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公开(公告)号：US20170301513A1
公开(公告)日：2017-10-19
申请号：US15445055
申请日：2017-02-28
发明人： Mayuka OSAKI , Chie SHISHIDO , Maki TANAKA , Hitoshi NAMAI , Fumihiro SASAJIMA , Makoto SUZUKI , Yoshinori MOMONOI
IPC分类号： H01J37/285 , H01J37/28 , H01J37/244
CPC分类号： H01J37/285 , H01J37/244 , H01J37/28 , H01J2237/221 , H01J2237/24578 , H01J2237/2814
摘要： A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.
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公开(公告)号：US20190304740A1
公开(公告)日：2019-10-03
申请号：US16427698
申请日：2019-05-31
摘要： A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.
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公开(公告)号：US20190295815A1
公开(公告)日：2019-09-26
申请号：US16291070
申请日：2019-03-04
发明人： Yasunori TAKASUGI , Satoru YAMAGUCHI , Kei SAKAI , Hideki ITAI , Yoshinori MOMONOI , Toshimasa KAMEDA , Yoshihiro KIMURA
IPC分类号： H01J37/22 , H01J37/244 , H01J37/28 , H01J37/12
摘要： Provided is a charged particle beam apparatus, aiming at obtaining an image and the like focused on the sample surface and the bottom while preventing the visual field deviation occurred when focusing on the sample surface and the bottom respectively. The charged particle beam apparatus forms a first image (301), which is based on detection of the first energy charged particles, based on an irradiation with a beam whose focus is adjusted on a sample surface side, forms a second image (304) which is based on detection of second energy charged particles having a relatively higher energy than the first energy and a third image (303) which is based on the detection of the first energy charged particles, based on the irradiation with a beam whose focus is adjusted on a bottom side of a pattern included in the sample, acquires a deviation between the first image and the third image, and composes the first image and the second image so as to correct the deviation.
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公开(公告)号：US20170110285A1
公开(公告)日：2017-04-20
申请号：US15292832
申请日：2016-10-13
CPC分类号： H01J37/22 , H01J37/21 , H01J37/28 , H01J2237/024 , H01J2237/216 , H01J2237/2817
摘要： The invention has an object to provide a charged particle beam device in which it is possible to perform proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. In order to achieve the above object, according to the invention, there is provided a charged particle beam device including: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.
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公开(公告)号：US20180269026A1
公开(公告)日：2018-09-20
申请号：US15761294
申请日：2015-09-29
发明人： Shahedul HOQUE , Hajime KAWANO , Yoshinori MOMONOI , Hideki ITAI , Minoru YAMAZAKI , Hiroshi NISHIHAMA
IPC分类号： H01J37/147 , H01J37/28 , H01J37/26 , G02B21/00
摘要： The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.
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公开(公告)号：US20170343340A1
公开(公告)日：2017-11-30
申请号：US15533489
申请日：2014-12-10
发明人： Hiroki KAWADA , Muneyuki FUKUDA , Yoshinori MOMONOI , Shou TAKAMI
IPC分类号： G01B15/02 , H01J37/317
CPC分类号： G01B15/02 , G01B15/00 , G01B2210/56 , H01J37/28 , H01J37/317 , H01J2237/2814 , H01J2237/31749
摘要： The objective of the present invention is to provide a height measurement device capable of highly accurate measurement in the depth direction of a structure on a sample. To achieve this objective, proposed are a charged particle beam device and a height measurement device that is provided with a calculation device for determining the size of a structure on a sample on the basis of a detection signal obtained by irradiating the sample with a charged particle beam, wherein the calculation device calculates the distance from a first charged particle beam irradiation mark formed at a first height on the sample and a second charged particle beam irradiation mark formed at a second height on the sample and on the basis of this distance and the charged particle beam irradiation angle when the first charged particle beam irradiation mark and second charged particle beam irradiation mark were formed, calculates the distance between the first height and the second height.
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公开(公告)号：US20180286629A1
公开(公告)日：2018-10-04
申请号：US15527073
申请日：2015-11-18
发明人： Makoto SAKAKIBARA , Hajime KAWANO , Makoto SUZUKI , Yuji KASAI , Daisuke BIZEN , Yoshinori MOMONOI
IPC分类号： H01J37/21 , H01J37/147 , H01J37/244 , H01J37/28
CPC分类号： H01J37/21 , H01J37/147 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/216 , H01J2237/2806
摘要： A charged particle beam device includes a charged particle source that generates a charged particle beam, a focus adjustment unit that adjusts a focal position of the charged particle beam, a deflection unit for scanning the charged particle beam on the sample, a detection unit that detects charged particles generated when the sample is irradiated with the charged particle beam, a detected charged particle selection unit that selects charged particles to be detected by the detection unit, and a control processing unit that makes focus adjustment of the focus adjustment unit and reference adjustment of the detected charged particle selection unit by using information from the detection unit acquired from one scan.
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公开(公告)号：US20180138010A1
公开(公告)日：2018-05-17
申请号：US15869460
申请日：2018-01-12
CPC分类号： H01J37/22 , H01J37/21 , H01J37/28 , H01J2237/024 , H01J2237/216 , H01J2237/2817
摘要： A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.
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公开(公告)号：US20170092462A1
公开(公告)日：2017-03-30
申请号：US15273523
申请日：2016-09-22
发明人： Michio HATANO , Yoshinori NAKAYAMA , Masaru MATSUZAKI , Hiroki KAWADA , Yoshinori MOMONOI , Zhigang WANG
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/24592 , H01J2237/2826
摘要： Provided is a measurement device including: an irradiation optical system which emits a primary charged quantum beam to a sample for scanning; a detector which detects secondary charged particles generated from the sample; and a signal processing unit which processes an output signal from the secondary charged particle detector which has detected the secondary charged particles, in which the signal processing unit includes a measurement unit which measures widths of a first pattern group calibrated with a well-known first dimension and a second pattern group calibrated with a well-known second dimension, and an operation unit which defines a relationship between the well-known dimensions of the first and second pattern groups and length measurement values of the first and second pattern groups as a function. Accordingly, it is possible to control device performance with high accuracy, by controlling a device state so that the measured value described above is within an acceptable range by comparing to a predetermined value provided in advance.
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