公开(公告)号：US10416574B2

公开(公告)日：2019-09-17

申请号：US15568122

申请日：2016-04-04

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Sander Catharina Reinier Derks ,  Franciscus Johannes Joseph Janssen ,  Jim Vincent Overkamp ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20170090304A1

公开(公告)日：2017-03-30

申请号：US15297001

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johanne De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70733

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：US10120292B2

公开(公告)日：2018-11-06

申请号：US15297001

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03B27/32 ,  G03F7/20

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：US10018926B2

公开(公告)日：2018-07-10

申请号：US15314841

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Christianus Wilhelmus Johannes Berendsen ,  Andre Bernardus Jeunink ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Siegfried Alexander Tromp ,  Van Vuong Vy ,  Daniel Elza Roeland Audenaerdt

IPC: G03B27/32 ,  G03B27/52 ,  H02K41/02 ,  G03F7/20

CPC classification number: G03F7/7095 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

公开(公告)号：US09939738B2

公开(公告)日：2018-04-10

申请号：US15329536

申请日：2015-07-16

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Christianus Wilhelmus Johannes Berendsen ,  Rogier Hendrikus Magdalena Cortie ,  Jim Vincent Overkamp ,  Patricius Jacobus Neefs ,  Putra Saputra ,  Ruud Hendrikus Martinus Johannes Bloks ,  Michael Johannes Hendrika Wilhelmina Renders ,  Johan Gertrudis Cornelis Kunnen ,  Thibault Simon Mathieu Laurent

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

公开(公告)号：US12197139B2

公开(公告)日：2025-01-14

申请号：US17802841

申请日：2021-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Bernardus Charles Engelen ,  Arnoud Willem Notenboom ,  Jim Vincent Overkamp ,  Kjeld Gertrudus Hendrikus Janssen ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Jeroen Van Duivenbode ,  Erik Johannes Nieuwenhuis ,  Koos Van Berkel

IPC: G03F7/00

Abstract: An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.

公开(公告)号：US10935895B2

公开(公告)日：2021-03-02

申请号：US16539487

申请日：2019-08-13

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Erik Johan Arlemark ,  Sander Catharina Reinier Derks ,  Sjoerd Nicolaas Lambertus Donders ,  Wilfred Edward Endendijk ,  Franciscus Johannes Joseph Janssen ,  Raymond Wilhelmus Louis Lafarre ,  Leon Martin Levasier ,  Jim Vincent Overkamp ,  Nicolaas Ten Kate ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US10394140B2

公开(公告)日：2019-08-27

申请号：US16326410

申请日：2017-07-28

Applicant: ASML Netherlands B.V.

Inventor： Hendrikus Herman Marie Cox ,  Paul Corné Henri De Wit ,  Arie Jeffrey Den Boef ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Frits Van Der Meulen ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.

公开(公告)号：US20190072863A1

公开(公告)日：2019-03-07

申请号：US16177585

申请日：2018-11-01

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03F7/20

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：US20180067398A1

公开(公告)日：2018-03-08

申请号：US15314841

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Christianus Wilhelmus Berendsen ,  Andre Bernardus Jeunink ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Sigfried Alexander Tromp ,  Van Vuong Vy ,  Daniel Elza Roeland Audenaerdt

IPC: G03F7/20

CPC classification number: G03F7/7095 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.