公开(公告)号：US20220024924A1

公开(公告)日：2022-01-27

申请号：US17297035

申请日：2019-11-27

Applicant: TEVA CZECH INDUSTRIES S.R.O

Inventor： Nikolina Janton ,  Helena Ceric ,  Sanja Matecic Musanic ,  Natasa Mrsic ,  Lidija Lerman ,  Tina D. Momcilovic ,  Ivana Sagud ,  Alexandr Jegorov

IPC: C07D471/16 ,  C07C309/29

Abstract: The present disclosure relates to solid state forms of Lumateperone besylate and Lumateperone tosylate:R-(−)-mandelic acid, to various intermediates, to processes for their preparation and the preparation of Lumateperone or salt thereof, to pharmaceutical compositions and their use for the treatment of central nervous system disorders.

公开(公告)号：US11131926B2

公开(公告)日：2021-09-28

申请号：US16012124

申请日：2018-06-19

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Takahiro Suzuki ,  Daisuke Domon ,  Masaaki Kotake ,  Keiichi Masunaga ,  Satoshi Watanabe

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C07C309/42 ,  C07C309/25 ,  C07C309/29 ,  C07C309/35 ,  C07C309/38 ,  C07C309/44 ,  C07C309/59 ,  C07C323/66 ,  C07C309/39

Abstract: The present invention provides a resist composition, including: (A) a sulfonium salt containing an anion and a cation, the cation including a partial structure shown by the following general formula (A1); and (B) a polymer compound containing a repeating unit shown by the following general formula (B1). The present invention provides a resist composition that causes few defects and is excellent in lithography performance, having regulated acid diffusion, in photolithography using a high energy beam as a light source, and a resist patterning process using this resist composition.

公开(公告)号：US20210261556A1

公开(公告)日：2021-08-26

申请号：US17178346

申请日：2021-02-18

Applicant: PAION UK LIMITED

Inventor： Gary Stuart TILBROOK ,  Louisa Jane QUEGAN

IPC: C07D487/04 ,  C07C309/29

Abstract: The invention relates to besylate salts of the compound of formula (I): Methods of preparing the salts, and their use as medicaments, in particular for sedative or hypnotic, anxiolytic, muscle relaxant, or anticonvulsant purposes is also described.

公开(公告)号：US20190218172A1

公开(公告)日：2019-07-18

申请号：US16330847

申请日：2017-09-12

Applicant: SICHUAN HAISO PHARMACEUTICAL CO., LTD.

Inventor： Yao LI ,  Zongjun SHI ,  Bo XU

IPC: C07C229/50 ,  C07C309/29 ,  A61P25/00

CPC classification number: C07C229/50 ,  A61K31/195 ,  A61P25/00 ,  A61P25/04 ,  A61P25/06 ,  A61P29/00 ,  C07C229/28 ,  C07C309/29 ,  Y02P20/55

Abstract: Disclosed are a fused tricyclic γ-amino acid derivative and a medical use thereof, in particular, the present invention relates to a fused cyclic γ-amino acid derivative as shown in general formula (I), or a stereoisomer, solvate, metabolite, prodrug, pharmaceutically acceptable salt or eutectic thereof, a pharmaceutical composition containing same, and the use of a compound or the composition in the field of analgesia, wherein the definitions of each substituent in general formula (I) are the same as the definitions in the description.

公开(公告)号：US10208210B2

公开(公告)日：2019-02-19

申请号：US15329408

申请日：2015-07-29

Applicant: MITSUBISHI MATERIALS CORPORATION ,  Mitsubishi Materials Electronic Chemicals Co., Ltd.

Inventor： Masato Fujita ,  Masakazu Uotani ,  Takeshi Kamiya ,  Tsunetoshi Honda ,  Daisuke Takano

IPC: C09D5/16 ,  B01D17/02 ,  C09D7/00 ,  C07C229/12 ,  C07C227/16 ,  C07C233/05 ,  C07C231/02 ,  C07C311/05 ,  C07C303/38 ,  C07C309/13 ,  C07C303/02 ,  C07D211/38 ,  C07D265/30 ,  C07D207/10 ,  C07D241/04 ,  C02F1/40 ,  C09D7/40 ,  C07C303/22 ,  C07C303/40 ,  C07C309/04 ,  C07C309/29 ,  C07C311/03 ,  C07C227/06 ,  C07C227/08 ,  C07C227/18 ,  C07C229/06 ,  C07C231/12 ,  C07C233/08 ,  C08K5/17 ,  C09D201/00 ,  C09K3/00 ,  C08L101/00 ,  C09D7/20

Abstract: The hydrophilic oil repellent includes one or more types of nitrogen-containing fluorine-based compounds. The nitrogen-containing fluorine-based compound includes any one hydrophilicity imparting group selected from the group consisting of anion type hydrophilicity imparting groups, cation type hydrophilicity imparting groups, and amphoteric type hydrophilicity imparting groups in the molecule.

公开(公告)号：US10120279B2

公开(公告)日：2018-11-06

申请号：US15666757

申请日：2017-08-02

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Keiichi Masunaga ,  Satoshi Watanabe ,  Masaaki Kotake ,  Kenji Yamada ,  Masaki Ohashi

IPC: G03F7/004 ,  G03F7/38 ,  G03F7/20 ,  C07C303/32 ,  C07C309/01 ,  C07C309/06 ,  C07C309/09 ,  C07C309/17 ,  C07C309/19 ,  C07C309/23 ,  C07C309/24 ,  C07C69/63 ,  C08F212/02 ,  C08F220/22 ,  C08F220/24 ,  C08F220/38 ,  C08F224/00 ,  C08F228/02 ,  G03F7/038 ,  G03F7/32 ,  C07C309/04 ,  C07C309/31 ,  C07C309/30 ,  C07C309/29 ,  C07C309/58 ,  C07C309/35 ,  C07C309/44 ,  C07C69/753 ,  C07C309/32 ,  C08F222/10 ,  C08F220/30 ,  G03F7/16 ,  C08F220/28

Abstract: A negative resist composition comprising (A) a sulfonium compound of betaine type and (B) a polymer is provided. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.

公开(公告)号：US20180282310A1

公开(公告)日：2018-10-04

申请号：US15580564

申请日：2016-06-10

Applicant: BIOGEN MA INC.

Inventor： J. Michael MacPhee ,  Michael Humora

IPC: C07D403/14 ,  C07C309/04 ,  C07C309/05 ,  C07C309/08 ,  C07C309/29 ,  C07C309/30 ,  C07C309/35 ,  C07C55/07 ,  C07C57/15 ,  C07C59/255 ,  C07C59/265 ,  C07C59/245 ,  C07C55/10 ,  C07C233/83 ,  C07C57/145 ,  C07C229/24 ,  C07C55/28 ,  C07C59/11 ,  C07C55/08 ,  C07C57/44 ,  C07C237/12 ,  C07C229/26 ,  C07C229/36 ,  C07D207/16 ,  C07C229/22 ,  C07D213/82 ,  C07D213/80 ,  C07D275/06 ,  C07D207/28

Abstract: The present invention provides compounds and compositions thereof which are useful as inhibitors of Bruton's tyrosine kinase and which exhibit desirable characteristics for the same.

公开(公告)号：US20180265474A1

公开(公告)日：2018-09-20

申请号：US15924005

申请日：2018-03-16

Applicant: Aldeyra Therapeutics, Inc.

Inventor： Amanda BUIST ,  Eden FUCCI ,  Stephen G. MACHATHA ,  Osama SULEIMAN ,  Kate WITTERING

IPC: C07D215/38 ,  C07C309/04 ,  A61K31/47 ,  C07C309/29 ,  C07C55/07 ,  C07C309/25 ,  C07C59/255

Abstract: The present invention provides freebase and salt forms, and compositions and methods thereof, useful for treating various conditions, in which aldehyde toxicity is implicated in the pathogenesis, by the administration of small molecule therapeutics acting as a scavenger for toxic aldehydes.

公开(公告)号：US10005738B2

公开(公告)日：2018-06-26

申请号：US15401637

申请日：2017-01-09

Applicant: Celgene CAR LLC

Inventor： Mei Lai ,  Steven Richard Witowski ,  Richland Wayne Tester ,  Kwangho Lee

IPC: C07D239/49 ,  C07D239/48 ,  C07C55/02 ,  C07C55/07 ,  C07C62/02 ,  C07C309/04 ,  C07C309/05 ,  C07C309/27 ,  C07C309/29 ,  C07C309/30 ,  C07C309/35

CPC classification number: C07D239/48 ,  C07B2200/13 ,  C07C55/02 ,  C07C55/07 ,  C07C62/02 ,  C07C309/04 ,  C07C309/05 ,  C07C309/27 ,  C07C309/29 ,  C07C309/30 ,  C07C309/35

Abstract: The present invention provides a salt form and compositions thereof, which are useful as an inhibitor of EGFR kinases and which exhibits desirable characteristics for the same.

公开(公告)号：US20180170875A1

公开(公告)日：2018-06-21

申请号：US15895244

申请日：2018-02-13

Applicant: Athenex, Inc.

Inventor： David G. HANGAUER, JR.

IPC: C07D213/56 ,  C07C303/32 ,  C07C309/29

CPC classification number: C07D213/56 ,  C07C303/32 ,  C07C309/29

Abstract: The invention relates to compounds and methods for modulating one or more components of a kinase cascade. The invention also relates to substantially pure compound 1 and substantially pure compound 1 salt (e.g., compound 1 hydrochloride salt and compound 1 benzenesulfonate salt). The invention further relates to methods of preparing substantially pure compound 1 and compound 1 salts.