Semiconductor device having filler with thermal conductive particles
    2.
    发明授权
    Semiconductor device having filler with thermal conductive particles 有权
    具有带有导热颗粒的填料的半导体器件

    公开(公告)号:US07554192B2

    公开(公告)日:2009-06-30

    申请号:US11553235

    申请日:2006-10-26

    IPC分类号: H01L23/34

    摘要: A semiconductor device that includes an insulating substrate having an upper conductor formed on an upper surface thereof and a lower conductor formed on a lower surface of the insulating substrate. The device also includes a semiconductor element mounted on the upper surface of the insulating substrate with an under-element solder therebetween. The device further includes a heat sink whereon the insulating substrate is mounted with an under-substrate solder therebetween. The device additionally includes a silicone gel covering the semiconductor element, the under-element solder, and the upper conductor. In addition, the device includes a filler covering the lower conductor and the under-substrate solder, without covering the semiconductor element, the under-element solder, and the upper conductor, and having a thermal conductivity larger than a thermal conductivity of air and a fluidity higher than a fluidity of the silicone gel.

    摘要翻译: 一种半导体器件,包括在其上表面上形成有上导体的绝缘基板和形成在所述绝缘基板的下表面上的下导体。 该装置还包括半导体元件,其安装在绝缘基板的上表面上,其间具有下部元件焊料。 该装置还包括散热器,绝缘基板上安装有底板下焊料。 该装置还包括覆盖半导体元件,下部元件焊料和上导体的硅凝胶。 此外,该器件包括覆盖下导体和底基底焊料的填充物,而不覆盖半导体元件,下元件焊料和上导体,并且具有大于空气的热导率的热导率和 流动性高于硅胶的流动性。

    Semiconductor device having a resistance for equalizing the current distribution
    3.
    发明授权
    Semiconductor device having a resistance for equalizing the current distribution 失效
    具有用于均衡电流分布的电阻的半导体器件

    公开(公告)号:US07405448B2

    公开(公告)日:2008-07-29

    申请号:US11538232

    申请日:2006-10-03

    IPC分类号: H01L23/62 H01L21/00 H05K7/20

    摘要: A first insulating substrate is formed on a heat sink, and a semiconductor element is formed thereon. An insulating resin casing is formed so as to cover the first insulating substrate and the semiconductor element. A second insulating substrate is mounted inside the insulating resin casing apart from the first insulating substrate. On the second insulating substrate, a resistance element that functions as a gate balance resistance is fixed by soldering. The second insulating substrate on which the resistance element was thus mounted was made apart from the first insulating substrate on which the semiconductor element was mounted, and was mounted on the side of the insulating resin casing.

    摘要翻译: 在散热器上形成第一绝缘基板,在其上形成半导体元件。 形成绝缘树脂外壳以覆盖第一绝缘基板和半导体元件。 第二绝缘基板安装在绝缘树脂外壳的内部,与第一绝缘基板隔开。 在第二绝缘基板上,通过焊接固定用作栅极平衡电阻的电阻元件。 将安装有电阻元件的第二绝缘基板与安装有半导体元件的第一绝缘基板分开,并且安装在绝缘树脂外壳的一侧。

    Semiconductor device
    4.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US06700073B2

    公开(公告)日:2004-03-02

    申请号:US09970029

    申请日:2001-10-04

    IPC分类号: H05K100

    摘要: A silicone resin for sealing a semiconductor chip. A cured silicone resin, which is obtained by curing the silicone resin at a given temperature, has a percent elongation, after fracture, measured at a room temperature, not less than 4% of a penetration number at room temperature. A semiconductor device sealed with the silicone resin, when subjected to a heat cycle or a vibration test, provides resistance to cracking, forming of voids, and interfacial peeling-off. The cured silicone resin may have a penetration number not less than 10 and not more than 80 and a loss elasticity not less than 17% of the storage elasticity. A resin member made of the cured silicone resin and sealing a semiconductor chip may include a filler, such as silica or alumina, having a coefficient of linear thermal expansion lower than that of the cured silicone resin.

    摘要翻译: 用于密封半导体芯片的硅树脂。 通过在给定温度下固化硅树脂获得的固化的有机硅树脂在断裂后具有百分比的伸长率,在室温下测量不小于室温下穿透数的4%。 用硅酮树脂密封的半导体器件,当进行热循环或振动试验时,提供耐开裂,空隙形成和界面剥离的能力。 固化的有机硅树脂的渗透数可以不小于10且不大于80,并且具有不小于储存弹性的17%的损失弹性。 由固化的硅树脂制成并密封半导体芯片的树脂构件可以包括具有比固化的有机硅树脂低的线性热膨胀系数的填料,例如二氧化硅或氧化铝。

    High current ion implanter and method of ion implant by the implanter
    9.
    发明授权
    High current ion implanter and method of ion implant by the implanter 失效
    高电流离子注入机和注入机离子注入的方法

    公开(公告)号:US5864143A

    公开(公告)日:1999-01-26

    申请号:US787017

    申请日:1997-01-29

    CPC分类号: H01J37/3171 H01J2237/0044

    摘要: An ion implantation apparatus and process for ion implantation which eliminates the deterioration of device characteristics in the ion implantation process to a trench capacitor of a DRAM and increases the beam current without deteriorating the device characteristics.A high current ion implanter includes an implantation chamber, and arranged in the following order: a bias plate, a secondary electron implantation cylinder and an extension cylinder. The extension cylinder is adjacent to the implantation chamber, held to ground potential, and has a length of 10 to 25 cm..

    摘要翻译: 一种用于离子注入的离子注入装置和方法,其消除了离子注入工艺中的器件特性对DRAM的沟槽电容器的劣化,并增加了束流,而不劣化器件特性。 高电流离子注入机包括注入室,并按以下顺序排列:偏置板,二次电子注入圆筒和延伸圆柱体。 延伸圆筒与植入室相邻,保持接地电位,长度为10至25厘米。