公开(公告)号：US20180025885A1

公开(公告)日：2018-01-25

申请号：US15548321

申请日：2016-02-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta IMAI ,  Hideo MORISHITA ,  Toshihide AGEMURA

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/08 ,  H01J37/28 ,  H01J37/06

CPC classification number: H01J37/12 ,  H01J37/06 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/08 ,  H01J2237/121 ,  H01J2237/244 ,  H01J2237/2801

Abstract: This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is placed, and an electric field correction electrode (13) which is provided around the tip of the first charged particle beam column, wherein the electric field correction electrode is an electrode that corrects the electric field distribution formed in the vicinity of the test piece, and the electric field correction electrode is positioned between the test piece and the first charged particle beam column, and on the opposite side from the second charged particle beam column with respect to the optical axis of the first charged particle beam column.

公开(公告)号：US20170178862A1

公开(公告)日：2017-06-22

申请号：US15375604

申请日：2016-12-12

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/04 ,  H01J37/22 ,  H01J37/10

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/10 ,  H01J37/141 ,  H01J37/145 ,  H01J37/153 ,  H01J37/226 ,  H01J2237/0435 ,  H01J2237/31774

Abstract: A multiple charged particle beam apparatus includes: a first aperture array substrate to form multiple beams; a first grating lens that constitutes a concave lens by using the first aperture array substrate as a grating; a second aperture array substrate that allows the multiple beams to pass through; and a first limiting aperture substrate arranged in a position of a convergent point of the multiple beams between the first aperture array substrate and the second aperture array substrate, wherein a first aperture array image having passed through the first shaping aperture array substrate is formed on the second aperture array substrate by a lens action including a magnetic field distribution generated between the first aperture array substrate and the second aperture array substrate and having opposite signs and same magnitude and an electric field distribution generated by the first grating lens.

公开(公告)号：US09613779B2

公开(公告)日：2017-04-04

申请号：US14940102

申请日：2015-11-12

Applicant: Shuai Li ,  Wei He ,  Zhongwei Chen

Inventor： Shuai Li ,  Wei He ,  Zhongwei Chen

IPC: H01J37/21 ,  H01J37/145 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/145 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/2802

Abstract: The present invention provides a scanning transmission electron microscope (STEM). In the STEM, a specimen is sandwiched between a variable axis objective lens and a variable axis collection lens. The axis of the collection lens varies along with the variation of the objective lens axis in a coordinated manner. The STEM of the invention exhibits technical merits such as large scanning field, high image resolution across the entire scanning field, and high throughput, among others.

公开(公告)号：US20170076910A1

公开(公告)日：2017-03-16

申请号：US15364060

申请日：2016-11-29

Applicant: ICT Integrated Circuit Testing Gesellscaft für Halbleiterprüftechnik mbH

Inventor： Matthias Firnkes ,  Stefan Lanio ,  Dieter Winkler

IPC: H01J37/244 ,  H01J37/12 ,  H01J37/145 ,  H01J37/09

CPC classification number: H01J37/244 ,  G01N2223/418 ,  G01N2223/6116 ,  H01J37/09 ,  H01J37/12 ,  H01J37/145 ,  H01J37/222 ,  H01J37/26 ,  H01J2237/0453 ,  H01J2237/1202 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24592

Abstract: A secondary charged particle imaging system for imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam is provided. The system includes a detector arrangement, and an adaptive secondary charged particle optics. The detector arrangement comprises a first detection element for detecting a first secondary charged particle sub-beam of the secondary charged particle beam, and a second detection element for detecting a second secondary charged particle sub-beam of the secondary charged particle beam. The adaptive secondary charged particle optics comprises an aperture plate including a first opening for letting the first secondary charged particle sub-beam pass through and a second opening for letting the second secondary charged particle sub-beam pass through; a lens system for mapping the secondary charged particle beam onto the aperture plate, the lens system comprising a first lens and a second lens; and a controller for controlling the excitation of the first lens and the excitation of the second lens. The controller is configured to independently control the excitation of the first lens and of the second lens to map the secondary charged particle beam onto the aperture plate so that the first secondary charged particle sub-beam passes through the first opening and the second secondary charged particle sub-beam passes through the second opening independent of a variation of at least one first operating parameter selected from a group comprising: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample.

Abstract translation: 提供了二次带电粒子成像系统，用于通过冲击一次带电粒子束来从样品发射的二次带电粒子束成像。 该系统包括检测器装置和自适应二次带电粒子光学器件。 检测器装置包括用于检测次级带电粒子束的第一次级带电粒子子光束的第一检测元件和用于检测次级带电粒子束的第二次级带电粒子子光束的第二检测元件。 自适应二次带电粒子光学器件包括孔板，该孔板包括用于使第一次级带电粒子子光束通过的第一开口和用于使第二次级带电粒子子光束通过的第二开口; 用于将二次带电粒子束映射到孔板上的透镜系统，所述透镜系统包括第一透镜和第二透镜; 以及用于控制第一透镜的激发和第二透镜的激发的控制器。 控制器被配置为独立地控制第一透镜和第二透镜的激发，以将次级带电粒子束映射到孔板上，使得第一次级带电粒子子光束穿过第一开口和第二次级带电粒子 子光束通过第二开口，独立于至少一个第一操作参数的变化，所述至少一个第一操作参数选自包括：样品上的初级带电粒子束的着陆能量，样品处的次级带电粒子束的提取场强度， 将初级带电粒子束聚焦到样品上的物镜的磁场强度以及物镜与样品的工作距离。

公开(公告)号：US20170047192A1

公开(公告)日：2017-02-16

申请号：US14825055

申请日：2015-08-12

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Jürgen Frosien

IPC: H01J37/145 ,  H01J37/26

CPC classification number: H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2817

Abstract: A charged particle beam device for imaging and/or inspecting a sample is described. The charged particle beam device includes a beam emitter for emitting a primary charged particle beam; and a retarding field device for retarding the primary beam before impinging on the sample, the retarding field device including a magnetic-electrostatic objective lens and a proxy electrode. The charged particle beam device is adapted for guiding the primary beam along an optical axis to the sample for generating secondary particles released from the sample and backscattered particles. The proxy electrode comprises a first opening allowing the passage of the primary beam and at least one second opening for allowing the passage of off-axial backscattered particles. Further, a proxy electrode and a method for imaging and/or inspecting a sample by a charged particle beam are described.

Abstract translation: 描述用于成像和/或检查样品的带电粒子束装置。 带电粒子束装置包括用于发射初级带电粒子束的射束发射器; 以及用于在入射到样品之前延迟一次光束的延迟场设备，所述延迟场设备包括磁静电物镜和代用电极。 带电粒子束装置适于将主光束沿着光轴引导到样品，用于产生从样品和背散射粒子释放的二次粒子。 代用电极包括允许主梁和至少一个第二开口通过的第一开口，用于允许离轴背散射颗粒的通过。 此外，描述了代用电极和通过带电粒子束对样品进行成像和/或检查的方法。

公开(公告)号：US20170040139A1

公开(公告)日：2017-02-09

申请号：US15303282

申请日：2015-04-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori NOMAGUCHI ,  Toshihide AGEMURA

IPC: H01J37/04 ,  H01J37/14 ,  H01J37/145 ,  H01J37/28 ,  H01J37/12 ,  H01J37/065 ,  H01J37/244

CPC classification number: H01J37/04 ,  H01J37/065 ,  H01J37/09 ,  H01J37/12 ,  H01J37/14 ,  H01J37/141 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04756 ,  H01J2237/14

Abstract: The present invention provides an electron beam device that achieves high spatial resolution and high luminance, while remaining insusceptible to the effects of external disturbance. The present invention relates to an electron beam device, wherein, between, e.g., an electron source for generating an electron beam and an objective lens for focusing the electron beam onto a sample, a high voltage beam tube is disposed close to the electron source and a low voltage beam tube is disposed close to the objective lens. This makes it possible to achieve high luminance while maintaining spatial resolution, even with an SEM that is provided with a type of objective lens that actively leaks a magnetic field onto a sample.

Abstract translation: 本发明提供一种实现高空间分辨率和高亮度的电子束装置，同时不受外部干扰的影响。 电子束装置技术领域本发明涉及一种电子束装置，其中，在例如用于产生电子束的电子源和用于将电子束聚焦到样品上的物镜之间，高压束管靠近电子源设置， 低压射束管靠近物镜设置。 这使得即使使用设置有主动地将磁场泄漏到样品上的物镜的类型的SEM，也可以在保持空间分辨率的同时实现高亮度。

公开(公告)号：US20170032927A1

公开(公告)日：2017-02-02

申请号：US14809608

申请日：2015-07-27

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Bon-Woong Koo ,  Alexandre Likhanskii ,  Svetlana B. Radovanov ,  Anthony Renau

IPC: H01J37/14 ,  H01J37/08

CPC classification number: H01J37/14 ,  H01J27/022 ,  H01J27/024 ,  H01J37/08 ,  H01J37/145 ,  H01J37/3211 ,  H01J2237/0815

Abstract: An apparatus for the creation of high current ion beams is disclosed. The apparatus includes an ion source, such as a RF ion source or an indirectly heated cathode (IHC) ion source, having an extraction aperture. Disposed proximate the extraction aperture is a bias electrode, which has a hollow center portion that is aligned with the extraction aperture. A magnetic field is created along the perimeter of the hollow center portion, which serves to contain electrons within a confinement region. Electrons in the confinement region energetically collide with neutral particles, increasing the number of ions that are created near the extraction aperture. The magnetic field may be created using two magnets that are embedded in the bias electrode. Alternatively, a single magnet or magnetic coils may be used to create this magnetic field.

Abstract translation: 公开了一种用于产生高电流离子束的装置。 该装置包括具有提取孔的离子源，例如RF离子源或间接加热的阴极（IHC）离子源。 靠近提取孔设置的是偏置电极，其具有与提取孔对准的中空中心部分。 沿着中空中心部分的周边产生磁场，其用于在限制区域内容纳电子。 限制区域中的电子与中性粒子发生强烈碰撞，增加了在提取孔附近产生的离子数。 可以使用嵌入在偏置电极中的两个磁体来产生磁场。 或者，可以使用单个磁体或磁性线圈来产生该磁场。

公开(公告)号：US09490100B2

公开(公告)日：2016-11-08

申请号：US14021480

申请日：2013-09-09

Applicant: FEI Company

Inventor： Petr Syta{hacek over (r)} ,  Petr Hlavenka ,  Lubomír Tůma

IPC: H01J37/14 ,  H01J37/145 ,  H01J37/28

CPC classification number: H01J37/14 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/1035 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/248

Abstract: The invention relates to a compound objective lens for a Scanning Electron Microscope having a conventional magnetic lens excited by a first lens coil, an immersion magnetic lens excited by a second lens coil, and an immersion electrostatic lens excited by the voltage difference between the sample and the electrostatic lens electrode. For a predetermined excitation of the lens, the electron beam can be focused on the sample using combinations of excitations of the two lens coils. More BSE information can be obtained when the detector distinguishes between BSE's (202) that strike the detector close to the axis and BSE's (204) that strike the detector further removed from the axis. By tuning the ratio of the excitation of the two lens coils, the distance from the axis that the BSE's impinge on the detector can be changed, and the compound lens can be used as an energy selective detector.

Abstract translation: 本发明涉及一种用于扫描电子显微镜的复合物镜，其具有由第一透镜线圈激发的常规磁透镜，由第二透镜线圈激发的浸没磁透镜，以及由样品和 静电透镜电极。 对于透镜的预定激发，可以使用两个透镜线圈的激发的组合将电子束聚焦在样品上。 当检测器区分击穿靠近轴的检测器的BSE（202）和撞击检测器进一步从轴移除的BSE（204）之后，可以获得更多的BSE信息。 通过调整两个透镜线圈的激励的比率，可以改变从BSE撞击在检测器上的轴线的距离，并且复合透镜可以用作能量选择检测器。

公开(公告)号：US09431210B2

公开(公告)日：2016-08-30

申请号：US14679581

申请日：2015-04-06

Applicant: ICT Intergrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH

Inventor： Dieter Winkler ,  Igor Petrov

IPC: H01J37/145 ,  H01J37/12 ,  H01J37/28 ,  H01J37/21 ,  H01J37/147

CPC classification number: H01J37/145 ,  H01J37/1474 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/28

Abstract: A retarding field scanning electron microscope for imaging a specimen is described. The microscope includes a scanning deflection assembly configured for scanning an electron beam over the specimen, one or more controllers in communication with the scanning deflection assembly for controlling a scanning pattern of the electron beam, and a combined magnetic-electrostatic objection lens configured for focusing the electron beam, wherein the objective lens includes a magnetic lens portion and an electrostatic lens portion. The electrostatic lens portion includes an first electrode configured to be biased to a high potential, and a second electrode disposed between the first electrode and the specimen plane, the second electrode being configured to be biased to a potential lower than the first electrode, wherein the second electrode is configured for providing a retarding field of the retarding field scanning electron microscope. The retarding field scanning electron microscope further includes a voltage supply being connected to the second electrode for biasing the second electrode to a potential and being in communication with the one or more controllers, wherein the one or more controllers synchronize a variation of the potential of the second electrode with the scanning pattern of the electron beam.

Abstract translation: 描述了用于成像试样的延迟场扫描电子显微镜。 显微镜包括扫描偏转组件，其被配置用于扫描试样上的电子束，与扫描偏转组件连通的一个或多个控制器，用于控制电子束的扫描图案;以及组合的磁静电对置透镜，其被配置用于聚焦 电子束，其中物镜包括磁透镜部分和静电透镜部分。 静电透镜部包括被配置为被偏置成高电位的第一电极和设置在第一电极和检体平面之间的第二电极，第二电极被配置为被偏置到比第一电极低的电位，其中， 第二电极构造成用于提供延迟场扫描电子显微镜的延迟场。 延迟场扫描电子显微镜还包括电压源，其连接到第二电极，用于将第二电极偏压到电位并与一个或多个控制器通信，其中一个或多个控制器使得一个或多个控制器的电位变化同步 具有电子束扫描图形的第二电极。

公开(公告)号：US20160240344A1

公开(公告)日：2016-08-18

申请号：US15137796

申请日：2016-04-25

Applicant: Carl Zeiss Microscopy GmbH ,  Applied Materials Israel, Ltd

Inventor： Thomas KEMEN ,  Rainer KNIPPELMEYER ,  Stefan SCHUBERT

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/145

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.