公开(公告)号：US10013097B2

公开(公告)日：2018-07-03

申请号：US14466673

申请日：2014-08-22

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-Hyun Choung ,  In-Bae Kim ,  Hong Sick Park ,  Byeong-Jin Lee

IPC: G06F3/045 ,  G06F3/041 ,  G06F3/044

CPC classification number: G06F3/0416 ,  G06F3/044 ,  G06F2203/04103 ,  G06F2203/04111

Abstract: A touch screen panel and manufacturing method thereof are disclosed. In one aspect, the touch screen panel includes a substrate having a touch area and a peripheral area that surrounds the touch area and a plurality of first touch electrode patterns that are formed in the touch area, extend in a first direction, and are configured to transmit a first touch signal. The touch panel also includes a plurality of second touch electrode patterns that are formed in the touch area, extend in a second direction crossing the first direction, and are configured to transmit a second touch signal and a plurality of first driving circuit wirings that are formed in the peripheral area and are respectively electrically connected to the first touch electrode patterns. The first driving circuit wirings include a low resistance wiring layer.

公开(公告)号：US09136137B2

公开(公告)日：2015-09-15

申请号：US14263956

申请日：2014-04-28

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： In-Bae Kim ,  Jong-Hyun Choung ,  Youngmin Moon ,  Hongsick Park ,  Gyu-po Kim ,  Won-guk Seo ,  Hyun-cheol Shin ,  Ki-beom Lee ,  Sam-young Cho ,  Seung-yeon Han

IPC: H01L21/44 ,  H01L21/306 ,  C23F1/18

CPC classification number: H01L21/30604 ,  C23F1/18 ,  H01L21/32134 ,  H01L27/124 ,  H01L29/45

Abstract: An etchant composition including 0.5 wt % to 20 wt % of a persulfate, 0.01 wt % to 1 wt % of a fluorine compound, 1 wt % to 10 wt % of an inorganic acid, 0.01 wt % to 2 wt % of an azole-based compound, 0.1 wt % to 5 wt % of a chlorine compound, 0.05 wt % to 3 wt % of a copper salt, 0.01 wt % to 5 wt % of an antioxidant or a salt thereof, based on a total weight of the etchant composition, and water in an amount sufficient for the total weight of the etchant composition to be equal to 100 wt % is disclosed. The etchant composition is suitable for use in forming a metal wiring by etching a metal layer including copper or in fabricating a thin film transistor substrate for a display apparatus.

Abstract translation: 包含0.5重量％至20重量％的过硫酸盐，0.01重量％至1重量％的氟化合物，1重量％至10重量％的无机酸，0.01重量％至2重量％的唑类， 0.1重量％至5重量％的氯化合物，0.05重量％至3重量％的铜盐，0.01重量％至5重量％的抗氧化剂或其盐，基于蚀刻剂的总重量 组合物和水的量足以使蚀刻剂组合物的总重量等于100重量％。 蚀刻剂组合物适用于通过蚀刻包括铜的金属层或制造用于显示装置的薄膜晶体管基板来形成金属布线。

公开(公告)号：US20150147836A1

公开(公告)日：2015-05-28

申请号：US14332215

申请日：2014-07-15

Applicant: Samsung Display Co., Ltd. ,  ENF Technology Co., Ltd

Inventor： In-Bae Kim ,  Jong-Hyun Choung ,  Young Min Moon ,  Hong Sick Park ,  Hyeon Jeong Sang ,  Jae Woo Jeong ,  Min Hee Kim ,  Young Jin Park ,  Sang-Moon Yun ,  Sang Dai Lee ,  Hyun Cheol Jeong

IPC: H01L21/02 ,  H01L27/15

CPC classification number: H01L27/153 ,  C03C23/0075 ,  C11D1/66 ,  C11D3/044 ,  C11D3/046 ,  C11D3/30 ,  C11D3/33 ,  C11D11/0041 ,  H01L21/02052 ,  H01L27/1262

Abstract: The disclosure provides a cleaning agent composition for a flat panel display device, including: polyaminocarboxylic acid; alkali base; a nonionic surfactant; and a fluoride component. The cleaning agent composition for the flat panel display device can effectively remove metal oxides and organic contaminants on the substrate without impairing a transparent conductive layer.

Abstract translation: 本发明提供了一种用于平板显示装置的清洁剂组合物，包括：聚氨基羧酸; 碱碱 非离子表面活性剂; 和氟化物成分。 用于平板显示装置的清洁剂组合物可以有效地去除衬底上的金属氧化物和有机污染物而不损害透明导电层。

公开(公告)号：US11600670B2

公开(公告)日：2023-03-07

申请号：US17444274

申请日：2021-08-02

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-Hyun Choung ,  Jaeuoon Kim

IPC: H01L27/32 ,  G06F3/044 ,  G06F3/041

Abstract: An input sensor of a display device includes: a sensing electrode on a base insulating layer and overlapping a sensing region; and a signal line electrically connected to the sensing electrode and overlapping the non-sensing region, and including: a first conductive layer on the base insulating layer and having a first reflectance, a first conductivity, and a first thickness; a second conductive layer having a second reflectance lower than the first reflectance, a second conductivity lower than the first conductivity, and a second thickness smaller than the first thickness, wherein the second conductive layer is on and in contact with the first conductive layer; and a third conductive layer between the base insulating layer and the first conductive layer, in contact with each of the base insulating layer and the first conductive layer, wherein the third conductive layer contains a material different from that of the second conductive layer.

公开(公告)号：US09360695B2

公开(公告)日：2016-06-07

申请号：US14046326

申请日：2013-10-04

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-Hyun Choung ,  Wang Woo Lee ,  Bong-Kyun Kim ,  In-Bae Kim ,  Seon-Il Kim ,  Young Min Moon ,  Hong Sick Park ,  Ki Tae Kim

IPC: G02F1/1343 ,  G02F1/1333 ,  G02F1/1337 ,  G02F1/1362 ,  G02F1/1368 ,  H01L27/12

CPC classification number: G02F1/133345 ,  G02F1/133707 ,  G02F1/134363 ,  G02F1/136259 ,  G02F1/1368 ,  G02F2001/134372 ,  G02F2001/136231 ,  G02F2001/136295 ,  G02F2201/124 ,  H01L27/1225

Abstract: A liquid crystal display includes: a substrate; a gate line and a data line disposed on the substrate; a semiconductor layer disposed on the substrate; first and second field generating electrodes disposed on the substrate; and a first protecting layer formed from the same layer as the first field generating electrode and covering at least a portion of the data line.

Abstract translation: 液晶显示器包括：基板; 设置在基板上的栅极线和数据线; 设置在所述基板上的半导体层; 设置在基板上的第一和第二场产生电极; 以及由与第一场产生电极相同的层形成并覆盖数据线的至少一部分的第一保护层。

公开(公告)号：US09347125B2

公开(公告)日：2016-05-24

申请号：US14725849

申请日：2015-05-29

Applicant: Samsung Display Co., Ltd. ,  DONGWOO FINE-CHEM CO., LTD.

Inventor： In-Bae Kim ,  Jong-Hyun Choung ,  Seon-Il Kim ,  Hong-Sick Park ,  Wang Woo Lee ,  Jae-Woo Jeong ,  In Seol Kuk ,  Sang-Tae Kim ,  Young-Chul Park ,  Keyong Bo Shim ,  In-Ho Yu ,  Young-Jin Yoon ,  Suck-Jun Lee ,  Joon-Woo Lee ,  Sang-Hoon Jang ,  Young-Jun Jin

IPC: C23F1/18 ,  C22F1/18 ,  H01L21/28 ,  C23F1/26 ,  H01L27/12 ,  H01L21/3213 ,  C09K13/00 ,  C09K13/04 ,  C09K13/06 ,  C09K13/08 ,  C23F1/14 ,  C23F1/44 ,  H01L21/32 ,  H05K3/06

CPC classification number: C22F1/18 ,  C09K13/00 ,  C09K13/04 ,  C09K13/06 ,  C09K13/08 ,  C23F1/14 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  H01L21/28008 ,  H01L21/32 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1288 ,  H05K3/067

Abstract: A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.

公开(公告)号：US11594561B2

公开(公告)日：2023-02-28

申请号：US17074947

申请日：2020-10-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Hwan Ryu ,  Woo Jin Cho ,  Jong-Hyun Choung ,  Jae Uoon Kim ,  Sun-Jin Song ,  Hyun Duck Cho

IPC: H01L27/12 ,  G03F7/038 ,  H01L21/027 ,  G03F7/00 ,  C23F1/00 ,  C23C16/44

Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.

公开(公告)号：US09127368B2

公开(公告)日：2015-09-08

申请号：US14318815

申请日：2014-06-30

Applicant: SAMSUNG DISPLAY CO., LTD. ,  DONGWOO FINE-CHEM CO., LTD.

Inventor： Seon-il Kim ,  In-Bae Kim ,  Hongsick Park ,  Jong-Hyun Choung ,  Inseol Kuk ,  Suckjun Lee ,  Giyong Nam ,  Youngchul Park ,  Inho Yu ,  Youngjin Yoon

IPC: H01L21/3213 ,  C09K13/06 ,  C09K13/08 ,  C23F1/18

CPC classification number: C23F1/18 ,  C09K13/06 ,  C09K13/08 ,  C23F1/26 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1262

Abstract: An etchant includes, based on a total amount of the etchant, from about 0.5 to about 20 wt % of a persulfate, from about 0.01 to about 2 wt % of a fluorine compound, from about 1 to about 10 wt % of an inorganic acid, from about 0.5 to about 5 wt % of an azole compound, from about 0.1 to about 5 wt % of an electron-donating compound, from about 0.1 to about 5 wt % of a chlorine compound, from about 0.05 to about 3 wt % of a copper salt, from about 0.1 to about 10 wt % of an organic acid or an organic acid salt, and a remaining amount of water.

Abstract translation: 蚀刻剂包括基于蚀刻剂的总量约0.5至约20重量％的过硫酸盐，约0.01至约2重量％的氟化合物，约1至约10重量％的无机酸 ，约0.5至约5重量％的唑化合物，约0.1至约5重量％的给电子化合物，约0.1至约5重量％的氯化合物，约0.05至约3重量％ 的铜盐，约0.1至约10重量％的有机酸或有机酸盐，以及剩余量的水。

公开(公告)号：US20150087148A1

公开(公告)日：2015-03-26

申请号：US14263956

申请日：2014-04-28

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： In-Bae Kim ,  Jong-Hyun Choung ,  Youngmin Moon ,  Hongsick Park ,  Gyu-po Kim ,  Won-guk Seo ,  Hyun-cheol Shin ,  Ki-beom Lee ,  Sam-young Cho ,  Seung-yeon Han

IPC: H01L21/306 ,  C23F1/18

CPC classification number: H01L21/30604 ,  C23F1/18 ,  H01L21/32134 ,  H01L27/124 ,  H01L29/45

Abstract: An etchant composition including 0.5 wt % to 20 wt % of a persulfate, 0.01 wt % to 1 wt % of a fluorine compound, 1 wt % to 10 wt % of an inorganic acid, 0.01 wt % to 2 wt % of an azole-based compound, 0.1 wt % to 5 wt % of a chlorine compound, 0.05 wt % to 3 wt % of a copper salt, 0.01 wt % to 5 wt % of an antioxidant or a salt thereof, based on a total weight of the etchant composition, and water in an amount sufficient for the total weight of the etchant composition to be equal to 100 wt % is disclosed. The etchant composition is suitable for use in forming a metal wiring by etching a metal layer including copper or in fabricating a thin film transistor substrate for a display apparatus.

Abstract translation: 包含0.5重量％至20重量％的过硫酸盐，0.01重量％至1重量％的氟化合物，1重量％至10重量％的无机酸，0.01重量％至2重量％的唑类， 0.1重量％至5重量％的氯化合物，0.05重量％至3重量％的铜盐，0.01重量％至5重量％的抗氧化剂或其盐，基于蚀刻剂的总重量 组合物和水的量足以使蚀刻剂组合物的总重量等于100重量％。 蚀刻剂组合物适用于通过蚀刻包括铜的金属层或制造用于显示装置的薄膜晶体管基板来形成金属布线。

公开(公告)号：US20150004758A1

公开(公告)日：2015-01-01

申请号：US14100124

申请日：2013-12-09

Applicant: DONGWOO FINE-CHEM Co., Ltd. ,  Samsung Display Co., Ltd.

Inventor： Jong-Hyun Choung ,  In-Bae Kim ,  Jae-Woo Jeong ,  Hong-Sick Park ,  In-Seol Kuk ,  Gi-Yong Nam ,  Young-Chul Park ,  In-Ho Yu ,  Young-Jin Yoon ,  Suck-Jun Lee

IPC: H01L21/306 ,  H01L29/66 ,  C09K13/08

CPC classification number: H01L29/66742 ,  C09K13/08 ,  C23F1/02 ,  C23F1/18 ,  C23F1/26 ,  H01L21/32134 ,  H01L27/3276 ,  H01L29/458 ,  H01L29/4908

Abstract: An etchant composition includes about 0.5 weight % to about 20 weight % of persulfate, about 0.01 weight % to about 2 weight % of a fluoride compound, about 1 weight % to about 10 weight % of an inorganic acid, about 0.5 weight % to about 5 weight % of a cyclic amine compound, about 0.1 weight % to about 10.0 weight % of a compound having an amino group and a sulfonic acid, about 0.1 weight % to about 15.0 weight % of an organic acid or a salt thereof, and water to 100 weight % of the etchant composition.

Abstract translation: 蚀刻剂组合物包括约0.5重量％至约20重量％的过硫酸盐，约0.01重量％至约2重量％的氟化物，约1重量％至约10重量％的无机酸，约0.5重量％至约 5重量％的环胺化合物，约0.1重量％至约10.0重量％的具有氨基和磺酸的化合物，约0.1重量％至约15.0重量％的有机酸或其盐，和水 至100重量％的蚀刻剂组成。