公开(公告)号：US11320751B2

公开(公告)日：2022-05-03

申请号：US16967785

申请日：2019-01-18

Applicant: ASML Netherlands B.V.

Inventor： Güneş Nakibo{hacek over (g)}lu ,  Dries Vaast Paul Hemschoote ,  Remco Yuri Van de Moesdijk

IPC: G03F7/20

Abstract: An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.

公开(公告)号：US20200379360A1

公开(公告)日：2020-12-03

申请号：US16071380

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang Nienhuys ,  Gunes Nakiboglu ,  Rita Marguerite Albin Lambertine Petit ,  Hermen Folken Pen ,  Remco Yuri Van de Moesdijk ,  Frank Johannes Jacobus Van Boxtel ,  Borgert Kruizinga

IPC: G03F7/20 ,  G03F1/84

Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.