知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

8 records (took 0.017 seconds)

    Method of Operating a Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product
    3.
    发明申请
    Method of Operating a Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product 有权
    操作平版印刷设备的方法，设备制造方法和相关数据处理设备和计算机程序产品

    公开(公告)号：US20140168627A1

    公开(公告)日：2014-06-19

    申请号：US14069287

    申请日：2013-10-31

    Applicant: ASML Netherlands B.V.

    Inventor： Emil Peter SCHMITT-WEAVER ,  Paul Frank Luehrmann ,  Eduardus Johannes Gerardus Boon ,  Daan Maurits Slotboom ,  Jean-Philippe Xavier Van Damme ,  Wolfgang Henke ,  Alexander Ypma ,  Marc Jurian Kea

    IPC: G03F7/20

    CPC classification number: G03F7/70908 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/70

    Abstract: A reticle is loaded into a lithographic apparatus. The apparatus performs measurements on the reticle, so as to calculate alignment parameters for transferring the pattern accurately to substrates. Tests are performed to detect possible contamination of the reticle or its support. Either operation proceeds with a warning, or the patterning of substrates is stopped. The test uses may use parameters of the alignment model itself, or different parameters. The integrity parameters may be compared against reference values reflecting historic measurements, so that sudden changes in a parameter are indicative of contamination. Integrity parameters may be calculated from residuals of the alignment model. In an example, height residuals are used to calculate parameters of residual wedge (Rx′) and residual roll (Ryy′). From these, integrity parameters expressed as height deviations are calculated and compared against thresholds.

    Abstract translation: 将掩模版加载到光刻设备中。 该装置对掩模版进行测量，以便计算用于将图案精确地转印到基底上的对准参数。 执行测试以检测掩模版或其支撑体的可能污染。 任一操作都进行警告，或者停止基板的图案化。 测试使用可以使用对齐模型本身的参数或不同的参数。 可以将完整性参数与反映历史测量的参考值进行比较，使得参数中的突然变化指示污染。 可以从对齐模型的残差计算完整性参数。 在一个例子中，高度残差用于计算残余楔（Rx'）和残余辊（Ryy'）的参数。 从这些，计算表示为高度偏差的完整性参数，并将其与阈值进行比较。

    Lithographic apparatus and lithographic projection method
    4.
    发明授权
    Lithographic apparatus and lithographic projection method 有权

    公开(公告)号：US10459354B2

    公开(公告)日：2019-10-29

    申请号：US15565082

    申请日：2016-03-24

    Applicant: ASML Netherlands B.V.

    Inventor： Kevin Van De Ruit ,  Bart Dinand Paarhuis ,  Jean-Philippe Xavier Van Damme ,  Johannes Onvlee ,  Cornelis Melchior Brouwer

    IPC: G01B11/24 ,  G03F7/20 ,  G03F1/62

    Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.

    Method of operating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
    7.
    发明授权
    Method of operating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product 有权
    操作光刻设备的方法，设备制造方法以及相关的数据处理设备和计算机程序产品

    公开(公告)号：US09507279B2

    公开(公告)日：2016-11-29

    申请号：US14069287

    申请日：2013-10-31

    Applicant: ASML Netherlands B.V.

    Inventor： Emil Peter Schmitt-Weaver ,  Paul Frank Luehrmann ,  Eduardus Johannes Gerardus Boon ,  Daan Maurits Slotboom ,  Jean-Philippe Xavier Van Damme ,  Wolfgang Henke ,  Alexander Ypma ,  Marc Jurian Kea

    IPC: G03F7/20 ,  G03F9/00

    CPC classification number: G03F7/70908 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/70

    Abstract: A reticle is loaded into a lithographic apparatus. The apparatus performs measurements on the reticle, so as to calculate alignment parameters for transferring the pattern accurately to substrates. Tests are performed to detect possible contamination of the reticle or its support. Either operation proceeds with a warning, or the patterning of substrates is stopped. The test uses may use parameters of the alignment model itself, or different parameters. The integrity parameters may be compared against reference values reflecting historic measurements, so that sudden changes in a parameter are indicative of contamination. Integrity parameters may be calculated from residuals of the alignment model. In an example, height residuals are used to calculate parameters of residual wedge (Rx′) and residual roll (Ryy′). From these, integrity parameters expressed as height deviations are calculated and compared against thresholds.

    Abstract translation: 将掩模版加载到光刻设备中。 该装置对掩模版进行测量，以便计算用于将图案精确地转印到基底上的对准参数。 执行测试以检测掩模版或其支撑体的可能污染。 任一操作都进行警告，或者停止基板的图案化。 测试使用可以使用对齐模型本身的参数或不同的参数。 可以将完整性参数与反映历史测量的参考值进行比较，使得参数中的突然变化指示污染。 可以从对齐模型的残差计算完整性参数。 在一个例子中，高度残差用于计算残余楔（Rx'）和残余辊（Ryy'）的参数。 从这些，计算表示为高度偏差的完整性参数，并将其与阈值进行比较。

    Patterning Device Support and Lithographic Apparatus
    8.
    发明申请
    Patterning Device Support and Lithographic Apparatus 有权
    图案设备支持和平版印刷设备

    公开(公告)号：US20150277240A1

    公开(公告)日：2015-10-01

    申请号：US14436070

    申请日：2013-09-23

    Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    Inventor： Arindam Sinharoy ,  Stephen S. Roux ,  Jean-Philippe Xavier Van Damme ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Duncan Harris ,  Christopher Charles Ward

    IPC: G03F7/20

    CPC classification number: G03F7/70733 ,  G03F7/707 ,  G03F7/70783

    Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

    Abstract translation: 图案形成装置支撑件（200），例如，图案形成装置（202）或基板支撑件可以构造成释放装载在其上的图案形成装置的内部应力。 图案形成装置支撑件可以包括正压力生成界面（206a，206b）或声振动产生界面（206a，206b），或者可以被配置为在图案形成装置的至少一部分与图案形成装置支撑件分离的同时进行摆动。 在图案形成装置处理装置和被构造成移动图案形成装置的图案形成装置支撑件之间传送图案形成装置的方法可以包括将图案形成装置定位在图案形成装置支撑件的表面上，并且执行释放图案形成装置的内部应力 设备。

Patent Agency Ranking