FIELD-EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
    2.
    发明申请
    FIELD-EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME 有权
    场效应晶体管及其制造方法

    公开(公告)号:US20130032797A1

    公开(公告)日:2013-02-07

    申请号:US13641793

    申请日:2011-12-19

    IPC分类号: H01L21/336 H01L29/786

    摘要: The present invention achieves a formation of a metal oxide film of a thin film transistor with a simplified process. The present invention is concerned with a method for manufacturing a field-effect transistor comprising a gate electrode, a source electrode, a drain electrode, a channel layer and a gate insulating layer wherein the channel layer is formed by using a metal salt-containing composition comprising a metal salt, a polyvalent carboxylic acid having a cis-form structure of —C(COOH)═C(COOH)—, an organic solvent and a water wherein a molar ratio of the polyvalent carboxylic acid to the metal salt is in the range of 0.5 to 4.0.

    摘要翻译: 本发明通过简化的工艺实现了薄膜晶体管的金属氧化物膜的形成。 本发明涉及一种制造场效应晶体管的方法,该场效应晶体管包括栅电极,源电极,漏电极,沟道层和栅极绝缘层,其中通过使用含金属盐的组合物形成沟道层 包括金属盐,具有-C(COOH)= C(COOH) - 的顺式结构的多元羧酸,有机溶剂和水,其中多价羧酸与金属盐的摩尔比为 范围为0.5至4.0。