- 专利标题: Method of determining a property of a structure, inspection apparatus and device manufacturing method
-
申请号: US16331601申请日: 2017-08-17
-
公开(公告)号: US10712673B2公开(公告)日: 2020-07-14
- 发明人: Sietse Thijmen Van Der Post , Koos Van Berkel
- 申请人: ASML NETHERLANDS B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/EP2017/070845 WO 20170817
- 国际公布: WO2018/046272 WO 20180315
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G01N21/956
摘要:
An optical system and detector capture a distribution of radiation modified by interaction with a target structure. The observed distribution is used to calculate a property of the structure (e.g. CD or overlay). A condition error (e.g. focus error) associated with the optical system is variable between observations. The actual condition error specific to each capture is recorded and used to apply a correction for a deviation of the observed distribution due to the condition error specific to the observation. The correction in one practical example is based on a unit correction previously defined with respect to a unit focus error. This unit correction can be scaled linearly, in accordance with a focus error specific to the observation.
公开/授权文献
信息查询
IPC分类: