Inspection apparatus and inspection method for semiconductor device
    2.
    发明授权
    Inspection apparatus and inspection method for semiconductor device 有权
    半导体器件的检查装置和检查方法

    公开(公告)号:US09052187B2

    公开(公告)日:2015-06-09

    申请号:US13784334

    申请日:2013-03-04

    Abstract: An apparatus relating to the manufacture of stacked semiconductor devices includes, for example, a first holding section configured to hold a first semiconductor device and a second holding section configured to hold a second semiconductor device. Additionally, a measuring section including an imaging device for acquiring images of the first and second semiconductor devices and a control section configured to control the holding sections to correct misalignment between the semiconductor devices. The control section is further configured to determine misalignment using the images of the first and second semiconductor devices when the images include a first alignment mark disposed proximate to an edge of the first semiconductor device and a second alignment mark disposed proximate to an edge of the second semiconductor device.

    Abstract translation: 与叠层半导体器件的制造相关的装置例如包括构造成保持第一半导体器件的第一保持部和配置为保持第二半导体器件的第二保持部。 另外,测量部分包括用于获取第一和第二半导体器件的图像的成像装置和被配置为控制保持部分以校正半导体器件之间的未对准的控制部分。 控制部分还被配置为当图像包括靠近第一半导体器件的边缘设置的第一对准标记和靠近第二半导体器件的边缘设置的第二对准标记时,使用第一和第二半导体器件的图像来确定未对准 半导体器件。

    INSPECTION APPARATUS AND INSPECTION METHOD FOR SEMICONDUCTOR DEVICE
    5.
    发明申请
    INSPECTION APPARATUS AND INSPECTION METHOD FOR SEMICONDUCTOR DEVICE 有权
    半导体器件的检查装置和检查方法

    公开(公告)号:US20130250298A1

    公开(公告)日:2013-09-26

    申请号:US13784334

    申请日:2013-03-04

    Abstract: An apparatus relating to the manufacture of stacked semiconductor devices includes, for example, a first holding section configured to hold a first semiconductor device and a second holding section configured to hold a second semiconductor device. Additionally, a measuring section including an imaging device for acquiring images of the first and second semiconductor devices and a control section configured to control the holding sections to correct misalignment between the semiconductor devices. The control section is further configured to determine misalignment using the images of the first and second semiconductor devices when the images include a first alignment mark disposed proximate to an edge of the first semiconductor device and a second alignment mark disposed proximate to an edge of the second semiconductor device.

    Abstract translation: 与叠层半导体器件的制造相关的装置例如包括构造成保持第一半导体器件的第一保持部和配置为保持第二半导体器件的第二保持部。 另外,测量部分包括用于获取第一和第二半导体器件的图像的成像装置和被配置为控制保持部分以校正半导体器件之间的未对准的控制部分。 控制部分还被配置为当图像包括靠近第一半导体器件的边缘设置的第一对准标记和靠近第二半导体器件的边缘设置的第二对准标记时,使用第一和第二半导体器件的图像来确定未对准 半导体器件。

Patent Agency Ranking