019-12-18

Applicant: ASML Netherlands B.V.

Inventor： Wentian ZHOU ,  Liangjiang YU ,  Teng WANG ,  Lingling PU ,  Wei FANG

IPC: G06T7/00 ,  G06K9/62

Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.

公开(公告)号：US20240062362A1

公开(公告)日：2024-02-22

申请号：US18268953

申请日：2021-12-08

Applicant: ASML Netherlands B.V.

Inventor： Zhe WANG ,  Liangjiang YU ,  Lingling PU

IPC: G06T7/00 ,  G06T11/00

CPC classification number: G06T7/001 ,  G06T11/00 ,  G06T2207/20084 ,  G06T2207/20081 ,  G06T2207/30148 ,  G06T2207/10061

Abstract: An improved systems and methods for generating a synthetic defect image are disclosed. An improved method for generating a synthetic defect image comprises acquiring a machine learning-based generator model; providing a defect-free inspection image and a defect attribute combination as inputs to the generator model; and generating by the generator model, based on the defect-free inspection image, a predicted synthetic defect image with a predicted defect that accords with the defect attribute combination.

公开(公告)号：US20240046620A1

公开(公告)日：2024-02-08

申请号：US18365134

申请日：2023-08-03

Applicant: ASML Netherlands B.V.

Inventor： Wentian ZHOU ,  Liangjiang YU ,  Teng WANG ,  Lingling PU ,  Wei FANG

IPC: G06V10/774 ,  G06T7/00 ,  G06F18/214 ,  G06V10/776 ,  G06V10/98

CPC classification number: G06V10/774 ,  G06T7/0006 ,  G06F18/214 ,  G06V10/776 ,  G06V10/993 ,  G06T2207/10061 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.

公开(公告)号：US20210350507A1

公开(公告)日：2021-11-11

申请号：US17308835

申请日：2021-05-05

Applicant: ASML Netherlands B.V.

Inventor： Wei FANG ,  Ruochong FEI ,  Lingling PU ,  Wentian ZHOU ,  Liangjiang YU ,  Bo WANG

IPC: G06T5/00 ,  G06T5/50 ,  G06T7/10

Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a first image and a second image of multiple stacked layers of a sample that are taken with a first focal point and a second focal point, respectively, associating a first segment of the first image with a first layer among the multiple stacked layers and associating a second segment of the second image with a second layer among the multiple stacked layers, updating the first segment based on a first reference image corresponding to the first layer and updating the second segment based on a second reference image corresponding to the second layer, and combining the updated first segment and the updated second segment to generate a combined image including the first layer and the second layer.