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公开(公告)号：US08889032B2
公开(公告)日：2014-11-18
申请号：US13728463
申请日：2012-12-27
Applicant: Samsung Display Co., Ltd.
Inventor： Jong-Hyun Choung , In-Bae Kim , Seon-II Kim , Hong Sick Park , Jae Woo Jeong , Gyu-Po Kim , Won-Guk Seo , Hyun-Cheol Shin , Ki-Beom Lee , Sam-Young Cho , Seung-Yeon Han
CPC classification number: C23F1/18 , C23F1/26 , H01L21/4814
Abstract: A metal wire etchant including persulfate, a sulfonate, a fluorine compound, an azole-based compound, an organic acid, a nitrate, and a chlorine compound, and a method of making the same.
Abstract translation: 包括过硫酸盐，磺酸盐，氟化合物，唑类化合物，有机酸，硝酸盐和氯化合物的金属线蚀刻剂及其制备方法。
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公开(公告)号：US11730033B2
公开(公告)日：2023-08-15
申请号：US17331527
申请日：2021-05-26
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Gyung Min Baek , Hyun Eok Shin , Ju Hyun Lee , Hong Sick Park
IPC: H10K59/131 , H10K59/126 , H10K59/38 , H10K71/00 , H10K59/12 , H10K59/123
CPC classification number: H10K59/1315 , H10K59/126 , H10K59/38 , H10K71/00 , H10K59/1201
Abstract: A display device includes: a substrate; a data line on the substrate; a first insulating layer on the data line; a first transistor on the first insulating layer; a second insulating layer on the first transistor; a pixel electrode on the second insulating layer, the pixel electrode being electrically connected to the first transistor; and an auxiliary data pattern on the second insulating layer as a same layer as the pixel electrode, the auxiliary data pattern being electrically connected to the data line.
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公开(公告)号：US11099441B2
公开(公告)日：2021-08-24
申请号：US16460829
申请日：2019-07-02
Applicant: Samsung Display Co., Ltd.
Inventor： Chan Woo Yang , Hong Sick Park , Hyun Eok Shin , Joon Yong Park , Gyung Min Baek , Sang Won Shin , Ju Hyun Lee
IPC: H01L29/49 , G02F1/1362 , H01L27/12 , G02F1/1335 , H01L21/285 , G02F1/1368 , H01L21/3213
Abstract: A wire substrate, a display device including a wire substrate, and a method of fabricating a wire substrate are disclosed. The display device comprises: a first base; and a first wiring layer disposed on the first base and comprising a conductive layer and a metal oxide layer stacked on the conductive layer, wherein the metal oxide layer comprises molybdenum (Mo), tantalum (Ta), and oxygen (O). The conductive layer includes a first metal layer on the first base, and a second metal layer between the first metal layer and the metal oxide layer. The second metal layer has a higher electrical conductivity than the first metal layer, and a thickness of the second metal layer is greater than a thickness of the first metal layer.
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公开(公告)号：US10040741B2
公开(公告)日：2018-08-07
申请号：US14865493
申请日：2015-09-25
Applicant: Samsung Display Co. Ltd. , ENF TECHNOLOGY CO., LTD.
Inventor： Jae Woo Jeong , Hong Sick Park , Bong Kyun Kim , Seung Ho Yoon , Sang Dai Lee , Young Jin Park , Hyo Won Park , Sang Moon Yun
Abstract: Provided is a method for manufacturing a glycol based compound. The method comprises agitating a mixture of a first glycol based compound, a hydrazide based compound, and a sulfonic acid based compound, and performing fractional distillation of resultant materials of the agitating to recover a second glycol based compound having a formaldehyde content of 0 ppm.
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5.发明授权公开(公告)号：US11557614B2
公开(公告)日：2023-01-17
申请号：US17003524
申请日：2020-08-26
Applicant: Samsung Display Co., LTD.
Inventor： Jae Uoon Kim , Hong Sick Park , Jong Hyun Choung
IPC: H01L27/12 , H01L27/32 , H01L21/4763
Abstract: A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190324337A1
公开(公告)日：2019-10-24
申请号：US16460829
申请日：2019-07-02
Applicant: Samsung Display Co., Ltd.
Inventor： Chan Woo Yang , Hong Sick Park , Hyun Eok Shin , Joon Yong Park , Gyung Min Baek , Sang Won Shin , Ju Hyun Lee
IPC: G02F1/1362 , H01L21/3213 , H01L29/49 , G02F1/1368 , G02F1/1335 , H01L27/12 , H01L21/285
Abstract: A wire substrate, a display device including a wire substrate, and a method of fabricating a wire substrate are disclosed. The display device comprises: a first base; and a first wiring layer disposed on the first base and comprising a conductive metal layer and a metal oxide layer stacked on one another, wherein the metal oxide layer comprises MoxTayOz, wherein a content of tantalum is equal to or less than 2.0 at % (atomic percent) based on a total number of metal atoms.
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公开(公告)号：US10275105B2
公开(公告)日：2019-04-30
申请号：US15905170
申请日：2018-02-26
Applicant: Samsung Display Co., Ltd.
Inventor： Hong Sick Park
IPC: G06F3/044
Abstract: A touch panel includes: a substrate which has sensing and peripheral areas; first sensing electrodes located on a surface of the substrate and arranged along a first direction in the sensing area and second sensing electrodes arranged along a second direction intersecting the first direction; a first connector located on the surface of the substrate and connecting the first sensing electrodes along the first direction; an insulating layer pattern located on the first connector; a second connector located on the insulating layer pattern, intersecting the first connector to be insulated from the first connector, and connecting the second sensing electrodes along the second direction; wiring lines located on the surface of the substrate, located in the peripheral area, and electrically connected to the first sensing electrodes or the second sensing electrodes; and a conductive pattern located between each of the second sensing electrodes and the second connector.
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公开(公告)号：US09482917B2
公开(公告)日：2016-11-01
申请号：US14982317
申请日：2015-12-29
Applicant: Samsung Display Co., Ltd.
Inventor： Hong Sick Park , Seon-Il Kim , Min Ho Moon , Hyang-Shik Kong , Yeun Tae Kim , Chang Oh Jeong
IPC: G02F1/1345 , G02F1/1333 , G02F1/1341 , G02F1/1362 , G02F1/1368
CPC classification number: G02F1/13458 , G02F1/133305 , G02F1/133377 , G02F1/1341 , G02F1/136286 , G02F1/1368
Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.
Abstract translation: 本发明涉及一种显示装置及其制造方法，其中在制造过程中产生的腐败层被去除，并且根据本发明的示例性实施例的显示装置的制造方法包括：形成薄膜晶体管 在包括多个像素区域的基板上; 在所述像素区域中形成连接到所述薄膜晶体管的像素电极; 在像素电极上形成牺牲层; 在牺牲层上形成阻挡层; 在阻挡层上形成公共电极; 在公共电极上形成屋顶层; 图案化阻挡层，公共电极和屋顶层，以暴露部分牺牲层，从而形成注入孔; 去除所述牺牲层以形成用于多个像素区域的微腔; 去除阻挡层。
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9.发明授权公开(公告)号：US12041830B2
公开(公告)日：2024-07-16
申请号：US18084274
申请日：2022-12-19
Applicant: Samsung Display Co., LTD.
Inventor： Jae Uoon Kim , Hong Sick Park , Jong Hyun Choung
IPC: H10K59/131 , H01L27/12 , H10K59/123 , H01L21/4763 , H10K59/38
CPC classification number: H10K59/131 , H01L27/124 , H01L27/1259 , H10K59/123 , H01L21/47635 , H01L27/1225 , H10K59/38
Abstract: A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.
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10.发明授权公开(公告)号：US10386687B2
公开(公告)日：2019-08-20
申请号：US15906991
申请日：2018-02-27
Applicant: Samsung Display Co., Ltd.
Inventor： Chan Woo Yang , Hong Sick Park , Hyun Eok Shin , Joon Yong Park , Gyung Min Baek , Sang Won Shin , Ju Hyun Lee
IPC: H01L27/12 , H01L29/49 , G02F1/1335 , G02F1/1362 , G02F1/1368 , H01L21/285 , H01L21/3213
Abstract: A wire substrate, a display device including a wire substrate, and a method of fabricating a wire substrate are disclosed. The display device comprises: a first base; and a first wiring layer disposed on the first base and comprising a conductive metal layer and a metal oxide layer stacked on one another, wherein the metal oxide layer comprises MoxTayOz, wherein a content of tantalum is equal to or less than 2.0 at % (atomic percent) based on a total number of metal atoms.
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