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公开(公告)号：US10031428B2
公开(公告)日：2018-07-24
申请号：US14762450
申请日：2014-02-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Koen Cuypers , Marcelo Henrique De Andrade Oliveira , Marinus Jan Remie , Chattarbir Singh , Laurentius Johannes Adrianus Van Bokhoven , Henricus Anita Jozef Wilhemus Van De Ven , José Nilton Fonseca Junior , Frank Johannes Jacobus Van Boxtel , Daniel Nathan Burbank , Erik Roelof Loopstra , Johannes Onvlee , Mark Josef Schuster , Robertus Nicodemus Jacobus Van Ballegoij , Christopher Charles Ward , Jan Steven Christiaan Westerlaken
Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
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公开(公告)号：US09632433B2
公开(公告)日：2017-04-25
申请号：US14439359
申请日：2013-10-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US10394139B2
公开(公告)日：2019-08-27
申请号：US16090713
申请日：2017-03-08
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Güneş Nak{dot over (i)}bo{hacek over (g)}lu , Lowell Lane Baker , Ruud Hendrikus Martinus Johannes Bloks , Hakki Ergün Cekli , Geoffrey Alan Schultz , Laurentius Johannes Adrianus Van Bokhoven , Frank Johannes Jacobus Van Boxtel , Jean-Philippe Xavier Van Damme , Christopher Charles Ward
IPC: G03F7/20
Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
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公开(公告)号：US09939740B2
公开(公告)日：2018-04-10
申请号：US15116794
申请日：2015-01-20
Applicant: ASML Netherlands B.V.
Inventor： Günes Nakiboglu , Martijn Van Baren , Frank Johannes Jacobus Van Boxtel , Koen Cuypers , Jeroen Gerard Gosen , Laurentius Johannes Adrianus Van Bokhoven
CPC classification number: G03F7/70858 , G03F7/70358 , G03F7/70716 , G03F7/70908
Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.
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公开(公告)号：US20150168854A1
公开(公告)日：2015-06-18
申请号：US14411870
申请日：2013-06-05
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70916 , G03F7/70933
Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
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Patent Agency Ranking
公开(公告)号：US20200379360A1
公开(公告)日：2020-12-03
申请号：US16071380
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Gunes Nakiboglu , Rita Marguerite Albin Lambertine Petit , Hermen Folken Pen , Remco Yuri Van de Moesdijk , Frank Johannes Jacobus Van Boxtel , Borgert Kruizinga
Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
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公开(公告)号：US10114295B2
公开(公告)日：2018-10-30
申请号：US15520193
申请日：2015-10-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Günes Nakiboglu , Jan Steven Christiaan Westerlaken , Frank Johannes Jacobus Van Boxtel , Maria del Carmen Mercado , Thibault Simon Mathieu Laurent
Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.
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公开(公告)号：US09632434B2
公开(公告)日：2017-04-25
申请号：US14699468
申请日：2015-04-29
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame , Thomas Venturino
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
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公开(公告)号：US11048178B2
公开(公告)日：2021-06-29
申请号：US16772444
申请日：2018-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Federico La Torre , Laurentius Johannes Adrianus Van Bokhoven , José Nilton Fonseca, Jr. , Gerben Pieterse , Erik Henricus Egidius Catharina Eummelen , Frank Johannes Jacobus Van Boxtel
IPC: G03F7/20
Abstract: A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.
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10.发明授权公开(公告)号：US11036148B2
公开(公告)日：2021-06-15
申请号：US16700586
申请日：2019-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Hakki Ergün Cekli , Güneş Nakìbo{hacek over (g)}lu , Frank Johannes Jacobus Van Boxtel , Jean-Philippe Xavier Van Damme , Richard Johannes Franciscus Van Haren
IPC: G03F7/20
Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.
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