公开(公告)号：US12040491B2

公开(公告)日：2024-07-16

申请号：US17417744

申请日：2019-12-10

申请人： TOAGOSEI CO., LTD.

发明人： Tomoko Nakano ,  Ayano Higasayama ,  Naohiko Saito

IPC分类号： H01M4/62 ,  C08F20/06 ,  C08F20/28

CPC分类号： H01M4/622 ,  C08F20/06 ,  C08F20/28

摘要： A binder is for a secondary battery electrode and exhibits high binding properties in an electrode mixture layer and is capable of exhibiting superior cycle characteristics than before. This binder for a secondary battery electrode includes a cross-linked polymer or salt thereof, and the cross-linked polymer or salt thereof has a sol fraction of 5.0 mass % or more and 40 mass % or less. The cross-linked polymer or salt thereof may contain 50 mass % or more and 100 mass % or less of structural units derived from an ethylenic unsaturated carboxylic acid monomer.

公开(公告)号：US11866528B2

公开(公告)日：2024-01-09

申请号：US17049391

申请日：2019-04-12

申请人： KURARAY CO., LTD.

发明人： Daiki Noguchi ,  Takashi Fukumoto ,  Keiji Kubo

IPC分类号： C08F20/28 ,  B01J20/26

CPC分类号： C08F20/28 ,  B01J20/261 ,  B01J20/264 ,  B01J20/267 ,  B01J2220/46

摘要： A polymer comprising a structural unit derived from a compound (A) represented by formula (I):






wherein X, Y, R1, R2, R7, R8, R3, R4, R5, R6, J, and n are as defined in the description,
provides a resin composition that has an excellent curability and sufficiently polymerizes for curing even in the presence of oxygen in an air atmosphere to form a cured product having excellent appearance.

公开(公告)号：US11822243B2

公开(公告)日：2023-11-21

申请号：US16333449

申请日：2017-08-22

申请人： TORAY INDUSTRIES, INC.

发明人： Yugo Tanigaki ,  Akihiro Ishikawa ,  Kazuto Miyoshi

IPC分类号： G03F7/037 ,  G03F7/30 ,  G03F7/40 ,  G03F7/027 ,  G02F1/1335 ,  G02F1/1339 ,  G03F7/023 ,  G03F7/032 ,  G03F7/038 ,  G03F7/075 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  C08F20/28 ,  H05B33/22 ,  H05B33/10 ,  H05B33/12 ,  G03F7/105 ,  G03F7/033 ,  H10K50/00 ,  H10K50/86 ,  H10K59/122 ,  H10K59/126 ,  H10K85/40 ,  H10K85/10 ,  H10K59/12

CPC分类号： G03F7/037 ,  C08F20/28 ,  G02F1/1335 ,  G02F1/1339 ,  G02F1/13394 ,  G02F1/133512 ,  G03F7/027 ,  G03F7/0233 ,  G03F7/032 ,  G03F7/033 ,  G03F7/038 ,  G03F7/0757 ,  G03F7/105 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/322 ,  G03F7/40 ,  H05B33/10 ,  H05B33/12 ,  H05B33/22 ,  H10K50/00 ,  H10K50/865 ,  H10K59/122 ,  H10K59/126 ,  H10K85/111 ,  H10K85/141 ,  H10K85/40 ,  G02F1/13398 ,  H10K59/1201

摘要： The present invention provides a negative-type photosensitive resin composition capable of obtaining a cured film suppressing generation of development residues caused by a pigment and having high sensitivity and excellent heat resistance and light blocking capability. A negative-type photosensitive resin composition contains an alkali-soluble resin (A), a radical-polymerizable compound (B), a photopolymerization initiator (C1), and a pigment (D1). In this resin composition, the radical-polymerizable compound (B) contains a flexible chain-containing radical-polymerizable compound (B1), the flexible chain-containing radical-polymerizable compound (B1) contains a compound having (I) a structure derived from a compound having at least three hydroxyl groups in the molecule, (II) at least three ethylenically unsaturated double bond groups, and (III) at least one aliphatic chain, the aliphatic chain has an average molecular weight of 40 to 500, and the content of the pigment (D1) is 5 to 70 mass % of the total solid content.

公开(公告)号：US11746284B2

公开(公告)日：2023-09-05

申请号：US16625170

申请日：2018-06-26

申请人： Merck Patent GmbH

发明人： Tadashi Kishimoto ,  Yuki Hirayama ,  Tomohisa Goto ,  Masayoshi Suzuki ,  Teruaki Suzuki

IPC分类号： C09K11/02 ,  C08F20/18 ,  C08F20/28 ,  C08K3/30 ,  C08K3/32 ,  C08K9/02 ,  C09K11/08 ,  C09K11/70 ,  C09K11/88 ,  H01L51/00 ,  B82Y20/00 ,  H01L51/50

CPC分类号： C09K11/02 ,  C08F20/18 ,  C08F20/28 ,  C08K3/30 ,  C08K3/32 ,  C08K9/02 ,  C09K11/0883 ,  C09K11/70 ,  C09K11/883 ,  H01L51/0035 ,  B82Y20/00 ,  C08K2201/001 ,  C08K2201/011 ,  H01L51/502

摘要： The present invention relates to a composition comprising a semiconducting light emitting nanoparticle.

公开(公告)号：US20180258456A1

公开(公告)日：2018-09-13

申请号：US15559193

申请日：2016-03-17

申请人： Institut National de la Recherche Agronomique (INRA) ,  Institut National des Sciences Appliquees de Toulouse (INSAT) ,  Centre National de la Recherche Scientifique ,  Universite de Bordeaux ,  Institut Polytechnique de Bordeaux

发明人： Isabelle Andre ,  Stephane Grelier ,  David Guieysse ,  Alvaro Lafraya ,  Pierre Monsan ,  Claire Moulis ,  Frederic Peruch ,  Magali Remaud-Simeon ,  Marlene Vuillemin

IPC分类号： C12P19/60 ,  C12N9/24 ,  C08L5/00

CPC分类号： C12P19/60 ,  C08F20/28 ,  C08F20/58 ,  C08L5/00 ,  C12N9/24 ,  C12P19/44 ,  C12P19/58

摘要： The present invention relates to a method for producing a glycosylated synthon or a monomer. Said method includes at least one step of placing at least one glycan-saccharase in the presence of at least one hydroxylated synthon and at least one saccharose. The invention also relates to a method for producing a glyco(co)polymer, including polymerizing at least two monomers separately obtained from the enzymatic glycosylation method according to the invention, and to a method for producing a glyco(co)polymer, preferably a block glyco(co)polymer, including coupling at least two monomers separately obtained from the enzymatic glycosylation method according to the invention.

公开(公告)号：US09926462B2

公开(公告)日：2018-03-27

申请号：US15358250

申请日：2016-11-22

申请人： JSR CORPORATION

发明人： Kiyoshi Tanaka ,  Kazunori Kusabiraki ,  Takahiro Hayama ,  Motoyuki Shima

IPC分类号： C08F16/34 ,  C08F16/36 ,  C08F16/38 ,  C09D135/02 ,  C08F20/28 ,  G03F7/11 ,  G03F7/20 ,  C09D133/16 ,  C08F220/28

CPC分类号： C09D135/02 ,  C08F20/28 ,  C08F220/28 ,  C08F2220/281 ,  C09D133/16 ,  G03F7/11 ,  G03F7/2041

摘要： An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).

公开(公告)号：US20180037758A1

公开(公告)日：2018-02-08

申请号：US15555336

申请日：2016-02-26

申请人： KONICA MINOLTA, INC.

发明人： Takayuki ISHIKAWA ,  Akiko HARA

IPC分类号： C09D11/106 ,  B29C64/209 ,  C09D11/40 ,  B33Y70/00 ,  C09D11/30 ,  C09D11/102 ,  B29C64/129 ,  B33Y10/00

CPC分类号： C09D11/106 ,  B29C64/112 ,  B29C64/129 ,  B29C64/209 ,  B29K2075/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y70/00 ,  C08F2/48 ,  C08F20/28 ,  C08F220/12 ,  C09D11/101 ,  C09D11/102 ,  C09D11/107 ,  C09D11/30 ,  C09D11/40

摘要： The purpose of the present invention is to provide: an ink composition for three-dimensional modeling by an inkjet method, which has low viscosity and high ejectability, and which is capable of producing a three-dimensional model having higher tensile strength and higher impact resistance; an ink set which includes this ink composition; and a method for producing a three-dimensional model, which uses this ink composition. This ink composition for three-dimensional modeling contains a photopolymerizable monomer, a polymer and a photopolymerization initiator. The polymer has a weight average molecular weight of from 5,000 to 80,000 (inclusive); the photopolymerizable monomer contains a monomer that is capable of forming a ring structure in the main chain by polymerization; and the difference between the solubility parameter of the photopolymerizable monomer and the solubility parameter of the polymer is from 0.30 (cal/cm3)1/2 to 2.0 (cal/cm3)1/2 (inclusive).

公开(公告)号：US09752045B2

公开(公告)日：2017-09-05

申请号：US15225221

申请日：2016-08-01

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Jun Hatakeyama ,  Takayuki Nagasawa ,  Koji Hasegawa

IPC分类号： H01B1/12 ,  C09D133/14 ,  C09D5/24 ,  C08F20/38 ,  C08F12/30 ,  C08F22/24 ,  C08F20/28 ,  C08L33/14 ,  C09D125/18 ,  C09D135/02 ,  C08L35/02 ,  C08F12/20 ,  C08F12/22 ,  C08F212/14 ,  C08F12/24

CPC分类号： C09D133/14 ,  C08F12/20 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F20/28 ,  C08F20/38 ,  C08F22/24 ,  C08F212/14 ,  C08F2500/04 ,  C08F2500/26 ,  C08L33/14 ,  C08L35/02 ,  C08L2201/10 ,  C08L2203/16 ,  C08L2203/20 ,  C09D5/24 ,  C09D7/65 ,  C09D125/18 ,  C09D135/02 ,  H01B1/12 ,  H01B1/125 ,  H01B1/127 ,  H01L51/0036 ,  H01L51/442 ,  Y02E10/549 ,  C08F2220/382

摘要： The present invention provides a conductive polymer composite including: (A) a π-conjugated polymer, and (B) a dopant polymer which contains a repeating unit “a” shown by the following general formula (1) and having a weight-average molecular weight in the range of 1,000 to 500,000. There can be provided a conductive polymer composite which has excellent filterability and film-formability by spin coating, and can form a conductive film having high transparency and excellent flatness. wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group optionally containing an ether group, an ester group, or both; “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0

公开(公告)号：US20170137546A1

公开(公告)日：2017-05-18

申请号：US15318296

申请日：2015-06-29

申请人： 3M INNOVATIVE PROPERTIES COMPANY

发明人： Zachary J. Thompson

IPC分类号： C08F20/28 ,  B32B17/06 ,  B32B7/12

CPC分类号： C08F20/28 ,  B32B7/12 ,  B32B17/061 ,  B32B2255/06 ,  B32B2255/26 ,  B32B2307/412 ,  C08F2/44 ,  C08F4/34 ,  C08F220/28 ,  C08F2220/281 ,  C08F220/20

摘要： A method of curing a free-radically polymerizable composition includes contacting a curable composition with at least one metal oxide selected from the group consisting of magnesium oxide, ferrous metal oxides, aluminum oxide, nickel oxide, silver oxide, and combinations thereof. The curable composition includes: free-radically polymerizable compound; and a beta-dicarbonyl compound represented by the formula (I) or a salt thereof, wherein: X1 and X2 independently represent a covalent bond, wherein each R4 independently represents H or alkyl having from 1 to 18 carbon atoms; R1 and R2 independently represent a hydrocarbyl or substituted-hydrocarbyl group having from 1 to 18 carbon atoms, and R3 represents hydrogen, or a hydrocarbyl or substituted-hydrocarbyl group having from 1 to 18 carbon atoms, or taken together any two of R1, R2, or R3 form a five-membered or six-membered ring; an organic peroxide; and a quaternary ammonium halide. Articles including the cured compositions are also disclosed.

公开(公告)号：US20170005266A1

公开(公告)日：2017-01-05

申请号：US15259164

申请日：2016-09-08

申请人： FUJIFILM Corporation

发明人： Yuzo NAGATA ,  Hiroo TAKIZAWA ,  Tomotaka TSUCHIMURA ,  Takuya TSURUTA

IPC分类号： H01L51/00 ,  C08F20/28 ,  C08F12/22 ,  H01L51/05 ,  C08F12/24

CPC分类号： H01L51/004 ,  C08F12/22 ,  C08F12/24 ,  C08F20/28 ,  C08F212/14 ,  C08F2500/02 ,  C08F2800/10 ,  C08F2810/20 ,  H01L21/02118 ,  H01L29/786 ,  H01L51/0043 ,  H01L51/0055 ,  H01L51/0071 ,  H01L51/0094 ,  H01L51/052 ,  H01L51/0545 ,  H01L51/0566 ,  C08F2220/325 ,  C08F212/32 ,  C08F220/36 ,  C08F2220/302 ,  C08F2220/343

摘要： Provided is a semiconductor element having a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound having a repeating unit (IA) represented by the following General Formula (IA) and a repeating unit (IB) represented by the following General Formula (IB). In General Formula (IA), R1a represents a hydrogen atom, a halogen atom, or an alkyl group. L1a and L2a each independently represent a single bond or a linking group. X represents a crosslinkable group. m2a represents an integer of 1 to 5, and in a case where m2a is 2 or more, m2a number of X's may be the same or different from each other, m1a represents an integer of 1 to 5, and in a case where m1a is 2 or more, m1a number of (-L2a-(X)m2a)'s may be the same or different from each other. In General Formula (IB), R1b represents a hydrogen atom, a halogen atom, or an alkyl group. L1b represents a single bond or a linking group, and Ar1b represents an aromatic ring, m1b represents an integer of 1 to 5.

摘要翻译： 在通式（IA）中，R 1a表示氢原子，卤素原子或烷基。 L1a和L2a各自独立地表示单键或连接基团。 X表示可交联基团。 m2a表示1〜5的整数，并且在m2a为2以上的情况下，m 1a的数X可以相同或不同，m1a表示1〜5的整数，在m1a为 2个以上时，m1a个（-L2a-（X）m2a）可以相同也可以不同。 在通式（IB）中，R 1b表示氢原子，卤素原子或烷基。 L1b表示单键或连接基，Ar1b表示芳香环，m1b表示1〜5的整数。