公开(公告)号：US08963110B2

公开(公告)日：2015-02-24

申请号：US14309393

申请日：2014-06-19

Applicant: KLA-Tencor Corporation

Inventor： Layton Hale ,  Francis Chilese ,  Qiang Q. Zhang

IPC: H01J35/20 ,  H05G2/00 ,  G01N21/95 ,  G03F7/20

CPC classification number: H05G2/008 ,  G01N21/95 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70033

Abstract: The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.

Abstract translation: EUV灯的产生包括使至少部分地涂覆有等离子体形成目标材料的圆筒旋转，将脉冲照明引导到在第一方向上穿过旋转圆柱体的材料涂覆部分的第一组螺旋排列的点，并且引导脉冲 照射到在第二方向上穿过旋转圆筒的材料涂覆部分的第二组螺旋排列的点，脉冲照明适合于激发等离子体形成目标材料。

公开(公告)号：US10953441B2

公开(公告)日：2021-03-23

申请号：US13857615

申请日：2013-04-05

Applicant: KLA-Tencor Corporation

Inventor： Gildardo Delgado ,  Francis Chilese ,  Rudy F. Garcia ,  Mohammed Tahmassebpur ,  Salam Harb

IPC: G03F7/00 ,  B08B5/00 ,  B08B7/00 ,  B08B5/02 ,  G03F7/20 ,  G03F1/84

Abstract: The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.

公开(公告)号：US20140374611A1

公开(公告)日：2014-12-25

申请号：US14309393

申请日：2014-06-19

Applicant: KLA-Tencor Corporation

Inventor： Layton Hale ,  Francis Chilese ,  Qiang Q. Zhang

IPC: H05G2/00 ,  G03F7/20 ,  G01N21/95

CPC classification number: H05G2/008 ,  G01N21/95 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70033

Abstract: The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.

Abstract translation: EUV灯的产生包括使至少部分地涂覆有等离子体形成目标材料的圆筒旋转，将脉冲照明引导到在第一方向上穿过旋转圆柱体的材料涂覆部分的第一组螺旋排列的点，并且引导脉冲 照射到在第二方向上穿过旋转圆筒的材料涂覆部分的第二组螺旋排列的点，脉冲照明适合于激发等离子体形成目标材料。

公开(公告)号：US20140261568A1

公开(公告)日：2014-09-18

申请号：US13857615

申请日：2013-04-05

Applicant: KLA- Tencor Corporation

Inventor： Gildardo Delgado ,  Francis Chilese ,  Rudy F. Garcia ,  Mohammed Tahmassebpur ,  Salam Harb

IPC: B08B7/00 ,  B08B5/00

CPC classification number: B08B5/02 ,  G02B17/0892 ,  G02B19/0095 ,  G02B27/0006 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/70925 ,  G03F7/70933

Abstract: The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.

Abstract translation: 本发明提供了在真空处理室中保持的极紫外（EUV）光学组件的光学表面附近的局部清洁微环境，并且被配置用于EUV光刻，计量或检查。 该系统包括一个或多个EUV光学组件，其包括具有光学表面的至少一个光学元件，从一个或多个光学组件远程存储的清洁气体的供应和气体输送单元，其包括：增压室，一个或多个气体输送 将气体供应连接到增压室的管线，被配置为将清洁气体从充气室引导到EUV组件的一部分的一个或多个输送喷嘴，以及用于从EUV光学组件和真空中去除气体的一个或多个收集喷嘴 处理室。