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公开(公告)号：US11302512B2
公开(公告)日：2022-04-12
申请号：US16809519
申请日：2020-03-04
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Antonius Henricus Arends , Lucas Kuindersma , Johannes Hubertus Antonius Van De Rijdt , Peter Paul Hempenius , Robertus Jacobus Theodorus Van Kempen , Niels Johannes Maria Bosch , Henricus Martinus Johannes Van De Groes , Kuo-Feng Tseng , Hans Butler , Michael Johannes Christiaan Ronde
IPC: H01J37/20
Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
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公开(公告)号：US10114300B2
公开(公告)日：2018-10-30
申请号：US14419640
申请日：2013-08-15
Applicant: ASML Netherlands B.V.
Inventor： Henrikus Herman Marie Cox , Mark Marcus Gerardus Heeren , Peter Michel Silvester Maria Heijmans , Jacob Jan Velten , Johannes Hubertus Antonius Van De Rijdt , Godfried Katharina Hubertus Franciscus Geelen , Abdelhamid Kechroud
IPC: G03F9/00 , G03F7/20 , H02K41/035 , H02K9/22 , H02K1/06
Abstract: An electromagnetic actuator includes a coil assembly including a coil; a magnet assembly including a first and a second magnet unit, each magnet unit including a magnetic yoke and a plurality of permanent magnets mounted to the magnetic yoke, the first and second magnet unit forming a magnetic circuit for receiving the coil assembly and, upon energizing the coil, generating a force in a first direction; and a holder for holding the magnet units, wherein a weight ratio of the magnet assembly over the coil assembly is smaller than the weight ratio of the magnet assembly over the coil assembly when the ratio of force over electrical power is maximized.
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公开(公告)号：US11372343B2
公开(公告)日：2022-06-28
申请号：US17435115
申请日：2020-02-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Henricus Martinus Johannes Van De Groes , Johannes Hubertus Antonius Van De Rijdt , Marcel Pieter Jacobus Peeters , Chien-Hung Tseng , Henricus Petrus Maria Pellemans
IPC: G03F9/00
Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
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公开(公告)号：US10151988B2
公开(公告)日：2018-12-11
申请号：US15513108
申请日：2015-10-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Hubertus Antonius Van De Rijdt
IPC: G03F7/20
Abstract: A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.
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公开(公告)号：US12249481B2
公开(公告)日：2025-03-11
申请号：US17535453
申请日：2021-11-24
Applicant: ASML Netherlands B.V.
Inventor： Mark Henricus Wilhelmus Van Gerven , Johannes Hubertus Antonius Van De Rijdt , Michaël Johannes Christiaan Ronde , Niels Johannes Maria Bosch
Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.
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Patent Agency Ranking
公开(公告)号：US11764030B2
公开(公告)日：2023-09-19
申请号：US16714549
申请日：2019-12-13
Applicant: ASML Netherlands B.V.
Inventor： Johannes Hubertus Antonius Van De Rijdt , Peter Paul Hempenius , Allard Eelco Kooiker , Jef Goossens , Petrus Wilhelmus Vleeshouwers
IPC: H01J37/20
CPC classification number: H01J37/20 , H01J2237/2007
Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.
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公开(公告)号：US11621142B2
公开(公告)日：2023-04-04
申请号：US16992058
申请日：2020-08-12
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Peter Paul Hempenius , Maarten Frans Janus Kremers , Robertus Jacobus Theodorus Van Kempen , Sven Antoin Johan Hol , Henricus Martinus Johannes Van De Groes , Johannes Hubertus Antonius Van De Rijdt , Niels Johannes Maria Bosch , Maarten Hartger Kimman
Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
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公开(公告)号：US11131937B2
公开(公告)日：2021-09-28
申请号：US16723995
申请日：2019-12-20
Applicant: ASML Netherlands B.V.
Inventor： Michaël Johannes Christiaan Ronde , Johannes Hubertus Antonius Van De Rijdt , Maarten Frans Janus Kremers , Erik Maria Rekkers
Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.
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公开(公告)号：US09971254B2
公开(公告)日：2018-05-15
申请号：US15694519
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert-Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US09753382B2
公开(公告)日：2017-09-05
申请号：US14397126
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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