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    System and Method for Cleaning Optical Surfaces of an Extreme Ultraviolet Optical System
    3.
    发明申请
    System and Method for Cleaning Optical Surfaces of an Extreme Ultraviolet Optical System 审中-公开
    用于清洁极紫外光学系统的光学表面的系统和方法

    公开(公告)号：US20140261568A1

    公开(公告)日：2014-09-18

    申请号：US13857615

    申请日：2013-04-05

    Applicant: KLA- Tencor Corporation

    Inventor： Gildardo Delgado ,  Francis Chilese ,  Rudy F. Garcia ,  Mohammed Tahmassebpur ,  Salam Harb

    IPC: B08B7/00 ,  B08B5/00

    CPC classification number: B08B5/02 ,  G02B17/0892 ,  G02B19/0095 ,  G02B27/0006 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/70925 ,  G03F7/70933

    Abstract: The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.

    Abstract translation: 本发明提供了在真空处理室中保持的极紫外（EUV）光学组件的光学表面附近的局部清洁微环境，并且被配置用于EUV光刻，计量或检查。 该系统包括一个或多个EUV光学组件，其包括具有光学表面的至少一个光学元件，从一个或多个光学组件远程存储的清洁气体的供应和气体输送单元，其包括：增压室，一个或多个气体输送 将气体供应连接到增压室的管线，被配置为将清洁气体从充气室引导到EUV组件的一部分的一个或多个输送喷嘴，以及用于从EUV光学组件和真空中去除气体的一个或多个收集喷嘴 处理室。

    Electron source architecture for a scanning electron microscopy system
    4.
    发明授权
    Electron source architecture for a scanning electron microscopy system 有权

    公开(公告)号：US10388489B2

    公开(公告)日：2019-08-20

    申请号：US15887861

    申请日：2018-02-02

    Applicant: KLA-Tencor Corporation

    Inventor： Mohammed Tahmassebpur

    IPC: H01J37/06 ,  H01J37/063 ,  H01J37/065 ,  H01J37/244 ,  H01J37/28 ,  H01J37/147 ,  H01J37/09 ,  H01J37/073 ,  H01J37/317 ,  H01J37/067 ,  H01J37/26 ,  H01J37/30

    Abstract: A scanning electron microscopy (SEM) system includes a plurality of electron-optical columns and a plurality of electron beam sources. The electron beam sources include an emitter including one or more emitter tips configured to generate one or more electron beams of a plurality of electron beams. The electron beam sources include a stack of one or more positioners configured to adjust a position of the emitter based on one or more measurements of the electron beam generated by the emitter. The emitter is configured to scan the one or more electron beams across an area surrounding a bore of an electron-optical column of the plurality of electron-optical columns. The electron beam source array includes a carrier plate and a source tower. The source tower is configured to adjust a position of the plurality of electron beam sources relative to a position of the plurality of electron-optical columns.

    METHOD AND SYSTEM FOR GAS FLOW MITIGATION OF MOLECULAR CONTAMINATION OF OPTICS
    6.
    发明申请
    METHOD AND SYSTEM FOR GAS FLOW MITIGATION OF MOLECULAR CONTAMINATION OF OPTICS 有权
    气体分解光化学分散污染的方法和系统

    公开(公告)号：US20140362366A1

    公开(公告)日：2014-12-11

    申请号：US14466516

    申请日：2014-08-22

    Applicant: KLA-Tencor Corporation

    Inventor： Gildardo Delgado ,  Terry Johnson ,  Marco Arienti ,  Salam Harb ,  Lennie Klebanoff ,  Rudy Garcia ,  Mohammed Tahmassebpur ,  Sarah Scott

    IPC: G01N21/15 ,  G01N21/95 ,  G03F7/20

    CPC classification number: G01N21/15 ,  G01N21/9501 ,  G01N2021/151 ,  G03F7/705 ,  G03F7/70933

    Abstract: A computer-implemented method for determining an optimized purge gas flow in a semi-conductor inspection metrology or lithography apparatus, comprising receiving a permissible contaminant mole fraction, a contaminant outgassing flow rate associated with a contaminant, a contaminant mass diffusivity, an outgassing surface length, a pressure, a temperature, a channel height, and a molecular weight of a purge gas, calculating a flow factor based on the permissible contaminant mole fraction, the contaminant outgassing flow rate, the channel height, and the outgassing surface length, comparing the flow factor to a predefined maximum flow factor value, calculating a minimum purge gas velocity and a purge gas mass flow rate from the flow factor, the contaminant mass diffusivity, the pressure, the temperature, and the molecular weight of the purge gas, and introducing the purge gas into the semi-conductor inspection metrology or lithography apparatus with the minimum purge gas velocity and the purge gas flow rate.

    Abstract translation: 一种用于确定半导体检测计量或光刻设备中的优化的吹扫气体流的计算机实现的方法，包括接收允许的污染物摩尔分数，与污染物相关的污染物除气流量，污染物质量扩散率，脱气表面长度 ，压力，温度，通道高度和吹扫气体的分子量，基于允许的污染物摩尔分数，污染物除气流量，通道高度和排气表面长度计算流量因子，比较 流量因子到预定的最大流量因子值，从流动因子，污染物质量扩散性，压力，温度和吹扫气体的分子量计算最小净化气体速度和吹扫气质量流率，并引入 吹扫气体进入具有最小清洗气体速度的半导体检测计量或光刻设备 净化气体流量。

    APPARATUS AND METHOD FOR SHIELDING A CONTROLLED PRESSURE ENVIRONMENT
    10.
    发明申请
    APPARATUS AND METHOD FOR SHIELDING A CONTROLLED PRESSURE ENVIRONMENT 有权
    用于屏蔽受控压力环境的装置和方法

    公开(公告)号：US20140072452A1

    公开(公告)日：2014-03-13

    申请号：US14023169

    申请日：2013-09-10

    Applicant: KLA-Tencor Corporation

    Inventor： Mohammed Tahmassebpur ,  Salam Harb

    IPC: F04D19/04

    CPC classification number: F04D19/042 ,  F04D19/046 ,  F04D27/0253 ,  F04D29/5853 ,  F04D29/601 ,  H01J37/18 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32513

    Abstract: An apparatus for shielding a controlled pressure environment, including a shield assembly with: a gate disc arranged for location in a chamber and including a first continuous surface facing an opening in the chamber and including an outer circumference extending past the opening in a radial direction orthogonal to a longitudinal axis passing through the chamber and the opening; and an at least one actuator arranged to displace the gate disc in an axial direction parallel to the longitudinal axis. The opening is arranged for connection to an inlet of a vacuum pump. In an example embodiment, the thermal system attains and maintains thermal equilibrium in the chamber and/or to shields the chamber from unwanted thermal affects by heating or cooling the gate disc to offset cooling or heat generated by the vacuum pump. For example, the gate disc is cooled to offset heat generated by a turbo-molecular pump.

    Abstract translation: 一种用于屏蔽受控压力环境的装置，包括屏蔽组件，其具有：栅极盘，其布置成位于腔室中并且包括面对腔室中的开口的第一连续表面，并且包括沿径向正交延伸穿过开口的外圆周 穿过所述腔室和所述开口的纵向轴线; 以及至少一个致动器，其布置成在平行于纵向轴线的轴向方向上移动所述门盘。 开口布置成连接到真空泵的入口。 在一个示例性实施例中，热系统通过加热或冷却门盘来抵消室内的热平衡和/或屏蔽室不受不希望的热影响，以抵消由真空泵产生的冷却或热量。 例如，门盘被冷却以抵消由涡轮分子泵产生的热量。

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