Organic light emitting diode display device and manufacturing method thereof

    公开(公告)号:US11133370B2

    公开(公告)日:2021-09-28

    申请号:US16742449

    申请日:2020-01-14

    Abstract: An organic light emitting diode display includes a substrate including a display area and a pad area, a first thin film transistor disposed on the display area, an organic light emitting diode connected to the first thin film transistor, a pad electrode disposed on the pad area and a pad contact electrode disposed on an upper portion of the pad electrode and electrically connected to the pad electrode. The organic light emitting diode includes an anode, an organic emission layer, and a cathode. The anode includes a lower layer, an intermediate layer, and an upper layer. The pad contact electrode is formed of a material of the lower layer of the anode.

    Precursor composition of oxide semiconductor and thin film transistor substrate including oxide semiconductor
    8.
    发明授权
    Precursor composition of oxide semiconductor and thin film transistor substrate including oxide semiconductor 有权
    包含氧化物半导体的氧化物半导体和薄膜晶体管衬底的前体组成

    公开(公告)号:US09082795B2

    公开(公告)日:2015-07-14

    申请号:US14477587

    申请日:2014-09-04

    Abstract: A thin film transistor substrate according to an exemplary embodiment of the present invention includes a semiconductor layer including metal disposed on an insulating substrate, a gate electrode overlapping the semiconductor layer, and a source electrode and a drain electrode overlapping the semiconductor layer, wherein the metal in the semiconductor layer comprises indium (In), zinc (Zn), and tin (Sn), and a molar ratio ( R , R ⁡ [ mol ⁢ ⁢ % ] = [ In ] [ In + Zn + Sn ] × 100 ) of indium (In) to the metals in the semiconductor layer is less than about 20%, and more specifically, the molar ratio ( R , R ⁡ [ mol ⁢ ⁢ % ] = [ In ] [ In + Zn + Sn ] × 100 ) of indium (In) of the metals in the semiconductor layer is about 5% to about 13%.

    Abstract translation: 根据本发明的示例性实施例的薄膜晶体管基板包括:半导体层,包括设置在绝缘基板上的金属,与半导体层重叠的栅极电极以及与半导体层重叠的源电极和漏电极,其中金属 在半导体层中包含铟(In),锌(Zn)和锡(Sn),摩尔比(R,R⁡[mol⁢%] = [In] [In + Zn + Sn]×100) 对于半导体层中的金属,铟(In)的含量小于约20%,更具体地说,摩尔比(R,R⁡[mol·⁢%] = [In] [In + Zn + Sn]×100 )的半导体层中的金属的In(In)为约5%至约13%。

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