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    Charged-Particle Beam System
    93.
    发明申请
    Charged-Particle Beam System 有权
    带电粒子束系统

    公开(公告)号：US20080142723A1

    公开(公告)日：2008-06-19

    申请号：US11959966

    申请日：2007-12-19

    Applicant: Kazuya Goto

    Inventor： Kazuya Goto

    IPC: H01J3/18

    CPC classification number: H01J37/153 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/153 ,  H01J2237/28

    Abstract: A charged-particle beam system has a demagnifying lens for reducing the dimensions of an electron beam produced from an electron beam source, an objective lens for focusing the demagnified beam onto the surface of a target, a first deflector located before the demagnifying lens, a second deflector placed such that the deflection field produced by it is totally or partially superimposed on the objective lens field, and a third deflector located in a stage following the second deflector. An image of the light source is created by the demagnifying lens. An image of the light source image is formed on the target by the objective lens.

    Abstract translation: 带电粒子束系统具有用于减小从电子束源产生的电子束的尺寸的缩小透镜，用于将缩小的光束聚焦到目标表面上的物镜，位于缩小透镜之前的第一偏转器， 第二偏转器被放置成使得其产生的偏转场全部或部分地叠加在物镜视场上，而第三偏转器位于跟随第二偏转器的阶段中。 光源的图像由缩小透镜产生。 通过物镜在目标上形成光源图像的图像。

    High resolution atom probe
    94.
    发明授权
    High resolution atom probe 有权
    高分辨率原子探针

    公开(公告)号：US07157702B2

    公开(公告)日：2007-01-02

    申请号：US10559733

    申请日：2004-05-26

    Applicant: Tye Travis Gribb

    Inventor： Tye Travis Gribb

    IPC: G21K7/00 ,  G21K5/10 ,  G21K5/08

    CPC classification number: H01J37/285 ,  B82Y15/00 ,  H01J37/05 ,  H01J37/10 ,  H01J2237/024 ,  H01J2237/0492 ,  H01J2237/053 ,  H01J2237/244

    Abstract: A three dimensional atom probe comprising a sharp specimen (10) coupled to a mounting means (12) where emission of charged particles is caused by application of a potential to the specimen tip (10) such that charged particles are influenced by filtering electrodes (206, 204) before impingement on a detection screen (202).

    Abstract translation: 一种三维原子探针，其包括耦合到安装装置（12）的尖锐的样本（10），其中通过向所述样本末端（10）施加电位而引起带电粒子的发射，使得带电粒子受到过滤电极（206 ，204），然后冲击到检测屏（202）上。

    Slit lens arrangement for particle beams
    96.
    发明授权
    Slit lens arrangement for particle beams 有权
    用于粒子束的狭缝透镜布置

    公开(公告)号：US06949751B2

    公开(公告)日：2005-09-27

    申请号：US10478752

    申请日：2002-07-24

    Applicant: Heiko Müller

    Inventor： Heiko Müller

    IPC: G03F7/20 ,  H01J37/10 ,  H01J37/153 ,  H01J37/317 ,  H01L21/027 ,  H01J49/42

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/153 ,  H01J37/3174

    Abstract: A slit lens arrangement for particle beams, and particularly for the projection of a mask onto a workpiece, includes a combined lens, having a cylinder lens and a quadrupole lens, the optical axes of which run parallel to each other, so that the optical axis of the quadrupole lens may be displaced in a parallel manner and which may have a gap-like opening between the pole shoes or in the electrodes with the same spatial relationship to each other. Both lenses are thus so arranged relative to each other, that the focussing of the quadrupole lens occurs in that plane in which the cylinder lens is not focussed, and the defocusing of the quadrupole lens occurs in that plane in which the cylinder lens focuses. Two combined lenses are provided with functionally identical elements arranged such that the optical axes of both lenses lie coaxial to each other, defining the mid-axis of the total system and in which the beam path is telescopic throughout the entire slit lens arrangement. The optical axis of the image is given by the optical axis of the quadrupole. Further, the diffraction plane, or aperture plane, for the total system lies between both combined lenses and fixes a point on the mid-axis, relative to which the combined lenses are arranged, so that the above are anti-symmetric to each other and simultaneously fill the condition that the separation of the first and the second combined lenses from the diffraction plane and the assembly and/or the fields of functionally identical elements in the combined lenses is in a ratio which corresponds to the image scale, preferably, reduction ratio. The shifts of the optical axes of the quadrupole lenses of both combined lenses occur in diametrically opposed directions, such that the size of the shifts are in a ratio to each other which corresponds to the image scale, preferably, the reduction ratio.

    Abstract translation: 用于粒子束的狭缝透镜装置，特别是用于将掩模投射到工件上的狭缝透镜装置包括具有柱面透镜和四极透镜的组合透镜，其光轴彼此平行延伸，使得光轴 的四极透镜可以以平行的方式移位，并且可以在极靴之间或者在电极之间具有彼此具有相同空间关系的间隙形开口。 因此，两个透镜相对于彼此布置，四极透镜的聚焦发生在其中气泡透镜未被聚焦的平面中，并且四极透镜的散焦发生在柱面透镜聚焦的平面中。 两个组合透镜设置有功能相同的元件，其布置成使得两个透镜的光轴彼此同轴，限定整个系统的中轴线，并且其中光束路径在整个狭缝透镜装置中可伸缩。 图像的光轴由四极杆的光轴给出。 此外，用于整个系统的衍射平面或孔径平面位于两个组合透镜之间，并且固定中心轴上相对于组合透镜布置的点，使得上述对应于彼此反对称，并且 同时填充第一和第二组合透镜与衍射平面以及组合透镜中的组件和/或功能相同元件的场分离的比例对应于图像尺度，优选地为减小比率 。 两个组合透镜的四极透镜的光轴的偏移沿径向相反的方向发生，使得偏移的大小彼此相对于图像比例的比例，优选的是减小比。

    Electron beam apparatus
    97.
    发明授权
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号：US06949745B2

    公开(公告)日：2005-09-27

    申请号：US10438145

    申请日：2003-05-14

    Applicant: Akira Yonezawa

    Inventor： Akira Yonezawa

    IPC: H01J37/244 ,  H01J37/145 ,  H01J37/28 ,  G21K7/00 ,  G01K1/08

    CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/2449

    Abstract: An electron beam apparatus has an optical axis, an electron beam source for generating an electron beam directed along the optical axis, and a magnetic field lens having an axis coincident with the optical axis for focusing the electron beam onto a sample which is subjected to a negative voltage so that secondary electrons are emitted from the sample. The magnetic field lens has a conductive cylinder surrounding a part of the optical axis to permit the passage therethrough of an electron beam from the electron beam source. A first detector detects secondary electrons emitted by the sample in a direction away from the optical axis and is disposed at a position generally confronting the conductive cylinder. A second detector is disposed over the conductive cylinder. A Wien filter deflector deflects secondary electrons emitted by the sample toward and for detection by the second detector. The Wien filter deflector is disposed on the optical axis and between the conductive cylinder and the second detector.

    Abstract translation: 电子束装置具有光轴，用于产生沿着光轴定向的电子束的电子束源和具有与光轴重合的轴的磁场透镜，用于将电子束聚焦到经受 负电压使得二次电子从样品发射。 磁场透镜具有围绕光轴的一部分的导电圆柱体，以允许电子束从电子束源通过。 第一检测器检测样品沿远离光轴的方向发射的二次电子，并且设置在通常面对导电圆柱体的位置。 第二检测器设置在导电圆柱体上。 维恩滤波器偏转器将由样本发射的二次电子偏转并由第二检测器检测。 维恩滤波器偏转器设置在光轴上并且在导电圆柱体和第二检测器之间。

    Electrostatic-magnetic lens for particle beam apparatus
    98.
    发明授权
    Electrostatic-magnetic lens for particle beam apparatus 失效
    用于粒子束装置的静电磁透镜

    公开(公告)号：US4785176A

    公开(公告)日：1988-11-15

    申请号：US30964

    申请日：1987-03-27

    Applicant: Juergen Frosien ,  Erich Plies

    Inventor： Juergen Frosien ,  Erich Plies

    IPC: H01J37/12 ,  G01Q30/02 ,  H01J37/10 ,  H01J37/141 ,  H01J37/145 ,  H01J49/06

    CPC classification number: H01J37/10 ,  H01J37/145

    Abstract: An electrostatic-magnetic lens is provided having either a symmetrical or asymmetrical magnetic lens which is overlaid with an electrostatic immersion lens. One electrode of the immersion lens is formed as a hollow cylinder, which is within an upper pole piece of the magnetic lens concentrically relative to the axis of symmetry thereof and extending into the region of the pole piece gap. The lower pole piece of the magnetic lens is preferably at a ground potential and clad with the beam guiding tube for protection against contamination and forming the lower electrode of the electrostatic immersion lens.

    Abstract translation: 提供具有与静电浸没透镜重叠的对称或非对称磁性透镜的静电磁透镜。 浸没透镜的一个电极形成为中空圆柱体，其位于磁性透镜的上极片内，相对于其对称轴线同心并延伸到极片间隙的区域中。 磁透镜的下极片优选为接地电位，并与光束引导管一起包围以防止污染并形成静电浸没透镜的下电极。

    Apparatus for irradiation with charged particle beams
    99.
    发明授权
    Apparatus for irradiation with charged particle beams 失效
    用于带电粒子束照射的装置

    公开(公告)号：US4479060A

    公开(公告)日：1984-10-23

    申请号：US454027

    申请日：1982-12-28

    Applicant: Hifumi Tamura ,  Tohru Ishitani ,  Akira Shimase

    Inventor： Hifumi Tamura ,  Tohru Ishitani ,  Akira Shimase

    IPC: H01J37/073 ,  G01Q30/20 ,  H01J37/08 ,  H01J37/10 ,  H01J37/12 ,  H01J37/252 ,  H01J3/14 ,  G01N23/04 ,  G01N23/225

    CPC classification number: H01J37/10 ,  H01J37/252

    Abstract: An apparatus according to the present invention for irradiating a specimen with charged particle beams comprises a single charged particle generating source from which the charged particle beams formed of electrons and negative ions, respectively, can be simultaneously derived; a specimen holder on which the specimen is placed; and charged particle irradiation means which is interposed between the charged particle generating source and the specimen holder in order to focus the charged particle beams and to irradiate the surface of the specimen with the focused beams, and which includes at least one magnetic lens and at least one electrostatic lens that are individually disposed.

    Abstract translation: 根据本发明的用于用带电粒子束照射样本的装置包括单个带电粒子发生源，可以同时衍生由电子和负离子形成的带电粒子束; 放置样品的样品架; 以及带电粒子照射装置，其被插入在带电粒子发生源和样本保持器之间，以便聚焦带电粒子束并用聚焦束照射样本的表面，并且至少包括至少一个磁性透镜 一个静电透镜单独设置。

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