Charged Particle Beam Apparatus
    1.
    发明申请

    公开(公告)号:US20170110285A1

    公开(公告)日:2017-04-20

    申请号:US15292832

    申请日:2016-10-13

    IPC分类号: H01J37/22 H01J37/28

    摘要: The invention has an object to provide a charged particle beam device in which it is possible to perform proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. In order to achieve the above object, according to the invention, there is provided a charged particle beam device including: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

    Charged Particle Beam Apparatus
    2.
    发明申请

    公开(公告)号:US20180138010A1

    公开(公告)日:2018-05-17

    申请号:US15869460

    申请日:2018-01-12

    IPC分类号: H01J37/22 H01J37/28

    摘要: A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

    Charged Particle Beam Apparatus
    3.
    发明申请

    公开(公告)号:US20190304740A1

    公开(公告)日:2019-10-03

    申请号:US16427698

    申请日:2019-05-31

    IPC分类号: H01J37/22 H01J37/21 H01J37/28

    摘要: A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.