公开(公告)号：US11048178B2

公开(公告)日：2021-06-29

申请号：US16772444

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Federico La Torre ,  Laurentius Johannes Adrianus Van Bokhoven ,  José Nilton Fonseca, Jr. ,  Gerben Pieterse ,  Erik Henricus Egidius Catharina Eummelen ,  Frank Johannes Jacobus Van Boxtel

IPC: G03F7/20

Abstract: A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.