公开(公告)号：US09490275B2

公开(公告)日：2016-11-08

申请号：US14740484

申请日：2015-06-16

Applicant: Samsung Display Co., Ltd.

Inventor： Young Min Moon ,  Jong-Hyun Choung ,  Bong-Kyun Kim

IPC: H01L27/00 ,  H01L29/00 ,  H01L27/12 ,  H01L29/51 ,  H01L29/49 ,  H01L29/78 ,  H01L29/423

CPC classification number: H01L29/42356 ,  H01L29/42384 ,  H01L29/4908 ,  H01L29/7869

Abstract: A thin film transistor array panel includes: a gate line on a substrate and including a gate electrode; a first gate insulating layer on the substrate and the gate line, the first gate insulting layer including a first portion adjacent to the gate line and a second portion overlapping the gate line and having a smaller thickness than that of the first portion; a second gate insulating layer on the first gate insulating layer; a semiconductor layer on the second gate insulating layer; a source electrode and a drain electrode spaced apart from each other on the semiconductor layer; a passivation layer on the second gate insulating layer, the source electrode and the drain electrode; and a pixel electrode on the passivation layer and connected with the drain electrode. The first gate insulating layer and the second gate insulating layer have stress in opposite directions from each other.

Abstract translation: 薄膜晶体管阵列面板包括：基板上的栅极线，并包括栅电极; 所述第一栅极绝缘层在所述基板和所述栅极线上，所述第一栅极绝缘层包括与所述栅极线相邻的第一部分和与所述栅极线重叠并且具有比所述第一部分的厚度小的第二部分; 第一栅极绝缘层上的第二栅极绝缘层; 在所述第二栅极绝缘层上的半导体层; 在半导体层上彼此隔开的源电极和漏电极; 第二栅极绝缘层上的钝化层，源电极和漏电极; 以及钝化层上的像素电极并与漏电极连接。 第一栅极绝缘层和第二栅极绝缘层在彼此相反的方向上具有应力。

公开(公告)号：US09360695B2

公开(公告)日：2016-06-07

申请号：US14046326

申请日：2013-10-04

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-Hyun Choung ,  Wang Woo Lee ,  Bong-Kyun Kim ,  In-Bae Kim ,  Seon-Il Kim ,  Young Min Moon ,  Hong Sick Park ,  Ki Tae Kim

IPC: G02F1/1343 ,  G02F1/1333 ,  G02F1/1337 ,  G02F1/1362 ,  G02F1/1368 ,  H01L27/12

CPC classification number: G02F1/133345 ,  G02F1/133707 ,  G02F1/134363 ,  G02F1/136259 ,  G02F1/1368 ,  G02F2001/134372 ,  G02F2001/136231 ,  G02F2001/136295 ,  G02F2201/124 ,  H01L27/1225

Abstract: A liquid crystal display includes: a substrate; a gate line and a data line disposed on the substrate; a semiconductor layer disposed on the substrate; first and second field generating electrodes disposed on the substrate; and a first protecting layer formed from the same layer as the first field generating electrode and covering at least a portion of the data line.

Abstract translation: 液晶显示器包括：基板; 设置在基板上的栅极线和数据线; 设置在所述基板上的半导体层; 设置在基板上的第一和第二场产生电极; 以及由与第一场产生电极相同的层形成并覆盖数据线的至少一部分的第一保护层。

公开(公告)号：US20150214072A1

公开(公告)日：2015-07-30

申请号：US14679787

申请日：2015-04-06

Applicant: SAMSUNG DISPLAY CO., LTD. ,  DONGJIN SEMICHEM CO., LTD.

Inventor： BONG-KYUN KIM ,  Hong Sick Park ,  Wang Woo Lee ,  Young Min Moon ,  Seung Ho Yoon ,  Young Joo Choi ,  Sang-Woo Kim ,  Ki-Beom Lee ,  Dae-Woo Lee ,  Sam-Young Cho

IPC: H01L21/465 ,  C09K13/06 ,  C09K13/00 ,  C23F1/30

CPC classification number: H01L21/465 ,  C09K13/00 ,  C09K13/06 ,  C23F1/30 ,  H01L21/32134 ,  H01L29/66969 ,  H01L29/7869

Abstract: An etchant composition includes ammonium persulfate (((NH4)2)S2O8), an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, a phosphate-containing compound, a chloride-containing compound, and residual water.

Abstract translation: 蚀刻剂组合物包括过硫酸铵（（（NH4）2）S2O8），唑类化合物，水溶性胺化合物，含磺酸化合物，含硝酸盐化合物，含磷酸盐化合物，氯化物 含有化合物和残留水。

公开(公告)号：US20150147836A1

公开(公告)日：2015-05-28

申请号：US14332215

申请日：2014-07-15

Applicant: Samsung Display Co., Ltd. ,  ENF Technology Co., Ltd

Inventor： In-Bae Kim ,  Jong-Hyun Choung ,  Young Min Moon ,  Hong Sick Park ,  Hyeon Jeong Sang ,  Jae Woo Jeong ,  Min Hee Kim ,  Young Jin Park ,  Sang-Moon Yun ,  Sang Dai Lee ,  Hyun Cheol Jeong

IPC: H01L21/02 ,  H01L27/15

CPC classification number: H01L27/153 ,  C03C23/0075 ,  C11D1/66 ,  C11D3/044 ,  C11D3/046 ,  C11D3/30 ,  C11D3/33 ,  C11D11/0041 ,  H01L21/02052 ,  H01L27/1262

Abstract: The disclosure provides a cleaning agent composition for a flat panel display device, including: polyaminocarboxylic acid; alkali base; a nonionic surfactant; and a fluoride component. The cleaning agent composition for the flat panel display device can effectively remove metal oxides and organic contaminants on the substrate without impairing a transparent conductive layer.

Abstract translation: 本发明提供了一种用于平板显示装置的清洁剂组合物，包括：聚氨基羧酸; 碱碱 非离子表面活性剂; 和氟化物成分。 用于平板显示装置的清洁剂组合物可以有效地去除衬底上的金属氧化物和有机污染物而不损害透明导电层。

公开(公告)号：US09023735B2

公开(公告)日：2015-05-05

申请号：US13728348

申请日：2012-12-27

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Kyun Kim ,  Hong Sick Park ,  Wang Woo Lee ,  Young Min Moon ,  Seung Ho Yoon ,  Young Joo Choi ,  Sang-Woo Kim ,  Ki-Beom Lee ,  Dae-Woo Lee ,  Sam-Young Cho

IPC: H01L21/461 ,  H01L21/465 ,  H01L29/66 ,  H01L21/3213 ,  H01L29/786

CPC classification number: H01L21/465 ,  C09K13/00 ,  C09K13/06 ,  C23F1/30 ,  H01L21/32134 ,  H01L29/66969 ,  H01L29/7869

Abstract: An etchant composition includes ammonium persulfate (((NH4)2)S2O8), an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, a phosphate-containing compound, a chloride-containing compound, and residual water.

Abstract translation: 蚀刻剂组合物包括过硫酸铵（（（NH4）2）S2O8），唑类化合物，水溶性胺化合物，含磺酸化合物，含硝酸盐化合物，含磷酸盐化合物，氯化物 含有化合物和残留水。

公开(公告)号：US20140038348A1

公开(公告)日：2014-02-06

申请号：US13728348

申请日：2012-12-27

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Bong-Kyun Kim ,  Hong Sick Park ,  Wang Woo Lee ,  Young Min Moon ,  Seung Ho Yoon ,  Young Joo Choi ,  Sang-Woo Kim ,  Ki-Beom Lee ,  Dae-Woo Lee ,  Sam-Young Cho

IPC: H01L21/465 ,  H01L29/66

CPC classification number: H01L21/465 ,  C09K13/00 ,  C09K13/06 ,  C23F1/30 ,  H01L21/32134 ,  H01L29/66969 ,  H01L29/7869

Abstract: An etchant composition includes ammonium persulfate (((NH4)2)S2O8), an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, a phosphate-containing compound, a chloride-containing compound, and residual water.

Abstract translation: 蚀刻剂组合物包括过硫酸铵（（（NH4）2）S2O8），唑类化合物，水溶性胺化合物，含磺酸化合物，含硝酸盐化合物，含磷酸盐化合物，氯化物 含有化合物和残留水。