公开(公告)号：US12195314B2

公开(公告)日：2025-01-14

申请号：US17165427

申请日：2021-02-02

Applicant: Applied Materials, Inc.

Inventor： Bhaskar Prasad ,  Kirankumar Neelasandra Savandaiah ,  Thomas Brezoczky ,  Srinivasa Rao Yedla

IPC: B66F3/36 ,  B66F3/24 ,  B66F13/00 ,  H01J37/02

Abstract: A method and apparatus for lifting a process station from a processing module is described herein. The apparatus includes a lift assembly disposed on the processing module, a lift cage, and one or more guide pins. The lift assembly is disposed to be capable of reaching each of the process stations disposed within the processing module. The lift assembly is used for replacement and maintenance of the process stations and further enables the automated removal and placement of the process stations within the processing module. Maintenance methods enabled by the lift assembly are additionally disclosed herein.

公开(公告)号：US12057286B2

公开(公告)日：2024-08-06

申请号：US18084430

申请日：2022-12-19

Applicant: FEI Company

Inventor： Edwin Verschueren ,  Paul Tacx

IPC: H01J37/02 ,  H01J37/28

CPC classification number: H01J37/023 ,  H01J37/28 ,  H01J2237/20221 ,  H01J2237/20264 ,  H01J2237/20278 ,  H01J2237/2802

Abstract: A method of producing a compensation signal to compensate for misalignment of a drive unit clamp element can include applying a clamp element drive signal to a drive unit clamp element to engage a mover element, determining a first displacement of the mover element, and determining a first compensation signal based at least in part on the first displacement. The method can further comprise applying the first compensation signal to the drive unit shear elements and the clamp element drive signal to the drive unit clamp element and determining a second displacement of the mover element. If the second displacement is less than a preselected threshold, the first compensation signal can be combined with an initial shear element drive signal to produce a modified shear element drive signal. If the second displacement is greater than the preselected threshold, a second compensation signal can be determined.

公开(公告)号：US20240186107A1

公开(公告)日：2024-06-06

申请号：US18411525

申请日：2024-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Bernardo KASTRUP ,  Johannes Catharinus Hubertus Mulkens ,  Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erwin Paul Smakman ,  Tamara Druzhinina ,  Coen Adrianus Verschuren

IPC: H01J37/26 ,  H01J37/02 ,  H01J37/15 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/023 ,  H01J37/15 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/2817

Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

公开(公告)号：US11961695B2

公开(公告)日：2024-04-16

申请号：US17409840

申请日：2021-08-24

Applicant: SEMES CO., LTD.

Inventor： Doyeon Kim ,  Hyun Yoon ,  Ho Jong Hwang

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/317 ,  H01L21/687

CPC classification number: H01J37/026 ,  H01J37/20 ,  H01J37/3171 ,  H01L21/6875 ,  H01J2237/0044 ,  H01J2237/2007

Abstract: An apparatus for treating a substrate includes a process chamber that performs a liquid treatment process by dispensing a treatment liquid onto the substrate, and components provided in the process chamber. A surface of at least one of the components is formed of a material containing an ion-implanted fluorine resin.

公开(公告)号：US20240062986A1

公开(公告)日：2024-02-22

申请号：US18270937

申请日：2021-03-01

Applicant: Hitachi High-Tech Corporation

Inventor： Naho TERAO ,  Toshiyuki YOKOSUKA ,  Hideyuki KOTSUJI ,  Tomohito NAKANO ,  Hajime KAWANO

IPC: H01J37/02 ,  H01J37/28 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J37/244 ,  H01J37/222 ,  H01J2237/2817 ,  H01J2237/0656 ,  H01J2237/30483

Abstract: The purpose of the present invention is to provide a charged particle beam device that can specify irradiation conditions for primary charged particles that can obtain a desired charged state without adjusting the acceleration voltage. The charged particle beam device according to the present invention specifies the irradiation conditions for a charged particle beam in which the charged state of a sample is switched between a positive charge and a negative charge, and adjusts the irradiation conditions according to the relationship between the specified irradiation conditions and the irradiation conditions when an observation image of the sample has been acquired (see FIG. 8).

公开(公告)号：US20240021402A1

公开(公告)日：2024-01-18

申请号：US18454569

申请日：2023-08-23

Applicant: University College Dublin, National University of Ireland

Inventor： Denis Dowling ,  James N. Barry

IPC: H01J37/02 ,  H01J37/32

CPC classification number: H01J37/023 ,  H01J37/32055 ,  H01J37/32449 ,  H01J2237/24564 ,  H01J2237/24585 ,  H01J2237/336 ,  H01J2237/0203

Abstract: A surface preparation method (200) for a composite material (104) having an original surface (110), the material (104) comprising fibres (104a) within a matrix (104b), comprises removing (204) a surface portion of the matrix (104b) by plasma ablation so as to reveal and activate (206) a new surface (120) with at least a portion of a plurality of the fibres (104a) exposed thereon, without creating a residual heat-affected zone.

公开(公告)号：US20230411108A1

公开(公告)日：2023-12-21

申请号：US18319554

申请日：2023-05-18

Applicant: Hitachi High-Tech Corporation

Inventor： Hideyuki Kotsuji ,  Toshiyuki Yokosuka ,  Hajime Kawano

IPC: H01J37/02 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J2237/103 ,  H01J2237/2007

Abstract: A charged particle beam device includes: a plasma generation device attached to a sample chamber through a connecting member; a guide including a hollow portion configured to guide a plasma generated by the plasma generation device in a direction toward a stage; a first voltage source configured to apply a voltage to the stage; and a second voltage source configured to adjust the plasma generation device and the guide to a predetermined potential, in which the guide is disposed to avoid an opening of an objective lens through which a charged particle beam passes and to position a tip of the guide between the objective lens and the stage.

公开(公告)号：US11662323B2

公开(公告)日：2023-05-30

申请号：US17020574

申请日：2020-09-14

Applicant: ASML Netherlands B. V.

Inventor： Guochong Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: G01N23/2251 ,  H05F3/02 ,  H01J37/20 ,  H01J37/02 ,  H01J37/28

CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H05F3/02 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/202 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2811 ,  H01J2237/2813

Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EU mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

公开(公告)号：US11651928B2

公开(公告)日：2023-05-16

申请号：US17364717

申请日：2021-06-30

Applicant: FEI Company

Inventor： James B McGinn

IPC: H01J37/08 ,  H01J37/02 ,  H01J37/26

CPC classification number: H01J37/026 ,  H01J37/08 ,  H01J37/26

Abstract: Disclosed herein are apparatuses and systems for reentrant fluid delivery techniques. An example system includes at least a fluid delivery conduit extending between first and second electrical potentials, wherein the fluid delivery conduit is formed into a tilted helical so that a fluid flowing through the fluid delivery conduit experiences an electric field reversal through each winding of the fluid delivery conduit.

公开(公告)号：US11574796B1

公开(公告)日：2023-02-07

申请号：US17382041

申请日：2021-07-21

Applicant: Applied Materials, Inc.

Inventor： Jun Lu ,  Frank Sinclair ,  Shane W. Conley ,  Michael Honan

IPC: H01J37/00 ,  H01J37/30 ,  H01J37/02 ,  H01J37/317

Abstract: An aperture diaphragm capable of varying the size of an aperture in two dimensions is disclosed. The aperture diaphragm may be utilized in an ion implantation system, such as between the mass analyzer and the acceleration column. In this way, the aperture diaphragm may be used to control at least one parameter of the ion beam. These parameters may include angular spread in the height direction, angular spread in the width direction, beam current or cross-sectional area. Various embodiments of the aperture diaphragm are shown. In certain embodiments, the size of the aperture in the height and width directions may be independently controlled, while in other embodiments, the ratio between height and width is constant.