公开(公告)号：US20200379360A1

公开(公告)日：2020-12-03

申请号：US16071380

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang Nienhuys ,  Gunes Nakiboglu ,  Rita Marguerite Albin Lambertine Petit ,  Hermen Folken Pen ,  Remco Yuri Van de Moesdijk ,  Frank Johannes Jacobus Van Boxtel ,  Borgert Kruizinga

IPC: G03F7/20 ,  G03F1/84

Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.

公开(公告)号：US11009800B2

公开(公告)日：2021-05-18

申请号：US16071380

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang Nienhuys ,  Güneş Nakiboğlu ,  Rita Marguerite Albin Lambertine Petit ,  Hermen Folken Pen ,  Remco Yuri Van De Moesdijk ,  Frank Johannes Jacobus Van Boxtel ,  Borgert Kruizinga

IPC: G03F7/20 ,  G03F1/84

Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.

公开(公告)号：US11237490B2

公开(公告)日：2022-02-01

申请号：US16084596

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bearrach Moest ,  Lowell Lane Baker ,  James Robert Downes ,  Wijnand Hoitinga ,  Hermen Folken Pen

IPC: G03F7/20

Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.