- 专利标题： Lithographic apparatus
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申请号： US16326948申请日： 2017-08-11
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公开(公告)号： US10747127B2公开(公告)日： 2020-08-18
- 发明人: Frits Van Der Meulen , Erik Johan Arlemark , Hendrikus Herman Marie Cox , Martinus Agnes Willem Cuijpers , Joost De Hoogh , Gosse Charles De Vries , Paul Comé Henri De Wit , Sander Catharina Reinier Derks , Ronald Cornelis Gerardus Gijzen , Dries Vaast Paul Hemschoote , Christiaan Alexander Hoogendam , Adrianus Hendrik Koevoets , Raymond Wilhelmus Louis Lafarre , Alain Louis Claude Leroux , Patrick Willem Paul Limpens , Jim Vincent Overkamp , Christiaan Louis Valentin , Koos Van Berkel , Stan Henricus Van Der Meulen , Jacobus Cornelis Gerardus Van Der Sanden , Harmen Klaas Van Der Schoot , David Ferdinand Vles , Evert Auke Rinze Westerhuis
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权： com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2b656458 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@15fc9f1e com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2d0eb2f3
- 国际申请： PCT/EP2017/070394 WO 20170811
- 国际公布： WO2018/041599 WO 20180308
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
公开/授权文献
- US20190227445A1 Lithographic Apparatus 公开/授权日：2019-07-25
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