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公开(公告)号:US20210175243A1
公开(公告)日:2021-06-10
申请号:US16911299
申请日:2020-06-24
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: DONGHA SHIN , YOHAN LEE
IPC: H01L27/11573 , H01L27/11524 , H01L27/11556 , H01L27/11529 , H01L27/1157 , H01L27/11582 , H01L23/522 , H01L23/528 , G11C16/04 , G11C16/08
Abstract: A nonvolatile memory device includes; a memory cell area including a cell structure and a common source plate. The memory cell area is mounted on a peripheral circuit area including a buried area covered by the memory cell area and an exposed area uncovered by the memory cell area. A first peripheral circuit (PC) via extending from the exposed area, and a common source (CS) via extending from the common source plate, wherein the first PC via and the CS via are connected by a CS wire disposed outside the cell structure and providing a bias voltage to the common source plate.
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2.
公开(公告)号:US20230154553A1
公开(公告)日:2023-05-18
申请号:US17955858
申请日:2022-09-29
Applicant: Samsung Electronics Co., Ltd.
Inventor: YOHAN LEE , SANG-WAN NAM , SANG-WON PARK , JIHO CHO , EUNHYANG PARK
CPC classification number: G11C16/3459 , G11C16/102 , G11C16/24 , G11C16/3404
Abstract: Disclosed is an operation method of a memory device that includes a plurality of memory cells stacked in a direction perpendicular to a substrate. The method includes performing first to (n−1)-th program loops on selected memory cells connected to a selected word line from among the plurality of memory cells, based on a first program parameter, and after the (n−1)-th program loop is performed, performing n-th to k-th program loops on the selected memory cells, based on a second program parameter different from the first program parameter. Herein, n is an integer greater than 1 and k is an integer greater than or equal to n. The first and second program parameters include information about at least two of a program voltage increment, a 2-step verify range, and a bit line forcing voltage used in the first to k-th program loops.
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公开(公告)号:US20230307353A1
公开(公告)日:2023-09-28
申请号:US17933770
申请日:2022-09-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: YOHAN LEE , CHAEHOON KIM , JAEDUK YU , JIHO CHO
IPC: H01L23/522 , H01L27/11582
CPC classification number: H01L23/5226 , H01L27/11582
Abstract: A semiconductor device includes a CSL driver on a substrate, a CSP on the CSL driver, a gate electrode structure on the CSP and including gate electrodes spaced apart from each other in a first direction perpendicular to an upper surface of the substrate, each of the gate electrodes extends in a second direction parallel to the upper surface of the substrate, a memory channel structure on the CSP and extending through the gate electrode structure and is connected to the CSP, a first upper wiring structure contacting an upper surface of the CSP, a first through via extending through the CSP in the first direction and is electrically connected to the first upper wiring structure and the CSL driver but does not contact the CPS, and a dummy wiring structure contacting the upper surface of the CSP but is not electrically connected to the CSL driver.
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4.
公开(公告)号:US20230145467A1
公开(公告)日:2023-05-11
申请号:US18045541
申请日:2022-10-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jaeduk YU , YOHAN LEE , YONGHYUK CHOI , JIHO CHO
IPC: G11C11/408 , G11C11/4074 , G11C11/4096
CPC classification number: G11C11/4085 , G11C11/4074 , G11C11/4096
Abstract: A nonvolatile memory device having a multi-stack memory block includes: a memory cell array divided into a plurality of memory stacks disposed in a vertical direction; and a control circuit configured to perform a channel voltage equalization operation of the plurality of memory stacks, wherein inter-stack portions are between the plurality of memory stacks, and a channel hole passes through the word lines of each of the plurality of memory stacks. The control circuit determines, as inter-stack word lines, some word lines adjacent to the inter-stack portions among the word lines of each of the plurality of memory stacks and differently controls setup time points for applying a pass voltage, or recovery time points for applying a ground voltage, to the inter-stack word lines, according to sizes of the channel hole of the inter-stack word lines.
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公开(公告)号:US20230117242A1
公开(公告)日:2023-04-20
申请号:US18085717
申请日:2022-12-21
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: DONGHA SHIN , YOHAN LEE
Abstract: A nonvolatile memory device includes; a memory cell area including a common source plate, at least one cell structure under the common source plate, and a first metal pad under the at least one cell structure, and a peripheral circuit area on which the memory cell area is mounted, including a middle area , a first edge area, and a second metal pad on the first edge area. The memory cell area further includes a first contact extending from the common source plate and connected to the first metal pad. The peripheral circuit area further includes a second contact extending from a common source line switch and connected to the second metal pad. The first metal pad contacts with the second metal pad on the second metal pad.
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