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公开(公告)号:US20170117223A1
公开(公告)日:2017-04-27
申请号:US15188743
申请日:2016-06-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Raheel Azmat , Sengupta RWIK , Su-Hyeon KIM , Chul-Hong PARK , Jae-Hyoung LIM
IPC: H01L23/528 , H01L29/08 , H01L29/161 , H01L29/16 , H01L21/285 , H01L29/78 , H01L29/06 , H01L21/8238 , H01L29/66 , H01L27/092 , H01L29/165
CPC classification number: H01L23/5286 , H01L21/28518 , H01L21/823814 , H01L21/823821 , H01L21/823871 , H01L21/823878 , H01L27/0207 , H01L27/092 , H01L27/0924 , H01L29/0653 , H01L29/0847 , H01L29/1608 , H01L29/161 , H01L29/165 , H01L29/66545 , H01L29/7848
Abstract: A logic semiconductor device includes a plurality of active patterns extending in a horizontal direction and being spaced apart from each other in a vertical direction, an isolation layer defining the active patterns, a plurality of gate patterns extending in the vertical direction on the active patterns and the isolation layer, the gate patterns being spaced apart from each other in the horizontal direction, a plurality of lower wirings extending in the horizontal direction over the gate patterns, a plurality of upper wirings extending in the vertical direction over the lower wirings, a through contact connecting at least one upper wiring of the upper wirings and at least one gate pattern of the gate patterns, the through contact extending from a bottom surface of the upper wiring to a position under a bottom surface of one of the lower wirings relative to the active patterns.
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公开(公告)号:US20170309569A1
公开(公告)日:2017-10-26
申请号:US15647467
申请日:2017-07-12
Applicant: Samsung Electronics Co., Ltd.
Inventor: Raheel Azmat , Sengupta RWIK , Su-Hyeon KIM , Chul-Hong PARK , Jae-Hyoung LIM
IPC: H01L23/528 , H01L29/66 , H01L29/165 , H01L29/161 , H01L29/16 , H01L29/06 , H01L21/285 , H01L27/092 , H01L21/8238 , H01L29/78 , H01L29/08
CPC classification number: H01L23/5286 , H01L21/28518 , H01L21/823814 , H01L21/823821 , H01L21/823871 , H01L21/823878 , H01L27/0207 , H01L27/092 , H01L27/0924 , H01L29/0653 , H01L29/0847 , H01L29/1608 , H01L29/161 , H01L29/165 , H01L29/66545 , H01L29/7848
Abstract: A logic semiconductor device includes a plurality of active patterns extending in a horizontal direction and being spaced apart from each other in a vertical direction, an isolation layer defining the active patterns, a plurality of gate patterns extending in the vertical direction on the active patterns and the isolation layer, the gate patterns being spaced apart from each other in the horizontal direction, a plurality of lower wirings extending in the horizontal direction over the gate patterns, a plurality of upper wirings extending in the vertical direction over the lower wirings, a through contact connecting at least one upper wiring of the upper wirings and at least one gate pattern of the gate patterns, the through contact extending from a bottom surface of the upper wiring to a position under a bottom surface of one of the lower wirings relative to the active patterns.
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