Abstract:
A formulation for durable press finishing of a cellulosic substrate, or a blend thereof, in a finish bath, the formulation comprising from about 3.0% to about 60.0% by weight of non-formaldehyde dimethylurea/glyoxal (DMUG), or an analog thereof, and from about 0.1% to about 4.0% by weight of one or more additives selected from dicyandiamide, choline chloride, ethyleneurea, propyleneurea, urea, dimethylurea, and combinations thereof, wherein the percent by weight is given in terms of percent weight of the finish bath, and wherein the formulation is substantially free of dimethyloldihydroxyethyleneurea (DMDHEU), and methods of use thereof.
Abstract:
A method is provided for reducing pilling of cellulosic towels. A composition comprising an acidic agent, and optionally a fabric softener, is applied to a pillable cellulosic towel, preferable to the face yarns of the towel. The towel is then heated for a time and under conditions sufficient to effect a controlled degradation of the cellulose fibers, thereby reducing pilling. The resultant towels can exhibit water absorbency comparable to untreated towels.
Abstract:
A cigarette filter material is provided which is free from the occurrence of acetic acid odor, even after long-term storage in a hermetically sealed condition, which ensures excellent palatability. This cigarette filter material comprises a fiber assembly composed mainly of cellulose diacetate fibers and, contained therein, 80 to 10,000 ppm of a polyvalent metal salt of an acid selected from among organic and inorganic acids.
Abstract:
This invention relates to an improved process for providing fibrous polyamide materials and wool materials with stain resistance and superior lightfastness that are more durable against alkaline washing. This is accomplished by treating the materials with an aqueous solution comprising a combination of a partially sulfonated novolak resin, methacrylic polymer and a soluble aluminum compound or a combination of a partially sulfonated novolak resin and a soluble aluminum compound. This invention additionally relates to polyamide and wool materials as treated by the aqueous solution for imparting stain resistance and superior lightfastness.
Abstract:
The invention concerns a security-marking procedure, an apparatus to sense a security marking, fiduciary documents provided with security markings, by resorting to rare-earth chelates consisting of at least two rare-earths and of which the fluorescence wavelengths vary as functions of temperature, and fiduciary document containing such chelate(s).
Abstract:
An aqueous concentrated fabric softening composition comprises an aqueous base, more than 10% of a water-soluble cationic softener and at least 3% of an alkoxylated amine having less than 7 alkylene oxide groups per molecule such as ethoxylated tallow amine. The total level of cationic and nonionic components is preferably less than 25%. The alkoxylated amine improves processing by lowering the initial viscosity of the product.
Abstract:
THE INVENTION RELATES TO PRODUCTS OF UNKNOWN CHEMICAL STRUCTURE PREPARED BY REACTING A BORATE ESTER SUCH AS TRIMETHYL BORATE, TRIETHYL BORATE, TRIPROPYL BORATE, TRIBUTYL BORATE, TRIHEXYL BORATE, TRIHEXYLENE GLYCOL BIBORATE, TRIM,P-CRESYL BORATE, AND TRIMETHOXYLBOROXXINE WITH A CHLORIDE OF A METAL SELECTED FROM THE GROUP CONSISTING OF TI(IV), ZR(IV), HF(IV), SN(IV), AL(III), FE(III), GA(III), IN(III), MO(V), NB(V), TA(V), AND W(VI) IN A MOLAR RATIO OF AT LEAST 0.33 MOLE OF THE SELECTED BORATE ESTER FOR EACH MOLE OF THE CHLORIDE OF THE SELECTED METAL IN A SUBSTANTIALLY ANYDROUS DILUENT, SUCH AS AN EXCESS OF THE SELECTED BORATE ESTER, METHYLENE CHLORIDE, CHLOROFORM, AND CARBON TETRACHLORIDE, AT A TEMPERATURE BETWEEN ROOM TEMPERATURE AND ABOUT 200*C. UNTIL THE REACTION MIXTURE CEASES TO GIVE OFF ORGANIC CHLORIDE THEREBY FORMING ALIQUOR COMPRISING THE DILUENT AND A COMPOUND OF COMPLEX CHEMICAL STRUCTURE COMPRISING THE SELECTED METAL, BORON, CARBON, HYDROGEN, CHLORINE, AND OXYGEN. THEN THERE IS ADDED TO SAID LIQUOR A SILICON-CONTAINING COMPOUND CONFORMING TO THE FORMULA CLNSIR4-N WHERE N IS AN INTERGER FROM 1 TO 4 AND R IS AN ALKYL OR ARYL RADICAL IN A MOLAR QUANTITY NOT GREATER THAN THAT OF THE CHLORIDE OF THE SELECTED METAL TO REACT WITH SAID COMPLEX COMPOUND AT A TEMPERATURE BETWEEN ROOM TEMPERATURE AND ABOUT 200*C. THEREBY FORMING A SECOND COMPOUND OF COMPLEX CHEMICAL STRUCTURE. THE SECOND COMPOUND OF COMPLEX CHEMICAL STRUCTURE MAY BE ISOLATED BY REMOVING VOLATILE MATERIAL FROM THE REACTION MIXTURE BY EVAPORATION. SILICON TETRACHLORIDE, DIMETHYL-DICHLOROSILANE, DIPHENYLDICHLOROSILANE AND TRIMETHYLCHLOROSILANE ARE ILLUSTRATIVE OF COMPOUNDS CONFORMING TO THE FORMULA CLNSIR4-N.