公开(公告)号：US11875975B2

公开(公告)日：2024-01-16

申请号：US17015505

申请日：2020-09-09

Applicant: Redshift Energy, Inc.

Inventor： Alexander Gutsol ,  Yuriy Mirochnik

IPC: H01J37/32 ,  B01J19/08 ,  C01B3/04 ,  C01B17/04

CPC classification number: H01J37/3255 ,  B01J19/088 ,  C01B3/04 ,  C01B17/0495 ,  H01J37/3244 ,  H01J37/32055 ,  B01J2219/0809 ,  B01J2219/0841 ,  B01J2219/0869 ,  B01J2219/0875 ,  B01J2219/0896 ,  H01J2237/338

Abstract: Device for hydrogen sulfide plasma dissociation includes a plasma chemical reactor including an arc plasma generator that has a cathode and an anode; the anode having a working surface for contacting hydrogen sulfide plasma, wherein the working surface is made from a material that includes stainless steel, tungsten or molybdenum; the cathode having a tip for arc attachment where a cathode spot is formed, wherein the cathode tip is made from pure tungsten, pure molybdenum, a tungsten or molybdenum alloy with tungsten as a major component or a composite material in which tungsten or molybdenum is the major component; and a flow path configured to have an inlet for gaseous hydrogen sulfide for dissociation in plasma into hydrogen and sulfur, and an outlet for gaseous products of hydrogen sulfide plasma dissociation. Optionally, the alloy or composite material has up to 10% low work function elements (thorium, cerium, lanthanum, or zirconium).

公开(公告)号：US11821067B2

公开(公告)日：2023-11-21

申请号：US16860646

申请日：2020-04-28

Applicant: Canon Anelva Corporation

Inventor： Masahiro Atsumi

IPC: C23C14/32 ,  C23C14/56 ,  H01J37/32 ,  H01J37/34 ,  H01J27/08 ,  C23C14/54 ,  G11B5/84 ,  C23C14/50

CPC classification number: C23C14/325 ,  C23C14/505 ,  C23C14/54 ,  C23C14/568 ,  G11B5/8408 ,  H01J27/08 ,  H01J37/32055 ,  H01J37/32064 ,  H01J37/32614 ,  H01J37/32944 ,  H01J37/34 ,  H01J37/3417

Abstract: A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.

公开(公告)号：US10011899B2

公开(公告)日：2018-07-03

申请号：US14938513

申请日：2015-11-11

Applicant: CANON ANELVA CORPORATION

Inventor： Teruaki Ono ,  Masahiro Shibamoto

IPC: C23C14/00 ,  C23C14/32 ,  G11B5/84 ,  H01J37/32

CPC classification number: C23C14/325 ,  G11B5/8408 ,  H01J37/32055 ,  H01J37/32064 ,  H01J37/32614 ,  H01J37/3266 ,  H01J37/32669

Abstract: A deposition apparatus comprises a target unit, an anode unit into which electrons emitted from the target unit flow, a striker configured to come into contact with the target unit to render the target unit and the anode unit conductive, so as to cause arc discharge between the target unit and the anode unit, a striker driving unit configured to drive the striker in one of a direction toward the target unit and a direction to retract from the target unit, a power supply unit configured to supply power to the target unit and the anode unit, and a control unit configured to control the striker driving unit and the power supply unit. The control unit supplies the power to the target unit and the anode unit after bringing the striker into contact with the target unit.

公开(公告)号：US20180002805A1

公开(公告)日：2018-01-04

申请号：US15628904

申请日：2017-06-21

Applicant: Oerlikon Surface Solutions AG, Pfaffikon

Inventor： Juergen Ramm ,  Beno Widrig ,  Richard Rachbauer

IPC: C23C14/22 ,  H01M4/02 ,  C23C14/06 ,  C23C14/14

CPC classification number: C23C14/22 ,  C23C14/0605 ,  C23C14/0641 ,  C23C14/067 ,  C23C14/14 ,  C23C14/325 ,  C23C14/564 ,  H01J37/32055 ,  H01J37/32422 ,  H01J37/32614 ,  H01J37/32853 ,  H01J37/32871 ,  H01J37/34 ,  H01M4/02 ,  H01M2004/028

Abstract: A macroparticle filter device for cathodic arc evaporation, to be placed between at least one arc evaporation source and at least one substrate exhibiting at least a surface to be coated with material evaporated from a cathode of the arc evaporation source in a vacuum coating chamber. The macroparticle filter device includes one or more filter components that can prevent macroparticles emitted by the cathode during cathodic arc evaporation to arrive the substrate surface to be coated. The at least one component is provided as one or more flexible sheets that block the lineal way of the macroparticles from the cathode to the substrate surface to be coated. Further a method for utilizing the macroparticle filter device is presented.

公开(公告)号：US09790108B2

公开(公告)日：2017-10-17

申请号：US14987066

申请日：2016-01-04

Applicant: Foret Plasma Labs, LLC

Inventor： Todd Foret

IPC: C02F1/461 ,  H05H1/34 ,  C01B3/34 ,  C02F1/28 ,  H01J37/32 ,  H05H1/42 ,  H05H1/48 ,  C10J3/72 ,  C02F1/46 ,  H05H1/24 ,  B23K10/00 ,  C02F1/32 ,  C02F1/78

CPC classification number: C02F1/46104 ,  B23K10/00 ,  C01B3/34 ,  C01B3/342 ,  C01B2203/0216 ,  C01B2203/0283 ,  C01B2203/0861 ,  C01B2203/1241 ,  C02F1/283 ,  C02F1/32 ,  C02F1/4608 ,  C02F1/46114 ,  C02F1/78 ,  C02F2301/026 ,  C02F2303/16 ,  C10J3/72 ,  C10J2200/12 ,  C10J2300/0916 ,  C10J2300/1238 ,  H01J37/32018 ,  H01J37/32027 ,  H01J37/32055 ,  H05H1/24 ,  H05H1/34 ,  H05H1/3405 ,  H05H1/42 ,  H05H1/48 ,  H05H2001/3489 ,  Y02W10/33 ,  Y02W10/37

Abstract: The present invention provides a system that includes a glow discharge cell and a plasma arc torch. A first valve is connected to a wastewater source. An eductor has a first inlet, a second inlet and an outlet, wherein the first inlet is connected to the outlet of the electrically conductive cylindrical vessel, the second inlet is connected to the first valve, and the outlet is connected to the tangential inlet of the plasma arc torch. A second valve is connected between the tangential outlet of the plasma arc torch and the inlet of the glow discharge cell, such that the plasma arc torch provides the electrically conductive fluid to the glow discharge cell and the glow discharge cell provides a treated water via the outlet centered in the closed second end.

公开(公告)号：US09786474B2

公开(公告)日：2017-10-10

申请号：US15027643

申请日：2014-09-25

Applicant: United Technologies Corporation

Inventor： Thomas Balzano ,  Russell A. Beers

IPC: H01J37/32 ,  C23C14/32 ,  C23C14/06 ,  C23C14/08 ,  C23C14/14 ,  H01J37/34

CPC classification number: H01J37/3266 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/0664 ,  C23C14/081 ,  C23C14/083 ,  C23C14/14 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/32522 ,  H01J37/32614 ,  H01J37/32669 ,  H01J37/32816 ,  H01J37/3435 ,  H01J2237/327 ,  H01J2237/332

Abstract: A cathodic arc coating apparatus includes a vessel, a cathode disposed in the vessel, and a stinger assembly. The stinger assembly includes a first magnetic field generator disposed in a first stinger cup in selective contact with the cathode. The first stinger cup has at least a first electrically conductive cup portion spaced from a second electrically conductive cup portion by a thermally insulating layer therebetween.

公开(公告)号：US09761424B1

公开(公告)日：2017-09-12

申请号：US14483093

申请日：2014-09-10

Applicant: Vladimir Gorokhovsky

Inventor： Vladimir Gorokhovsky

IPC: C23C14/00 ,  H01J37/34 ,  C23C14/22

CPC classification number: H01J37/3458 ,  C23C8/36 ,  C23C14/0605 ,  C23C14/0641 ,  C23C14/22 ,  C23C14/221 ,  C23C14/223 ,  C23C14/325 ,  C23C14/35 ,  C23C14/564 ,  C23C16/029 ,  C23C16/045 ,  C23C16/26 ,  C23C16/50 ,  H01J37/32055 ,  H01J37/32633 ,  H01J37/3266 ,  H01J37/3402 ,  H01J37/3405 ,  H01J37/3447

Abstract: An apparatus for generating energetic particles and application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting and focusing system communicating with a primary cathodic arc plasma source in a cathode chamber and a distal anode in a coating chamber. A coating chamber comprises a substrate holder off of an optical axis of the plasma source. A set of baffles are installed along the walls of cathode chambers and the plasma duct not occupied with plasma sources and in some embodiments across the plasma stream to trap macroparticles and neutrals. A plasma duct has a deflecting portion with attached cathode chamber and a tunnel portion attached to the coating chamber. The deflecting system comprises a deflecting coil surrounding the cathode chamber having an off-set deflecting conductor spaced from the plasma duct. In one embodiment a magnetron source is magnetically coupled with cathodic arc source.

公开(公告)号：US20170243727A1

公开(公告)日：2017-08-24

申请号：US15046600

申请日：2016-02-18

Applicant: Southwest Research Institute

Inventor： Vasiliki Zorbas POENITZSCH ,  Ronghua WEI ,  Edward LANGA ,  Kent E. COULTER

IPC: H01J37/32 ,  C23C4/134 ,  B05B7/22 ,  C23C4/10

CPC classification number: H01J37/32825 ,  B05B7/224 ,  C23C4/08 ,  C23C4/134 ,  H01J37/32055 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32614 ,  H05H1/34 ,  H05H1/42 ,  H05H2001/3447

Abstract: An atmospheric pressure pulsed arc plasma source and method of using including a housing having a housing opening therein; an insulator tube having an insulator tube opening therein, retained within the housing opening; and a conductive tube, retained within the insulator tube opening. A nozzle is retained by the housing. A feed path is defined in the conductive tube and the nozzle and a gas feed port is operatively coupled to the feed path. Feedstock is provided in the feed path and electrically coupled to the conductive tube. A pulsed DC power source provides a pulsed voltage to the conductive tube. The plasma source emits a discharge stream having a temperature that is less than 50° C. from the nozzle and a coating is formed on a substrate.

公开(公告)号：US09728382B2

公开(公告)日：2017-08-08

申请号：US14163650

申请日：2014-01-24

Applicant: SULZER METAPLAS GMBH

Inventor： Joerg Vetter ,  Stefan Esser ,  Juergen Mueller ,  Georg Erkens

IPC: C23C14/34 ,  H01J37/34 ,  C23C14/24 ,  C23C14/32 ,  H01J37/32

CPC classification number: H01J37/3414 ,  C23C14/243 ,  C23C14/325 ,  C23C14/3407 ,  H01J37/32055 ,  H01J37/32614 ,  H01J37/3423 ,  H01J37/3435 ,  H01J37/3497

Abstract: Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.

公开(公告)号：US09659755B2

公开(公告)日：2017-05-23

申请号：US15155504

申请日：2016-05-16

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Masateru Sato

IPC: H01J27/08 ,  H01J37/32

CPC classification number: H01J37/32669 ,  H01J37/32055 ,  H01J37/3233 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32541 ,  H01J37/3255 ,  H01J2237/3365

Abstract: A plasma generator includes: an arc chamber having a plasma generation region in which plasma is generated in the inside thereof; a magnetic field generator configured to apply a magnetic field to the plasma generation region; and a cathode configured to extend in an axial direction along an applying direction of the magnetic field applied to the plasma generation region and provided with a cathode cap that emits thermal electrons at a front end thereof. The cathode cap protrudes toward the inside of the arc chamber in the axial direction and has a shape of which a width in the radial direction perpendicular to the axial direction becomes smaller toward the inside of the arc chamber.