公开(公告)号：US10185224B2

公开(公告)日：2019-01-22

申请号：US15569086

申请日：2016-04-19

申请人： ASML Netherlands B.V.

发明人： Ferry Zijp ,  Duygu Akbulut ,  Peter Danny Van Voorst ,  Jeroen Johan Maarten Van De Wijdeven ,  Koos Van Berkel

IPC分类号： G03B27/52 ,  G03B27/72 ,  G03F7/20 ,  G02B21/00 ,  G01N21/956 ,  G01B11/14 ,  G02B5/30

摘要： A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

公开(公告)号：US20160266503A1

公开(公告)日：2016-09-15

申请号：US15065674

申请日：2016-03-09

申请人： ASML NETHERLANDS B.V.

发明人： Peter Danny Van Voorst ,  Duygu Akbulut ,  Koos Van Berkel ,  Jeroen Johan Maarten Van De Wijdeven ,  Ferry Zijp

IPC分类号： G03F7/20 ,  G01B11/00 ,  G02B27/09

CPC分类号： G03F7/70483 ,  G01B11/00 ,  G01N21/956 ,  G02B21/0016 ,  G02B21/33 ,  G02B27/0988 ,  G03F7/70625 ,  G03F7/70633

摘要： A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.

摘要翻译： 公开了一种光学部件相对于表面的位置控制的方法。 该方法可以包括：通过第一位置测量处理获得第一信号; 使用所述第一信号来控制所述光学部件和所述表面之间的第一运动范围的相对运动; 通过与第一位置测量处理不同的第二位置测量处理获得第二信号; 以及使用所述第二信号来控制所述光学部件和所述表面之间的相对运动的第二运动范围，所述第二运动范围比所述第一运动范围更靠近所述表面。

公开(公告)号：US10955595B2

公开(公告)日：2021-03-23

申请号：US16072399

申请日：2017-02-17

申请人： ASML Netherlands B.V.

发明人： Koos Van Berkel ,  Adrianus Hendrik Koevoets

IPC分类号： G02B7/18 ,  G02B5/08 ,  G03F1/24 ,  G03F7/20

摘要： A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.

公开(公告)号：US09811001B2

公开(公告)日：2017-11-07

申请号：US15065674

申请日：2016-03-09

申请人： ASML NETHERLANDS B.V.

发明人： Peter Danny Van Voorst ,  Duygu Akbulut ,  Koos Van Berkel ,  Jeroen Johan Maarten Van De Wijdeven ,  Ferry Zijp

IPC分类号： G01B11/04 ,  G02B7/02 ,  G03B27/32 ,  G03B27/74 ,  G03F7/20 ,  G02B21/00 ,  G01N21/956 ,  G01B11/00 ,  G02B27/09

CPC分类号： G03F7/70483 ,  G01B11/00 ,  G01N21/956 ,  G02B21/0016 ,  G02B21/33 ,  G02B27/0988 ,  G03F7/70625 ,  G03F7/70633

摘要： A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.

公开(公告)号：US20230229090A1

公开(公告)日：2023-07-20

申请号：US18010637

申请日：2021-06-02

申请人： ASML Netherlands B.V.

发明人： Victor Sebastiaan Dolk ,  Koos Van Berkel ,  Mauritius Gerardus Elisabeth Schneiders

IPC分类号： G03F7/00

CPC分类号： G03F7/70266 ,  G03F7/706 ,  G03F7/70504 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/70891 ,  G02B7/028

摘要： The invention provides a method for thermo-mechanical control of a heat sensitive element (Ml) subject to a heat load, comprising: -providing a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between characteristics of the heat load and deformation of the heat sensitive element; -calculating a control signal on the basis of an optimization calculation of the non-linear model, -providing an actuation signal to a heater (HE), wherein the actuation signal is at least partially based on the control signal, -heating the heat sensitive element by the heater on the basis of the actuation signal.

公开(公告)号：US09927722B2

公开(公告)日：2018-03-27

申请号：US15052201

申请日：2016-02-24

申请人： ASML NETHERLANDS B.V.

发明人： Koos Van Berkel ,  Duygu Akbulut ,  Jeroen Johan Maarten Van De Wijdeven ,  Ferry Zijp

IPC分类号： G03F7/20 ,  G03F9/00 ,  G02B21/00 ,  G01N21/956

CPC分类号： G03F7/70775 ,  G01N21/956 ,  G02B21/0016 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7019

摘要： A method and apparatus for position control of a component relative to a surface is disclosed. The method may include calculating an estimated effect of, or derived from, Casimir force acting between the component and the surface, and compensating positioning of the component relative to the surface using the estimated effect.

公开(公告)号：US10747127B2

公开(公告)日：2020-08-18

申请号：US16326948

申请日：2017-08-11

申请人： ASML Netherlands B.V.

发明人： Frits Van Der Meulen ,  Erik Johan Arlemark ,  Hendrikus Herman Marie Cox ,  Martinus Agnes Willem Cuijpers ,  Joost De Hoogh ,  Gosse Charles De Vries ,  Paul Comé Henri De Wit ,  Sander Catharina Reinier Derks ,  Ronald Cornelis Gerardus Gijzen ,  Dries Vaast Paul Hemschoote ,  Christiaan Alexander Hoogendam ,  Adrianus Hendrik Koevoets ,  Raymond Wilhelmus Louis Lafarre ,  Alain Louis Claude Leroux ,  Patrick Willem Paul Limpens ,  Jim Vincent Overkamp ,  Christiaan Louis Valentin ,  Koos Van Berkel ,  Stan Henricus Van Der Meulen ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Harmen Klaas Van Der Schoot ,  David Ferdinand Vles ,  Evert Auke Rinze Westerhuis

IPC分类号： G03F7/20

摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US10712673B2

公开(公告)日：2020-07-14

申请号：US16331601

申请日：2017-08-17

申请人： ASML NETHERLANDS B.V.

发明人： Sietse Thijmen Van Der Post ,  Koos Van Berkel

IPC分类号： G03F7/20 ,  G01N21/956

摘要： An optical system and detector capture a distribution of radiation modified by interaction with a target structure. The observed distribution is used to calculate a property of the structure (e.g. CD or overlay). A condition error (e.g. focus error) associated with the optical system is variable between observations. The actual condition error specific to each capture is recorded and used to apply a correction for a deviation of the observed distribution due to the condition error specific to the observation. The correction in one practical example is based on a unit correction previously defined with respect to a unit focus error. This unit correction can be scaled linearly, in accordance with a focus error specific to the observation.