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公开(公告)号：US20190072863A1
公开(公告)日：2019-03-07
申请号：US16177585
申请日：2018-11-01
Applicant: ASML Netherlands B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US10031428B2
公开(公告)日：2018-07-24
申请号：US14762450
申请日：2014-02-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Koen Cuypers , Marcelo Henrique De Andrade Oliveira , Marinus Jan Remie , Chattarbir Singh , Laurentius Johannes Adrianus Van Bokhoven , Henricus Anita Jozef Wilhemus Van De Ven , José Nilton Fonseca Junior , Frank Johannes Jacobus Van Boxtel , Daniel Nathan Burbank , Erik Roelof Loopstra , Johannes Onvlee , Mark Josef Schuster , Robertus Nicodemus Jacobus Van Ballegoij , Christopher Charles Ward , Jan Steven Christiaan Westerlaken
Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
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公开(公告)号：US09971254B2
公开(公告)日：2018-05-15
申请号：US15694519
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert-Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US09785060B2
公开(公告)日：2017-10-10
申请号：US14423405
申请日：2013-08-19
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
CPC classification number: G03F7/70725 , G01D5/34 , G01D5/38 , G03F7/70775 , G03F7/70933
Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
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公开(公告)号：US09753382B2
公开(公告)日：2017-09-05
申请号：US14397126
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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Patent Agency Ranking
公开(公告)号：US20150077728A1
公开(公告)日：2015-03-19
申请号：US14397126
申请日：2013-03-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
Abstract translation: 用于浸没式光刻设备的传感器，并且在使用中与浸入液体接触的布置使得从传感器的换能器到温度调节装置的第一热路的热阻小于 从换能器到浸液的第二热流路的热阻。 因此，热流优先朝向温度调节装置，而不是浸没液体，使得浸没液体中的温度引起的干扰减小或最小化。
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公开(公告)号：US20240160109A1
公开(公告)日：2024-05-16
申请号：US18508987
申请日：2023-11-14
Applicant: ASML Netherlands B.V.
Inventor： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC: G03F7/00
CPC classification number: G03F7/70166 , G03F7/70033 , G03F7/70883 , G03F7/70916 , G03F7/70925
Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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公开(公告)号：US10747125B2
公开(公告)日：2020-08-18
申请号：US16177585
申请日：2018-11-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US10114298B2
公开(公告)日：2018-10-30
申请号：US15327343
申请日：2015-06-23
Applicant: ASML Netherlands B.V.
Abstract: A conditioning system for a lithographic apparatus having a plurality of modules. The conditioning system includes a plurality of conditioning branches conveying a common conditioning medium for the plurality of modules, one conditioning branch for each module (or a subset of modules); a plurality of thermal actuators, each thermal actuator operable to locally alter the temperature of the common conditioning medium at one of the conditioning branches; and a plurality of sensors, each sensor operable to sense the temperature of the common conditioning medium at one of the conditioning branches.
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公开(公告)号：US09891542B2
公开(公告)日：2018-02-13
申请号：US15387461
申请日：2016-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Jan Steven Christiaan Westerlaken , Gerardus Arnoldus Hendricus Franciscus Janssen , Peter Paul Steijaert , Engelbertus Antonius Fransiscus Van Der Pasch , Franciscus Van De Mast
CPC classification number: G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
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