发明授权
- 专利标题: Semiconductor device and method for manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11497169申请日: 2006-08-01
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公开(公告)号: US07390692B2公开(公告)日: 2008-06-24
- 发明人: Yasuhiro Sugaya , Toshiyuki Asahi , Shingo Komatsu , Yoshiyuki Yamamoto , Seiichi Nakatani
- 申请人: Yasuhiro Sugaya , Toshiyuki Asahi , Shingo Komatsu , Yoshiyuki Yamamoto , Seiichi Nakatani
- 申请人地址: JP Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Hamre, Schumann, Mueller & Larson, P.C.
- 优先权: JP2002-316614 20021030
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A semiconductor device (1) of the present invention includes a semiconductor element (103) including electrode parts (104), and a wiring substrate (108) including an insulation layer (101), electrode-part-connection electrodes (102) provided in the insulation layer (101), and external electrodes (107) that is provided in the insulation layer (101) and that is connected electrically with the electrode-part-connection electrodes (102), in which the electrode parts (104) and the electrode-part-connection electrodes (102) are connected electrically with each other. The insulation layer (101) has an elastic modulus measured according to JIS K6911 of not less than 0.1 GP a and not more than 5 GPa, and the electrodes (104) and the electrode-part-connection electrodes (102) are connected by metal joint.
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